DETAILED ACTION
Notice of Pre-AIA or AIA Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
Claims Status:
Claims 1-6 are pending.
Claims 3-4 are amended.
Claims 1-6 are examined as follow:
Information Disclosure Statement
The information disclosure statement (IDS) submitted on October 31th 2022 and October 31th 2023 ware filed. The submission is in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner.
Claim Interpretation
The following is a quotation of 35 U.S.C. 112(f):
(f) Element in Claim for a Combination. – An element in a claim for a combination may be expressed as a means or step for performing a specified function without the recital of structure, material, or acts in support thereof, and such claim shall be construed to cover the corresponding structure, material, or acts described in the specification and equivalents thereof.
The following is a quotation of pre-AIA 35 U.S.C. 112, sixth paragraph:
An element in a claim for a combination may be expressed as a means or step for performing a specified function without the recital of structure, material, or acts in support thereof, and such claim shall be construed to cover the corresponding structure, material, or acts described in the specification and equivalents thereof.
The claims in this application are given their broadest reasonable interpretation using the plain meaning of the claim language in light of the specification as it would be understood by one of ordinary skill in the art. The broadest reasonable interpretation of a claim element (also commonly referred to as a claim limitation) is limited by the description in the specification when 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, is invoked.
As explained in MPEP § 2181, subsection I, claim limitations that meet the following three-prong test will be interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph:
(A) the claim limitation uses the term “means” or “step” or a term used as a substitute for “means” that is a generic placeholder (also called a nonce term or a non-structural term having no specific structural meaning) for performing the claimed function;
(B) the term “means” or “step” or the generic placeholder is modified by functional language, typically, but not always linked by the transition word “for” (e.g., “means for”) or another linking word or phrase, such as “configured to” or “so that”; and
(C) the term “means” or “step” or the generic placeholder is not modified by sufficient structure, material, or acts for performing the claimed function.
Use of the word “means” (or “step”) in a claim with functional language creates a rebuttable presumption that the claim limitation is to be treated in accordance with 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph. The presumption that the claim limitation is interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, is rebutted when the claim limitation recites sufficient structure, material, or acts to entirely perform the recited function.
Absence of the word “means” (or “step”) in a claim creates a rebuttable presumption that the claim limitation is not to be treated in accordance with 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph. The presumption that the claim limitation is not interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, is rebutted when the claim limitation recites function without reciting sufficient structure, material or acts to entirely perform the recited function.
Claim limitations in this application that use the word “means” (or “step”) are being interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, except as otherwise indicated in an Office action. Conversely, claim limitations in this application that do not use the word “means” (or “step”) are not being interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, except as otherwise indicated in an Office action.
Claim limitation “conveying means” in claims 1, and 5-6 have been interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, because it uses/they use the word “means" coupled with functional language “that conveys…” without reciting sufficient structure to achieve the function. Furthermore, the “means” is not preceded with a sufficient structural modifier, except just a term “conveying”. A review of the specification shows that, although it is not clear, the following appears to be the corresponding structure described in the specification for the 35 U.S.C. 112, sixth paragraph limitation: The limitation “conveying means" has been described in Paragraph 0012 cited: “…In the above-described drawing method, the conveying means may have a cylindrical shape, and include a conveying drum that supports the substrate on part of a region of an outer periphery and conveys the substrate by rotating about a central shaft of the cylinder, and the conveying drum may rotate for a time or a rotation angle…”.
Claim Rejections - 35 USC § 112
The following is a quotation of 35 U.S.C. 112(b):
(b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention.
The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph:
The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention.
Claims 1-6 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second -paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention.
Claim 1 is indefinite, because:
the limitation “…a pattern…” is recited twice in the claim line 10 and 12. It is unclear how many pattern is being claimed. Clarification is required. For examination purposes, it is assumed that such limitation is not the same pattern, because based on the what the limitation follow, in line 10 it read “…a pattern in a width…” and in line 12 it read “…a pattern in the width…”. It is suggested that If such assumption is inaccurate, further amendment to clarify is recommended.
The limitation “…a beam for exposure…” in recited twice in line 2 and 8, it is unclear how many beam is being claimed. Clarification is required. For examination purposes, it is assumed that they are the same. It is suggested the modify the “a beam for exposure” in line 8 to “the beam for exposure”.
Claim 5 is indefinite, because:
the limitation “…a pattern…” is recited twice in the claim line 12 and 14 . It is unclear how many pattern is being claimed. Clarification is required. For examination purposes, it is assumed that such limitation is not the same pattern, because based on the what the limitation follow, in line 12 it read “…a pattern in a width…” and in line 14 it read “…a pattern in the width…”. It is suggested that If such assumption is inaccurate, further amendment to clarify is recommended.
The limitation “…a beam for exposure…” in recited twice in line 2 and 6-7, it is unclear how many beam is being claimed. Clarification is required. For examination purposes, it is assumed that they are the same. It is suggested the modify the “a beam for exposure” in line 6-7 to “the beam for exposure”.
Claim 6 is indefinite, because:
the limitation “…a pattern…” is recited twice in the claim line 11 and 13 . It is unclear how many pattern is being claimed. Clarification is required. For examination purposes, it is assumed that such limitation is not the same pattern, because based on the what the limitation follow, in line 11 it read “…a pattern in a width…” and in line 13 it read “…a pattern in the width…”. It is suggested that If such assumption is inaccurate, further amendment to clarify is recommended.
The limitation “…a beam for exposure…” in recited twice in line 3 and 9-10, it is unclear how many beam is being claimed. Clarification is required. For examination purposes, it is assumed that they are the same. It is suggested the modify the “a beam for exposure” in line 9-10 to “the beam for exposure”.
Claims 2-4 are all dependent claims of 1, and are rejected based on the inherited deficiencies.
Claim Rejections - 35 USC § 101
35 U.S.C. 101 reads as follows:
Whoever invents or discovers any new and useful process, machine, manufacture, or composition of matter, or any new and useful improvement thereof, may obtain a patent therefor, subject to the conditions and requirements of this title.
Claim 6 is rejected under 35 U.S.C. 101 because the claimed invention is directed to non-statutory subject matter. The claim(s) does/do not fall within at least one of the four categories of patent eligible subject matter because:
In Claim 6, the claimed invention is directed to non-statutory subject matter of signal per se, even though the present application’s specification does discuss medium with 'non-transitory' but the specification uses open ended language so the implication is it could cover the BRI. The broadest reasonable interpretation of the claims therefore cover forms of non‐transitory tangible media and transitory propagating signals per se in view of the ordinary and customary meaning of computer readable media. The specification appears to be open ended about what comprises a computer readable medium. Accordingly, since the broadest reasonable interpretation of claim 6 covers a signal per se, the claims are considered as covering non‐statutory subject matter (In Re Nuijten, 500 F.3d 1436, 1356‐57 Fed. Cir. 2007; Interim Examination Instructions for Evaluating Subject Matter Eligibility Under 35 U.S.C. 101, 24 Aug 2009 p. 2). Accordingly, the recited medium of claim 19 is nonstatutory subject matter. The Examiner respectfully recommends amending the preamble of claim 19 to "A non‐transitory tangible computer‐readable storage medium…”.
Claim Rejections - 35 USC § 102
In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status.
The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action:
A person shall be entitled to a patent unless –
(a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention.
Claims 1-6 are rejected under 35 U.S.C. 102(a)1 as being anticipated by JP2016224301A herein set forth as JP224301A.
Regarding claim 1, JP224301A discloses a drawing method to be executed by a drawing device (a roll-to-roll type exposure apparatus, fig.1) for drawing a wiring pattern by irradiating a substrate (a long substrate “W” in fig.1) having a long sheet shape (refer to the shape of a long substrate “W” in fig.1) with a beam for exposure (exposure unit #30, fig.1) while conveying the substrate (a long substrate “W” in fig.1) in a longitudinal direction (refer to the direction of “M” in fig.1) of the substrate (a long substrate “W” in fig.1),
wherein the drawing device (a roll-to-roll type exposure apparatus, fig.1) comprises:
conveying means (refer to “rollers and reels #11-#15 and #21-#25” in fig. 1) that conveys the substrate (a long substrate “W” in fig.1) along the longitudinal direction (refer to the direction of “M” in fig.1); and
at least one head (exposure unit #30, fig.1) and for exposure that is provided opposite to part of a region (refer to the region underneath the exposure unit #30 in fig.1) of the substrate (a long substrate “W” in fig.1) to be conveyed by the conveying means (refer to “rollers and reels #11-#15 and #21-#25” in fig. 1) and that emits a beam for exposure (exposure unit #30, fig.1) toward the part of the region (refer to the region underneath the exposure unit #30 in fig.1) of the substrate (a long substrate “W” in fig.1),
wherein the wiring pattern (refer to the pattern of 3 different “PL” annotated in fig.3) includes first regions (refer to one of the 3 different “PL” annotated in fig.3), in which a pattern (refer to the pattern of “PL” in fig.3) in a width direction (refer to “Y” axis in fig.3) orthogonal to the longitudinal direction (refer to “X” axis and the direction of “M”) the changes in the longitudinal direction (refer to fig.7), and second regions (refer to another one of the 3 different “PL” annotated in fig.3), in which a pattern (refer to the pattern of 3 different “PL” annotated in fig.3 and 7) in the width direction (refer to “Y” axis in fig.3) does not change in the longitudinal direction (refer to “X” axis and the direction of “M”), wherein drawing data for drawing the wiring pattern (refer to the 3 different “PL” annotated in fig.3) includes two-dimensional image data (referring to the conveying mean movement data and the exposure unit’s beam movement data) representing a two-dimensional pattern (referring to the conveying mean movement and the exposure unit’s beam movement) of the first regions (refer to one of the 3 different “PL” annotated in fig.3), one-dimensional image data (referring the exposure unit beam movement data) representing a one-dimensional pattern (referring the exposure unit beam movement) in the width direction (refer to “Y” axis in fig.3) of the second regions (refer to another one of the 3 different “PL” annotated in fig.3), and information representing lengths in the longitudinal direction (refer to “X” axis and the direction of “M”) of the second regions (refer to another one of the 3 different “PL” annotated in fig.3),
the method comprising:
drawing the pattern (refer to the pattern of 3 different “PL” annotated in fig.3 and 7) of the first regions (refer to one of the 3 different “PL” annotated in fig.3) on the substrate (a long substrate “W” in fig.1) by scanning the beam (exposure unit #30, fig.1) in the width direction (refer to “Y” axis in fig.3) based on the two-dimensional image data (referring to the conveying mean movement data and the exposure unit’s beam movement data) and conveying the substrate (a long substrate “W” in fig.1); and
drawing the pattern (refer to the pattern of 3 different “PL” annotated in fig.3 and 7) of the second regions (refer to another one of the 3 different “PL” annotated in fig.3) on the substrate (a long substrate “W” in fig.1) by repeatedly irradiating the substrate (a long substrate “W” in fig.1) with the beam (exposure unit #30, fig.1) in the one-dimensional pattern (referring the exposure unit beam movement) in the width direction (refer to “Y” axis in fig.3) based on the one-dimensional image data (referring the exposure unit beam movement data) and conveying the substrate (a long substrate “W” in fig.1) for a length (refer to “X” axis and the direction of “M”) determined based on the information representing lengths (refer as the conveying speed).
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Regarding claim 2, JP224301A discloses substantially all features set forth in claim 1, JP224301A further discloses wherein the two-dimensional image data (referring to the conveying mean movement data and the exposure unit’s beam movement data) is a two-dimensional bitmap data (refer as image in citation below and to the conveying mean movement data and the exposure unit’s beam movement data), wherein the one-dimensional image data (referring the exposure unit beam movement data and the exposure unit’s beam movement data) is one-dimensional bitmap data (refer as image in citation below and the exposure unit’s beam movement), and wherein the information (refer as conveying speed) representing lengths (refer to “position information” cited in Page 3, 7th paragraph below) is attached to a header (refer to “…The image captured by each alignment camera 41 is subjected to image processing by the image processing unit 60a (see FIG. 4), and the position information of the pattern alignment mark MP is acquired by the mark position detecting means 60b…” in page 3, 7th paragraph below) of the one- dimensional bitmap data (refer to Page 3, 7th paragraph cited: “…The pair of alignment cameras 41 is installed on the upstream side of the exposure unit 51 and images the pattern alignment marks MP formed on the long substrate W by exposure. The image captured by each alignment camera 41 is subjected to image processing by the image processing unit 60a (see FIG. 4), and the position information of the pattern alignment mark MP is acquired by the mark position detecting means 60b…”, also Page 4 2nd paragraph cited: “…The image processing unit 60a (mark position detecting means) acquires the position information of the substrate end surface EW, so that the exposed divided exposure pattern data DP1 to DP5 are twisted (meandering) and the divided exposure pattern data DP1 to DP5 are exposed obliquely. Can be prevented from protruding outside the workpiece. Specifically, for example, when determining the exposure positions of the divided exposure pattern data DP1 to DP5, the X direction correction amount of the divided exposure pattern data DP1 to DP5 is at least one pattern alignment mark MP of the pair of pattern alignment data MP. The Y direction correction amount is determined based on the position information of at least one substrate end face EW or the position information of at least one pattern alignment mark MP…”, Examiner note: every digital image is a bitmap, except old camera that uses film. When the prior art of record JP224301A describing “…divided exposure pattern data DP1 to DP5…” and “…the X direction correction amount of the divided exposure pattern DP1 to DP5…”, such action can only be taken on a digital pixeled image, which is bitmap ).
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Regarding claim 3, JP224301A discloses substantially all features set forth in claim 1, JP224301A further discloses wherein the conveying means (refer to “rollers and reels #11-#15 and #21-#25” in fig. 1) has a cylindrical shape (refer to the shape of the “rollers and reels #11-#15 and #21-#25” in fig. 1) , and includes a conveying drum (refer to winding unit #20 in fig.1) that supports the substrate (a long substrate “W” in fig.1) on part of a region of an outer periphery (refer to the location of winding unit #20 in fig.1) and conveys the substrate (a long substrate “W” in fig.1) by rotating about a central shaft of the cylinder (refer to any one of the rollers or reel in #20 in fig.1), and wherein the conveying drum (refer to any one of the rollers or reel in #20 in fig.1) rotates for a time or a rotation angle (refer as winding speed that control the conveying speed), which is determined based on the information representing lengths (refer to fig.7), while the beam (exposure unit #30, fig.1) is repeatedly applied based on the one-dimensional image data (referring the exposure unit beam movement data).
Regarding claim 4, JP224301A discloses substantially all features set forth in claim 3, JP224301A further discloses reading image data (image processing unit #60a, fig.4) included in the drawing data (refer to Page 3 7th paragraph citation below) for drawing the wiring pattern for each region (refer to the 3 different “PL” annotated in fig.3) included in the wiring pattern (refer to the pattern of 3 different “PL” annotated in fig.3);
determining whether the read image data (image processing unit #60a, fig.4) is either the two-dimensional image data (referring to the conveying mean movement data and the exposure unit’s beam movement data) or the one-dimensional image data (referring the exposure unit beam movement data); and
drawing the pattern (refer to the pattern of 3 different “PL” annotated in fig.3 and 7) of the first regions (refer to one of the 3 different “PL” annotated in fig.3) or the second regions (refer to another one of the 3 different “PL” annotated in fig.3) depending on the result of the determination (refer to Page 3, 7th paragraph cited: “…The pair of alignment cameras 41 is installed on the upstream side of the exposure unit 51 and images the pattern alignment marks MP formed on the long substrate W by exposure. The image captured by each alignment camera 41 is subjected to image processing by the image processing unit 60a (see FIG. 4), and the position information of the pattern alignment mark MP is acquired by the mark position detecting means 60b…”).
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Regarding claim 5, JP224301A discloses A drawing device (a roll-to-roll type exposure apparatus, fig.1) for drawing a wiring pattern (refer to the pattern of 3 different “PL” annotated in fig.3) by irradiating a substrate (a long substrate “W” in fig.1) having a long sheet shape (refer to the shape of a long substrate “W” in fig.1) with a beam for exposure (exposure unit #30, fig.1) while conveying the substrate (a long substrate “W” in fig.1) in a longitudinal direction (refer to the direction of “M” in fig.1) of the substrate (a long substrate “W” in fig.1), comprising:
conveying means (refer to “rollers and reels #11-#15 and #21-#25” in fig. 1) that conveys the substrate (a long substrate “W” in fig.1) along the longitudinal direction (refer to the direction of “M” in fig.1);
at least one head (exposure unit #30, fig.1) and for exposure that is provided opposite to part of a region (refer to the region underneath the exposure unit #30 in fig.1) of the substrate (a long substrate “W” in fig.1) to be conveyed by the conveying means (refer to “rollers and reels #11-#15 and #21-#25” in fig. 1) and that emits a beam for exposure (exposure unit #30, fig.1) toward the part of the region (refer to the region underneath the exposure unit #30 in fig.1) of the substrate (a long substrate “W” in fig.1);
a storage part (data storage means #60e, fig.4) that stores drawing data (referring to the conveying mean movement data and the exposure unit’s beam movement data) for drawing the wiring pattern (refer to the pattern of 3 different “PL” annotated in fig.3) on the substrate (a long substrate “W” in fig.1); and
a control part (control unit #60, fig.4) that controls operations (refer to Exposure unit driving unit #52, supply reel drive unit #11a, brake roller driving units #15a and 25b , fig.4) of the at least one head (exposure unit #30, fig.1) for exposure and the conveying means (refer to “rollers and reels #11-#15 and #21-#25” in fig. 1) based on the drawing data (referring to the conveying mean movement data and the exposure unit’s beam movement data),
wherein the wiring pattern (refer to the pattern of 3 different “PL” annotated in fig.3) includes first regions (refer to one of the 3 different “PL” annotated in fig.3), in which a pattern (refer to the pattern of “PL” in fig.3) in a width direction (refer to “Y” axis in fig.3) orthogonal to the longitudinal direction (refer to “X” axis and the direction of “M”) changes in the longitudinal direction (refer to “X” axis and the direction of “M”), and second regions (refer to another one of the 3 different “PL” annotated in fig.3), in which a pattern (refer to the pattern of “PL” in fig.3) in the width direction (refer to “Y” axis in fig.3) does not change in the longitudinal direction (refer to “X” axis and the direction of “M”),
wherein drawing data (referring to the conveying mean movement data and the exposure unit’s beam movement data) includes two-dimensional image data (referring to the conveying mean movement data and the exposure unit’s beam movement data) representing a two- dimensional pattern (referring to the conveying mean movement data and the exposure unit’s beam movement) of the first regions (refer to one of the 3 different “PL” annotated in fig.3), one-dimensional image data (referring to the exposure unit’s beam movement data) representing a one- dimensional pattern (referring to the exposure unit’s beam movement) in the width direction (refer to “Y” axis in fig.3) of the second regions (refer to another one of the 3 different “PL” annotated in fig.3), and information representing lengths in the longitudinal direction (refer to “X” axis and the direction of “M”) of the second regions (refer to another one of the 3 different “PL” annotated in fig.3),
wherein the control part (control unit #60, fig.4) performs the control of executing:
a first drawing step (refer to “DP1” in fig.6) of drawing the pattern (refer to the pattern of “PL” in fig.3) of the first regions (refer to the region of “DP1” in fig.6) on the substrate (a long substrate “W” in fig.1) by scanning the beam (exposure unit #30, fig.1) in the width direction (refer to “Y” axis in fig.3) based on the two-dimensional image data (referring to the conveying mean movement and the exposure unit’s beam movement) and conveying the substrate (a long substrate “W” in fig.1); and
a second drawing step (refer to “DP2” in fig.6) of drawing the pattern (refer to the pattern of “PL” in fig.3) of the second regions (refer to the region of “DP2” in fig.6) on the substrate (a long substrate “W” in fig.1) by repeatedly irradiating the substrate (a long substrate “W” in fig.1) with the beam (exposure unit #30, fig.1) in the one-dimensional pattern (referring to the exposure unit’s beam movement) in the width direction (refer to “Y” axis in fig.3) based on the one-dimensional image data (referring to the exposure unit’s beam movement data) and conveying the substrate (a long substrate “W” in fig.1) for a length (refer to “X” axis and the direction of “M”) determined based on the information representing lengths (refer as conveying speed) (refer to Page 3, 7th paragraph cited: “…The pair of alignment cameras 41 is installed on the upstream side of the exposure unit 51 and images the pattern alignment marks MP formed on the long substrate W by exposure. The image captured by each alignment camera 41 is subjected to image processing by the image processing unit 60a (see FIG. 4), and the position information of the pattern alignment mark MP is acquired by the mark position detecting means 60b…”, also Page 4 2nd paragraph cited: “…The image processing unit 60a (mark position detecting means) acquires the position information of the substrate end surface EW, so that the exposed divided exposure pattern data DP1 to DP5 are twisted (meandering) and the divided exposure pattern data DP1 to DP5 are exposed obliquely. Can be prevented from protruding outside the workpiece. Specifically, for example, when determining the exposure positions of the divided exposure pattern data DP1 to DP5, the X direction correction amount of the divided exposure pattern data DP1 to DP5 is at least one pattern alignment mark MP of the pair of pattern alignment data MP. The Y direction correction amount is determined based on the position information of at least one substrate end face EW or the position information of at least one pattern alignment mark MP…”).
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Regarding claim 6, JP224301A discloses A computer readable storage medium storing a drawing program to be executed by A drawing device (a roll-to-roll type exposure apparatus, fig.1) for drawing a wiring pattern (refer to the pattern of 3 different “PL” annotated in fig.3) by irradiating a substrate (a long substrate “W” in fig.1) having a long sheet shape (refer to the shape of a long substrate “W” in fig.1) with a beam for exposure (exposure unit #30, fig.1) while conveying the substrate (a long substrate “W” in fig.1) in a longitudinal direction (refer to the direction of “M” in fig.1) of the substrate (a long substrate “W” in fig.1),
wherein the drawing device (a roll-to-roll type exposure apparatus, fig.1) comprises:
conveying means (refer to “rollers and reels #11-#15 and #21-#25” in fig. 1) that conveys the substrate (a long substrate “W” in fig.1) along the longitudinal direction (refer to the direction of “M” in fig.1); and
at least one head (exposure unit #30, fig.1) and for exposure that is provided opposite to part of a region (refer to the region underneath the exposure unit #30 in fig.1) of the substrate (a long substrate “W” in fig.1) to be conveyed by the conveying means (refer to “rollers and reels #11-#15 and #21-#25” in fig. 1) and that emits a beam for exposure (exposure unit #30, fig.1) toward the part of the region (refer to the region underneath the exposure unit #30 in fig.1) of the substrate (a long substrate “W” in fig.1),
wherein the wiring pattern (refer to the pattern of 3 different “PL” annotated in fig.3) includes first regions (refer to one of the 3 different “PL” annotated in fig.3), in which a pattern (refer to the pattern of “PL” in fig.3) in a width direction (refer to “Y” axis in fig.3) orthogonal to the longitudinal direction (refer to “X” axis and the direction of “M”) changes in the longitudinal direction (refer to “X” axis and the direction of “M”), and second regions (refer to another one of the 3 different “PL” annotated in fig.3), in which a pattern (refer to the pattern of “PL” in fig.3) in the width direction (refer to “Y” axis in fig.3) does not change in the longitudinal direction (refer to “X” axis and the direction of “M”),
wherein drawing data (referring to the conveying mean movement data and the exposure unit’s beam movement data) includes two-dimensional image data (referring to the conveying mean movement data and the exposure unit’s beam movement data) representing a two- dimensional pattern (referring to the conveying mean movement data and the exposure unit’s beam movement) of the first regions (refer to one of the 3 different “PL” annotated in fig.3), one-dimensional image data (referring to the exposure unit’s beam movement data) representing a one- dimensional pattern (referring to the exposure unit’s beam movement) in the width direction (refer to “Y” axis in fig.3) of the second regions (refer to another one of the 3 different “PL” annotated in fig.3), and information representing lengths in the longitudinal direction (refer to “X” axis and the direction of “M”) of the second regions (refer to another one of the 3 different “PL” annotated in fig.3),
wherein the drawing program causes the execution of:
a first drawing step (refer to “DP1” in fig.6) of drawing the pattern (refer to the pattern of “PL” in fig.3) of the first regions (refer to the region of “DP1” in fig.6) on the substrate (a long substrate “W” in fig.1) by scanning the beam (exposure unit #30, fig.1) in the width direction (refer to “Y” axis in fig.3) based on the two-dimensional image data (referring to the conveying mean movement and the exposure unit’s beam movement) and conveying the substrate (a long substrate “W” in fig.1); and
a second drawing step (refer to “DP2” in fig.6) of drawing the pattern (refer to the pattern of “PL” in fig.3) of the second regions (refer to the region of “DP2” in fig.6) on the substrate (a long substrate “W” in fig.1) by repeatedly irradiating the substrate (a long substrate “W” in fig.1) with the beam (exposure unit #30, fig.1) in the one-dimensional pattern (referring to the exposure unit’s beam movement) in the width direction (refer to “Y” axis in fig.3) based on the one-dimensional image data (referring to the exposure unit’s beam movement data) and conveying the substrate (a long substrate “W” in fig.1) for a length (refer to “X” axis and the direction of “M”) determined based on the information representing lengths (refer as conveying speed) (refer to Page 3, 7th paragraph cited: “…The pair of alignment cameras 41 is installed on the upstream side of the exposure unit 51 and images the pattern alignment marks MP formed on the long substrate W by exposure. The image captured by each alignment camera 41 is subjected to image processing by the image processing unit 60a (see FIG. 4), and the position information of the pattern alignment mark MP is acquired by the mark position detecting means 60b…”, also Page 4 2nd paragraph cited: “…The image processing unit 60a (mark position detecting means) acquires the position information of the substrate end surface EW, so that the exposed divided exposure pattern data DP1 to DP5 are twisted (meandering) and the divided exposure pattern data DP1 to DP5 are exposed obliquely. Can be prevented from protruding outside the workpiece. Specifically, for example, when determining the exposure positions of the divided exposure pattern data DP1 to DP5, the X direction correction amount of the divided exposure pattern data DP1 to DP5 is at least one pattern alignment mark MP of the pair of pattern alignment data MP. The Y direction correction amount is determined based on the position information of at least one substrate end face EW or the position information of at least one pattern alignment mark MP…”).
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477
695
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495
731
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535
703
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686
562
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724
528
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Conclusion
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/YEONG JUEN THONG/Examiner, Art Unit 3761 January 27th 2026
/STEVEN W CRABB/Supervisory Patent Examiner, Art Unit 3761