Prosecution Insights
Last updated: May 29, 2026
Application No. 17/928,253

CERAMIC SUBSTRATE, ALN SINGLE CRYSTAL, ALN WHISKER, AND ALN WHISKER COMPOSITE

Non-Final OA §102§103
Filed
Nov 28, 2022
Priority
Aug 07, 2020 — JP 2020-134777 +1 more
Examiner
AUER, LAURA A
Art Unit
1783
Tech Center
1700 — Chemical & Materials Engineering
Assignee
U-MAP Co., Ltd.
OA Round
1 (Non-Final)
49%
Grant Probability
Moderate
1-2
OA Rounds
3m
Est. Remaining
84%
With Interview

Examiner Intelligence

Grants 49% of resolved cases
49%
Career Allowance Rate
231 granted / 470 resolved
-15.9% vs TC avg
Strong +35% interview lift
Without
With
+34.6%
Interview Lift
resolved cases with interview
Typical timeline
3y 9m
Avg Prosecution
38 currently pending
Career history
519
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
81.6%
+41.6% vs TC avg
§102
7.6%
-32.4% vs TC avg
§112
3.6%
-36.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 470 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Group I, claims 1-8 and 12-18, in the reply filed on December 23, 2025 is acknowledged. Note that Applicant cancelled the non-elected claims. Claim Objections Claim 5 is objected to because of the following informalities: “boy” in line 2 should be “body.” Appropriate correction is required. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-3, 13, 15, 17 and 18 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Takeuchi et al. (JP 2018/153533). Regarding claim 1, Takeuchi discloses an AlN sintered body comprising AlN whiskers having a fibrous AlN single crystal [0001 & 0008]. Note that the AlN sintered body corresponds to the claimed ceramic substrate. Regarding claim 2, while the reference does not specifically disclose the claimed thermal conductivity and fracture toughness, given the reference discloses a ceramic substrate comprising the same material and the same shape and type of particle, it is expected that the disclosed and claimed substrates will have similar properties regarding thermal conductivity and fracture toughness, see above discussion and MPEP 2112.01 “If the composition is physically the same, it must have the same properties.” Regarding claim 3, the reference discloses the single crystal as hexagonal, which corresponds to the hexagonal wurtzite structure [0059]. While the reference does not specifically disclose the claimed ratio of plane peak intensity, given the disclosed substrate comprises the same material, same particle shape and same crystalline structure as the claimed substrate, it is expected that the disclosed and claimed substrates will have similar properties regarding the ratio of plane peak intensity, see above discussion and MPEP 2112.01 “If the composition is physically the same, it must have the same properties.” Regarding claim 13, the reference discloses that the sintered body includes AlN polycrystalline particles [0012]. Regarding claim 15, while the reference does not specifically disclose the claimed ratio of plane peak intensity, given the disclosed substrate comprises the same material, same particle shape and same crystalline structure as the claimed substrate, it is expected that the disclosed and claimed substrates will have similar properties regarding the ratio of plane peak intensity, see above discussion and MPEP 2112.01 “If the composition is physically the same, it must have the same properties.” Regarding claims 17 and 18, the reference discloses the sintered body as a plate shape with the single crystals orthogonal and along the surface of the sintered body, see Fig. 1 and [0025]. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 4, 7, 8, 12 and 14 are rejected under 35 U.S.C. 103 as being unpatentable over Takeuchi et al. (JP 2018/153533). Regarding claims 4 and 7, Takeuchi discloses an oxygen containing layer covering the AlN crystal in order to prevent penetration of oxygen molecules and water molecules [0008 & 0031]. The layer is sufficiently thin so the volume ratio of the AlN single crystal in the AlN whisker is sufficiently large [0031]. Since the oxygen containing layer having low thermal conductivity is thin, the AlN whisker is superior in thermal conductivity [0032]. While the reference does not specifically disclose the claimed wt% of oxygen, it would have been obvious to one of ordinary skill in the art at the time of the invention to control the thickness, thereby the mass, of the oxygen containing layer in order to prevent penetration of oxygen and water molecules while still allowing for high thermal conductivity. Wherein the general conditions of a claim are disclosed in the prior art, discovering the optimum or workable ranges involves only routine skill in the art, absent a showing of criticality; see MPEP 2144.05 II. The reference further discloses the single crystal as hexagonal, which corresponds to the hexagonal wurtzite structure [0059]. Regarding claim 8, the reference discloses a plurality of whiskers included in the sintered body with the diameter of the whiskers as 0.1 microns or more and 50 microns or less, see Fig. 1 [0027]. Additionally, the reference discloses an oxygen containing layer covering the AlN crystal in order to prevent penetration of oxygen molecules and water molecules [0008 & 0031]. The reference further discloses the single crystal as hexagonal, which corresponds to the hexagonal wurtzite structure [0059]. Note that based on the disclosed diameter, the reference is considered to render the claimed vol% with whiskers having a diameter of less than 1 micron; see MPEP 2144.05 I regarding overlapping ranges. Regarding claim 12, the reference discloses the length of the whisker as 1 micron or more and 5 cm or less, which overlaps the claimed range [0027]; see MPEP 2144.05 I. Regarding claim 14, while the reference fails to disclose the size of the AlN polycrystalline particles, the reference does disclose other insulating particles (ZrO2) as having a diameter from 1 micron or more and 100 microns or less [0012, 0025 & 0026]. As such, it would have been obvious to one of ordinary skill in the art at the time of the invention that the insulating AlN particles could also have the disclosed diameter as a suitable size for the one or more types of insulating particles covering the AlN whiskers; see MPEP 2144.05 I regarding overlapping ranges. Claims 5 and 16 are rejected under 35 U.S.C. 103 as being unpatentable over Takeuchi et al. (JP 2018/153533) as applied to claim 1 above, and further in view of Sugiura et al. (US 4,863,658). Takeuchi discloses the ceramic substrate of claim 1 wherein the substrate may be used as an insulating substrate for electronic devices, see above discussion and [0001]. The reference, however, fails to disclose the claimed roughness and a metal layer provided on the surface of the substrate. Sugiura discloses an aluminum nitride ceramic substrate wherein the plates are enabled to acquire improved adhesiveness to a metal film or foil when they are subjected to a heat treatment adapted to reduce the roughness to below 10 microns, see abstract. Additionally, the reference discloses the substrate are used for various parts such as substrates for power transistor modules, see col. 1 lines 15-20. It would have been obvious to one of ordinary skill in the art at the time of the invention for the substrate of Takeuchi to have the roughness of Sugiura in order to improve adhesiveness of the substrate to a metal film or foil; see MPEP 2144.05 I regarding overlapping ranges. Additionally, it would have been obvious to one of ordinary skill in the art at the time of the invention to provide a metal film or foil on the substrate of Takeuchi for the purpose of the formation of a conductor pattern; see Sugiura col. 1 lines 61-68. Claim 6 is rejected under 35 U.S.C. 103 as being unpatentable over Takeuchi et al. (JP 2018/153533) as applied to claim 13 above, and further in view of Fukunaga et al. (US 2015/0353355). Takeuchi discloses the ceramic substrate of claim 1 comprising one or more insulating particles covering the AlN whiskers wherein the insulating particles may be AlN particles, see above discussion and [0008]. The reference, however, fails to disclose the particles as single crystals. Fukunaga discloses large size single crystal particles as having higher heat conductivity than a polycrystal [0008]. It would have been obvious to one of ordinary skill in the art at the time of the invention for the AlN particles of Takeuchi to be single crystals in order to provide higher heat conductivity. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to LAURA A AUER whose telephone number is (571)270-5669. The examiner can normally be reached Monday - Friday 9 am - 4 pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, M. Veronica Ewald can be reached at (571)272-8519. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /LAURA A AUER/ Primary Examiner, Art Unit 1783
Read full office action

Prosecution Timeline

Nov 28, 2022
Application Filed
Mar 11, 2026
Non-Final Rejection mailed — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
49%
Grant Probability
84%
With Interview (+34.6%)
3y 9m (~3m remaining)
Median Time to Grant
Low
PTA Risk
Based on 470 resolved cases by this examiner. Grant probability derived from career allowance rate.

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