Prosecution Insights
Last updated: October 26, 2026
Application No. 17/785,147

ORGANICALLY MODIFIED METAL OXIDE NANOPARTICLE, METHOD FOR PRODUCING SAME, EUV PHOTORESIST MATERIAL, AND METHOD FOR PRODUCING ETCHING MASK

Final Rejection §101§102§103
Filed
Jun 14, 2022
Priority
Dec 24, 2019 — JP 2019-233067 +1 more
Examiner
YUAN, DAH WEI D
Art Unit
1717
Tech Center
1700 — Chemical & Materials Engineering
Assignee
National Institute of Advanced Industrial Science and Technology
OA Round
2 (Final)
27%
Grant Probability
At Risk
3-4
OA Rounds
0m
Est. Remaining
38%
With Interview

Examiner Intelligence

Grants only 27% of cases
27%
Career Allowance Rate
12 granted / 45 resolved
-38.3% vs TC avg
Moderate +11% lift
Without
With
+11.3%
Interview Lift
resolved cases with interview
Typical timeline
3y 9m
Avg Prosecution
4 currently pending
Career history
53
Total Applications
across all art units

Statute-Specific Performance

§101
0.8%
-39.2% vs TC avg
§103
53.1%
+13.1% vs TC avg
§102
20.0%
-20.0% vs TC avg
§112
22.3%
-17.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 45 resolved cases

Office Action

§101 §102 §103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . The Applicant’s amendments filed on September 11, 2025 were received. The text of those sections of Title 35., U.S.C. code not included in this action can be found in the prior Office action issued June 12, 2025. Claim 1 was amended and claim 3 was canceled. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. 2. Claims 1,2,4-10 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Sue et al. (WO 2020/004172). See attached machine translation of the reference. Regarding claims 1,4, Sue et al. teach an organically modified metal oxide nanoparticles comprising a core of metal oxide, a first modification group which is a carboxylic acid carboxylate ligand coordinated to the core, a second modifying group which is a carboxylic acid carboxylate ligand and/or an inorganic anion which is coordinated to the core and has a smaller molecular weight than the first modifying group. The organically modified metal oxide nanoparticles are represented by the general formula M6O4(OH)4XnY12-n wherein M is a metal, one or more selected from the group consisting of Zr, Hf, and Ti, X is the first modifying group, Y is the second modifying group, and 1 ≤ n ≤ 11. Furthermore, it is preferable that Z, which represents the ratio of X and Y and is defined as X/(X+Y)×100, satisfies the relationship 5 mol% ≤ Z ≤ 95 mol%. For instance, Example 1 shows the methacrylic acid : nitric acid = 61:39 = 7.3:4.7. Thus, the X/(X+Y) = 60.8 mol%. See Abstract, papa.10,17, Examples 1-3. Regarding claim 2, Sue et al. teach the first modification group involving saturated carboxylic acids can be propionic acid (3 carbon atoms) or isobutyric acid (4 carbon atoms). See Examples 4,5. The second modifying group is a carboxylate acetate ligand and/or a nitrate ion. See Para. 16. Regarding claim 5, Sue et al. teach the EUV photoresist material comprise a solvent. See Para. 19. Regarding claim 6, Sue et al. also teach a method for producing the organically modified metal oxide nanoparticles using metal nitrate and a hydrophilic liquid. Para. 20,21. Regarding claim 7, Sue et al. also teach a method for producing an organicall modified metal oxide using isobutyric acid. See Example 4. Regarding claim 8, Sue et al. teach the reaction is carried out in ambient (an air atmosphere). See Examples 1-5. Regarding claim 9, Sue et al. teach the use of zirconium oxynitrate and zirconium oxyacetate. See Para. 21,22. Regarding claim 10, Sue et al. teach a film forming step, a drying step, an exposing step and a developing step and a removing step. See para. 12,44. Claim Rejections - 35 USC § 103 3. The claim rejections under 35 U.S.C. 103 as being unpatentable over Thackeray et al. in view of Krysak et al. on claims 1-5,10 are withdrawn because claim 1 has been amended. The claim rejections under 35 U.S.C. 103 as being unpatentable over Kimura et al. on claims 6-7,9 are withdrawn because claim 1 has been amended. The claim rejections under 35 U.S.C. 103 as being unpatentable over Kimura et al. in view of Hashimoto et al. on claims 8-9 are withdrawn because claim 1 has been amended. Double Patenting 35 U.S.C. 101 reads as follows: Whoever invents or discovers any new and useful process, machine, manufacture, or composition of matter, or any new and useful improvement thereof, may obtain a patent therefor, subject to the conditions and requirements of this title. 4. Claims 1,2,4-10 are rejected under 35 U.S.C. 101 because A rejection based on double patenting of the “same invention” type finds its support in the language of 35 U.S.C. 101 which states that “whoever invents or discovers any new and useful process... may obtain a patent therefor...” (Emphasis added). Thus, the term “same invention,” in this context, means an invention drawn to identical subject matter. See Miller v. Eagle Mfg. Co., 151 U.S. 186 (1894); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Ockert, 245 F.2d 467, 114 USPQ 330 (CCPA 1957). A statutory type (35 U.S.C. 101) double patenting rejection can be overcome by canceling or amending the claims that are directed to the same invention so they are no longer coextensive in scope. The filing of a terminal disclaimer cannot overcome a double patenting rejection based upon 35 U.S.C. 101. Claim 1,2,4-10 are rejected under 35 U.S.C. 101 as claiming the same invention as that of claims 1-2,4-9,13-15 of prior U.S. Patent No. 12,153,347. This is a statutory double patenting rejection. Response to Arguments 5. Applicants’ arguments filed 9/11/2025 have been fully considered but they are not persuasive. Applicant’s principal arguments are: Neither Thackeray nor Krysak discloses the limitations of general formula M6O4(OH)4XnY12-n where the ratio of X and Y is defined as Z = X/(X+Y)×100 and satisfies the relationship 5 mol% ≤ Z ≤ 95 mol%. In response to Applicant’s arguments, please consider the following comments: Applicant’s arguments are moot because they do not refer to the newly cited Sue et al. reference which does teach the claimed general formula M6O4(OH)4XnY12-n and the relationship is 5 mol% ≤ X/(X+Y)×100 ≤ 95 mol%. See Examples 1-3 of Sue et al. Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to DAH-WEI YUAN whose telephone number is (571)272-1295. The examiner can normally be reached M-F 9am-5pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /Dah-Wei D. Yuan/Supervisory Patent Examiner, Art Unit 1717
Read full office action

Prosecution Timeline

Jun 14, 2022
Application Filed
Jun 12, 2025
Non-Final Rejection mailed — §101, §102, §103
Sep 11, 2025
Response Filed
Oct 16, 2026
Final Rejection mailed — §101, §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
27%
Grant Probability
38%
With Interview (+11.3%)
3y 9m (~0m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 45 resolved cases by this examiner. Grant probability derived from career allowance rate.

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