Prosecution Insights
Last updated: April 19, 2026
Application No. 16/646,157

ARRAY SUBSTRATE AND DISPLAY DEVICE

Final Rejection §103
Filed
Aug 07, 2023
Examiner
SENGDARA, VONGSAVANH
Art Unit
2893
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Wuhan China Star Optoelectronics Technology Co., Ltd.
OA Round
2 (Final)
71%
Grant Probability
Favorable
3-4
OA Rounds
3y 5m
To Grant
90%
With Interview

Examiner Intelligence

Grants 71% — above average
71%
Career Allow Rate
651 granted / 914 resolved
+3.2% vs TC avg
Strong +19% interview lift
Without
With
+19.1%
Interview Lift
resolved cases with interview
Typical timeline
3y 5m
Avg Prosecution
73 currently pending
Career history
987
Total Applications
across all art units

Statute-Specific Performance

§101
1.8%
-38.2% vs TC avg
§103
48.7%
+8.7% vs TC avg
§102
30.5%
-9.5% vs TC avg
§112
17.5%
-22.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 914 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Response to Arguments Applicant's arguments filed 12/15/2025 have been fully considered but they are not persuasive. Cho does not explicitly disclose wherein the passivation layer is a double-layered structure, one layer of the passivation layer adjacent to the organic filling layer has hydrophilic substances or groups, and another layer of the passivation layer adjacent to the organic planarization layer has hydrophobic substances or groups. However, par [0095] the sixth insulation layer 60 may include an organic layer and may have a single-layer or multi-layer structure; and par [0096] of Cho discloses that the sixth insulation layer 60 may include at least one of an acryl-based resin, a methacryl-based resin, a polyisoprene-based resin, a vinyl-based resin, an epoxy-based resin, a urethane-based resin, a cellulose-based resin, a siloxane-based resin, a polyamide-based resin, or a perylene-based resin. Note Cho suggests that the sixth insulation layer 60 may have a single-layer or multi-layer structure which 2 or more layer and that the sixth insulation layer 60 may include at least one of an acryl-based resin, a methacryl-based resin, a polyisoprene-based resin, a vinyl-based resin, an epoxy-based resin, a urethane-based resin, a cellulose-based resin, a siloxane-based resin, a polyamide-based resin, or a perylene-based resin. Therefore, one of organic skill in the art can form the passivation layer to be a double-layered structure, and selectively choose one layer of the passivation layer adjacent to the organic filling layer has hydrophilic substances or groups, and selectively choose another layer of the passivation layer adjacent to the organic planarization layer has hydrophobic substances or groups as Cho suggest the possible combination of material in order form a ensure that moisture is drawn away from Transistor T1 to ensure reliability of the array substrate. For example, one layer of the passivation layer adjacent to the organic filling layer has hydrophilic substances or groups keeps moisture away from layer 50 and therefore away from the TFT T1 and another layer of the passivation layer adjacent to the organic planarization layer has hydrophobic substances or groups keeps moisture away from the from layer 60 and therefore away from layer 50 and therefore away from TFT T1. As such it would have been obvious to form an array substrate of Cho comprising wherein the passivation layer is a double-layered structure, one layer of the passivation layer adjacent to the organic filling layer has hydrophilic substances or groups, and another layer of the passivation layer adjacent to the organic planarization layer has hydrophobic substances or groups in order that moisture is drawn away from Transistor T1 (the pixel circuit layer) to ensure reliability of the array substrate Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1-4 and 7-10 are rejected under 35 U.S.C. 103 as being unpatentable over Cho et al. 20190164998. PNG media_image1.png 490 741 media_image1.png Greyscale Regarding claim 1, fig. 8E of Cho disclose an array substrate, comprising: a substrate layer BL; a functional structure layer (BRL-50) disposed on the substrate layer and having an organic filling layer 50 (par [0095-0096]); at least one passivation layer 60 (par [0096] - acryl-based resin - Acrylic-based hydrophilic resins are a class of water-dispersed polymers used in coatings and other applications, created by introducing hydrophilic groups into acrylic monomers) disposed on the organic filling layer 50 of the functional structure layer and having hydrophilic substances or groups; and an organic planarization layer TFE (fig. 9 and par [0105] – organic) disposed on a surface of the passivation layer away from the functional structure layer. Cho does not explicitly disclose wherein the passivation layer is a double-layered structure, one layer of the passivation layer adjacent to the organic filling layer has hydrophilic substances or groups, and another layer of the passivation layer adjacent to the organic planarization layer has hydrophobic substances or groups. However, par [0095] the sixth insulation layer 60 may include an organic layer and may have a single-layer or multi-layer structure; and par [0096] of Cho discloses that the sixth insulation layer 60 may include at least one of an acryl-based resin, a methacryl-based resin, a polyisoprene-based resin, a vinyl-based resin, an epoxy-based resin, a urethane-based resin, a cellulose-based resin, a siloxane-based resin, a polyamide-based resin, or a perylene-based resin. Note Cho suggests that the sixth insulation layer 60 may have a single-layer or multi-layer structure which 2 or more layer and that the sixth insulation layer 60 may include at least one of an acryl-based resin, a methacryl-based resin, a polyisoprene-based resin, a vinyl-based resin, an epoxy-based resin, a urethane-based resin, a cellulose-based resin, a siloxane-based resin, a polyamide-based resin, or a perylene-based resin. Therefore, one of organic skill in the art can form the passivation layer to be a double-layered structure, and selectively choose one layer of the passivation layer adjacent to the organic filling layer has hydrophilic substances or groups, and selectively choose another layer of the passivation layer adjacent to the organic planarization layer has hydrophobic substances or groups as Cho suggest the possible combination of material in order form a ensure that moisture is drawn away from Transistor T1 to ensure reliability of the array substrate. For example, one layer of the passivation layer adjacent to the organic filling layer has hydrophilic substances or groups keeps moisture away from layer 50 and therefore away from the TFT T1 and another layer of the passivation layer adjacent to the organic planarization layer has hydrophobic substances or groups keeps moisture away from the from layer 60 and therefore away from layer 50 and therefore away from TFT T1. As such it would have been obvious to form an array substrate of Cho comprising wherein the passivation layer is a double-layered structure, one layer of the passivation layer adjacent to the organic filling layer has hydrophilic substances or groups, and another layer of the passivation layer adjacent to the organic planarization layer has hydrophobic substances or groups in order that moisture is drawn away from Transistor T1 (the pixel circuit layer) to ensure reliability of the array substrate Regarding claim 2, fig. 8 of Cho discloses wherein the functional structure layer further comprises: a barrier layer BRL disposed on the substrate layer; a buffer layer BFL disposed on the barrier layer; an active layer OSP1 disposed on the buffer layer; a first insulating layer 10 disposed on the active layer and the buffer layer; a first gate electrode layer GE1 disposed on the first insulating layer; a second insulating layer 20 disposed on the first gate electrode layer and the first insulating layer; a second gate electrode layer UE disposed on the second insulating layer; a dielectric layer 30 disposed on the second gate electrode layer and the second insulating layer; and a source/drain electrode layer (DE1/SE1) disposed on the dielectric layer and penetrating through the dielectric layer, the second insulating layer, and the first insulating layer to connect to two ends of the active layer; wherein the organic filling layer 50 is disposed between the dielectric layer 30 and the source/drain electrode layer (see layer on BA side and DE1/SE1 on NBA side and 50 between). Regarding claim 3, fig. 8E of Cho discloses wherein the organic filling layer 50 has an extending part (parts extending from left and right sides of GV) and a vertical part, the extending part covers the dielectric layer, and the vertical part is perpendicularly connected to the extending part and penetrates through the dielectric layer, the second insulating layer, the first insulating layer, the buffer layer, and a portion of the barrier layer. Regarding claim 4, fig. 8E of Cho discloses comprising a functional area NBA and a non-functional area BA surrounding the functional area, wherein the extending part of the organic filling layer is disposed in the non-functional area, and the active layer, the first gate electrode layer, the second gate electrode layer, and the source/drain electrode layer are disposed in the functional area. Regarding claim 7, Cho discloses wherein a material of the passivation layer is one of organics with hydrophilic bonds (acryl-based resin). Regarding claim 8, Cho discloses wherein the organics is one or more of organics with a carboxyl group (acrylic-based resins can have carboxyl groups) or organics with a hydroxyl group (acrylic-based resins are hydroxyl-functional, meaning they contain hydroxyl groups (\(OH\))). Regarding claim 9, fig. 8 of Cho discloses wherein the active layer has a doped area correspondingly disposed at the two ends of the active layer, and the source/drain electrode layer is connected to the doped area. Regarding claim 10, fig. 8 of Cho disclose a display device, comprising the array substrate according to claim 1. Conclusion THIS ACTION IS MADE FINAL. Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to VONGSAVANH SENGDARA whose telephone number is (571)270-5770. The examiner can normally be reached 9AM-6PM EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, PURVIS A. Sue can be reached on (571)272-1236. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /VONGSAVANH SENGDARA/Primary Examiner, Art Unit 2893
Read full office action

Prosecution Timeline

Aug 07, 2023
Application Filed
Mar 17, 2023
Response after Non-Final Action
Oct 16, 2025
Non-Final Rejection — §103
Dec 15, 2025
Response Filed
Mar 06, 2026
Final Rejection — §103 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
71%
Grant Probability
90%
With Interview (+19.1%)
3y 5m
Median Time to Grant
Moderate
PTA Risk
Based on 914 resolved cases by this examiner. Grant probability derived from career allow rate.

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