Office Action Predictor
Last updated: April 16, 2026
Application No. 17/868,730

METHODS AND APPARATUS FOR GENERATING ATMOSPHERIC PRESSURE, LOW TEMPERATURE PLASMA USABLE FOR AFFECTING FLUID FLOW

Non-Final OA §102
Filed
Jul 19, 2022
Examiner
TAI, XIUYU
Art Unit
1795
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Tellapure, LLC
OA Round
1 (Non-Final)
58%
Grant Probability
Moderate
1-2
OA Rounds
3y 3m
To Grant
99%
With Interview

Examiner Intelligence

Grants 58% of resolved cases
58%
Career Allow Rate
586 granted / 1004 resolved
-6.6% vs TC avg
Strong +51% interview lift
Without
With
+50.6%
Interview Lift
resolved cases with interview
Typical timeline
3y 3m
Avg Prosecution
38 currently pending
Career history
1042
Total Applications
across all art units

Statute-Specific Performance

§101
0.3%
-39.7% vs TC avg
§103
43.7%
+3.7% vs TC avg
§102
17.8%
-22.2% vs TC avg
§112
29.0%
-11.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1004 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-13 are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Hidetaka (WO 2023/1952554, see attached English translation. NOTE: PCT application with the prior filing date of April 8, 2022). Regarding claims 1, 5, and 10, Hidetaka discloses a treatment device (ABSTRACT). The apparatus comprises (1) a plasma generating device 100, which includes (i) a dielectric layer 140 having a thickness of 0.05 mm (i.e., a dielectric layer …, Figures 3 & 4, Embodiment 1 & Compatible with Embodiment 1); (ii) a first electrodes 110 on one surface of the dielectric 140 and a second electrode 120 on the opposing surface of the dielectric layer 140, wherein the electrodes are separated in the longitudinal direction of the dielectric layer 140 and the second electrode 120 is covered with an insulating material 140A (i.e., a first electrode …, a second electrode …, an insulator …, Figures 3 & 4, Embodiment 1); and (iii) a power source 100B supplying voltage to the electrodes 110 and 120 for generating atmospheric pressure low-temperature plasma in the areas adjacent to the electrodes (i.e., a power supply …, Figures 3 & 4, Embodiment 1); (2) a cabinet 60 for enclosing the plasma generating device 100, wherein the cabinet 60 includes an inlet and an outlet 62 (i.e., a housing …, Figure 1, Overview of air conditioner); and (3) a fan 10 for drawing gas through the plasma generating device 100 to the outlet 62 (i.e., a fan …, Figure 1, Overview of air conditioner). It has been held that the disclosure in the prior art of any value within the claimed range is an anticipation of that range. And a prima facie case of obviousness exists in the case where the claimed range overlaps range disclosed by the prior art. In re Wertheim 191 USPQ 90. Regarding claims 2 and 6, Hidetaka teaches that the power source 100B supplies voltage to the electrodes 110 and 120 for generating atmospheric pressure low-temperature plasma (Figures 1 & 3, Embodiment 1). It should be noted that the limitation of “so as to change a flow of the fluid …” is a result of operating the device. It has been held that a manner of operating a device does not differentiate the apparatus claim from the prior art (MPEP 2114). Since the device of Hidetaka comprises substantially the same structures as claimed, it is fully capable of performing the claimed functions. Regarding claims 3 and 7, Hidetaka teaches that the dielectric layer 140 has a thickness of 0.05 mm (Figures 3 & 4, compatible with Embodiment 1). Regarding claims 4 and 8, Hidetaka teaches that the dielectric layer 140 has a thickness of 0.05 mm (Figures 3 & 4, compatible with Embodiment 1). Regarding claim 9. Hidetaka teaches that a groove 112 is formed on the first electrode 110 (Figure 4, Modification of Embodiment 1). Regarding claim 11, Hidetaka teaches that at least one heat exchanger 30 A/B is provided (Figure 1, Overview of air conditioner). Regarding claim 12, Hidetaka teaches that a UV lamp 200 and an ultrasonic oscillator are provided adjacent to the plasma generating device 100 (Figure 1, Configuration for air purification installed in air conditioner). Regarding claim 13, Hidetaka teaches that an ozone filter 400 is provided near the outlet 62 (Figure 1, Configuration for air purification installed in air conditioner). Conclusion Claims 1-13 are rejected. Any inquiry concerning this communication or earlier communications from the examiner should be directed to XIUYU TAI whose telephone number is (571)270-1855. The examiner can normally be reached Mon.-Fri. 9:00-5:00. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Luan Van can be reached at 571-272-8521. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /XIUYU TAI/Primary Examiner, Art Unit 1795
Read full office action

Prosecution Timeline

Jul 19, 2022
Application Filed
Oct 11, 2022
Response after Non-Final Action
Aug 29, 2025
Non-Final Rejection — §102
Apr 01, 2026
Response after Non-Final Action

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12584235
METHOD FOR SURFACE TREATMENT
2y 5m to grant Granted Mar 24, 2026
Patent 12582829
PLASMA TREATMENT DEVICES AND METHODS OF USE THEREOF
2y 5m to grant Granted Mar 24, 2026
Patent 12583770
DEVICE FOR TREATMENT OF LIQUIDS AND THE METHOD OF TREATMENT OF LIQUIDS WITH USE OF THIS DEVICE
2y 5m to grant Granted Mar 24, 2026
Patent 12578267
CARBON MEASUREMENTS IN AQUEOUS SAMPLES USING OXIDATION AT ELEVATED TEMPERATURES AND PRESSURES CREATED BY RESISTIVE HEATING
2y 5m to grant Granted Mar 17, 2026
Patent 12551861
APPARATUS FOR TREATING MATERIALS WITH PLASMA
2y 5m to grant Granted Feb 17, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

AI Strategy Recommendation

Get an AI-powered prosecution strategy using examiner precedents, rejection analysis, and claim mapping.
Powered by AI — typically takes 5-10 seconds

Prosecution Projections

1-2
Expected OA Rounds
58%
Grant Probability
99%
With Interview (+50.6%)
3y 3m
Median Time to Grant
Low
PTA Risk
Based on 1004 resolved cases by this examiner. Grant probability derived from career allow rate.

Sign in for Full Analysis

Enter your email to receive a magic link. No password needed.

Free tier: 3 strategy analyses per month