Prosecution Insights
Last updated: April 18, 2026
Application No. 17/975,027

Diamond Structures For Tooling

Final Rejection §103§112
Filed
Oct 27, 2022
Examiner
HOLIZNA, CALEB ANDREW
Art Unit
3723
Tech Center
3700 — Mechanical Engineering & Manufacturing
Assignee
Akhan Semiconductor Inc.
OA Round
2 (Final)
67%
Grant Probability
Favorable
3-4
OA Rounds
2y 9m
To Grant
99%
With Interview

Examiner Intelligence

Grants 67% — above average
67%
Career Allow Rate
85 granted / 127 resolved
-3.1% vs TC avg
Strong +37% interview lift
Without
With
+36.8%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
56 currently pending
Career history
183
Total Applications
across all art units

Statute-Specific Performance

§101
0.3%
-39.7% vs TC avg
§103
48.5%
+8.5% vs TC avg
§102
25.0%
-15.0% vs TC avg
§112
21.3%
-18.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 127 resolved cases

Office Action

§103 §112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Specification The lengthy specification has not been checked to the extent necessary to determine the presence of all possible minor errors. Applicant’s cooperation is requested in correcting any errors of which applicant may become aware in the specification. Claim Rejections - 35 USC § 112 The following is a quotation of the first paragraph of 35 U.S.C. 112(a): (a) IN GENERAL.—The specification shall contain a written description of the invention, and of the manner and process of making and using it, in such full, clear, concise, and exact terms as to enable any person skilled in the art to which it pertains, or with which it is most nearly connected, to make and use the same, and shall set forth the best mode contemplated by the inventor or joint inventor of carrying out the invention. The following is a quotation of the first paragraph of pre-AIA 35 U.S.C. 112: The specification shall contain a written description of the invention, and of the manner and process of making and using it, in such full, clear, concise, and exact terms as to enable any person skilled in the art to which it pertains, or with which it is most nearly connected, to make and use the same, and shall set forth the best mode contemplated by the inventor of carrying out his invention. Claims 1-37 are rejected under 35 U.S.C. 112(a) or 35 U.S.C. 112 (pre-AIA ), first paragraph, as failing to comply with the written description requirement. The claim(s) contains subject matter which was not described in the specification in such a way as to reasonably convey to one skilled in the relevant art that the inventor or a joint inventor, or for applications subject to pre-AIA 35 U.S.C. 112, the inventor(s), at the time the application was filed, had possession of the claimed invention. Claims 1, 13, 25, and 37 recite “the diamond layer is formed to be substantially smooth and minimally abrasive to a contacting surface” but Applicant’s specification fails to provide any support for the limitation. Claims 1-12, 14-24, and 26-36 are rejected as being dependent on a rejected claim. The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 1-37 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. The terms “substantially smooth” and “minimally abrasive” in claims 1, 13, 25, and 37 are relative terms which renders the claim indefinite. The terms “substantially smooth” and “minimally abrasive” are not defined by the claim, the specification does not provide a standard for ascertaining the requisite degree, and one of ordinary skill in the art would not be reasonably apprised of the scope of the invention. It is unclear to examiner what constitutes a diamond layer as being substantially smooth as smooth is a term which is relative to something else (i.e. both the smoothness of the diamond layer and the contacting surface would have to be defined) and abrasive is also a term which is relative to something else (i.e. both the abrasiveness of the diamond layer and the contacting surface would have to be defined). Examiner notes that in contrast “substantially uniformly thick” is not indefinite because being substantially uniformly thick is a property of the layer relative to itself, not another structure. For the sake of compact prosecution and for use in this office action, examiner is interpreting the limitation of “the diamond layer is formed to be substantially smooth and minimally abrasive to a contacting surface” to be met if the diamond layer has “a thickness between 10 nanometers and 1000 nanometers and formed from diamond grains sized to be 50% or less of diamond layer thickness”. Claims 1-12, 14-24, and 26-36 are rejected as being dependent on a rejected claim. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1-11, 13-14, 16-23, 25-35, and 37 are rejected under 35 U.S.C. 103 as being unpatentable over Song et al. (US20130225052), hereinafter Song, in view of Deguchi et al. (US6068883), hereinafter Deguchi. Regarding claim 1, Song discloses A structure, comprising: a substrate (Fig. 1 element 10) having a surface (Fig. 2, the top surface of the substrate shown) including at least one sidewall (see annotated Fig. 2 below); and a diamond layer (Fig. 1 element 20) having a thickness (0044, where approximately uniform thickness corresponds to thickness) with the diamond coating being deposited on the surface of the substrate over the at least one sidewall (Fig. 1, 0044). Song fails to disclose the diamond layer having a thickness between 10 nanometers and 1000 nanometers and formed from diamond grains sized to be 50% or less of diamond layer thickness, wherein the diamond layer is formed to be substantially smooth and minimally abrasive to a contacting surface. Deguchi is also concerned with a substrate with a diamond layer and teaches the diamond layer (Fig. 2 element 14) having a thickness between 10 nanometers and 1000 nanometers (3:25-34, where less than .5μm is within the claimed range) and formed from diamond grains (3:62-4:5, where diamond grains correspond to diamond grains) sized to be 50% or less of diamond layer thickness (3:62-4:5, where no more than .005 μm - .1μm is provides an infinite number of combinations of diamond layer thickness and diamond grains which meet the limitation). It would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains to modify the structure of Song to have the diamond layer thickness and diamond grain size taught by Deguchi because Deguchi teaches that using the a diamond layer thickness in the claimed range can be formed quickly and easily applied to lamination and diamond grains in the claimed range provides the diamond layer film with increased homogeneity, density, and flatness (3:25-31 and 3:62-4:5). Song, as modified, then yields the diamond layer is formed to be substantially smooth and minimally abrasive to a contacting surface (as described in the 35 U.S.C. 112(b) rejection above, a thickness between 10 nanometers and 1000 nanometers and formed from diamond grains sized to be 50% or less of diamond layer thickness meets this limitation). PNG media_image1.png 430 608 media_image1.png Greyscale Regarding claim 2, Song, as modified, discloses the limitations of claim 1, as described above, and further discloses the sidewall is defined on a protrusion (Song, Fig. 2 element 11) extending away from the substrate (Song, Fig. 2). Regarding claim 3, Song, as modified, discloses the limitations of claim 1, as described above, and further discloses the sidewall is defined on a cavity extending into the substrate (Song, see annotated Fig. 1 below). PNG media_image2.png 306 658 media_image2.png Greyscale Regarding claim 4, Song, as modified, discloses the limitations of claim 1, as described above, and further discloses the diamond layer is formed to continuously cover the surface of the substrate (Song, Fig. 1, 0044). Regarding claim 5, Song, as modified, discloses the limitations of claim 1, as described above, and further discloses the diamond layer is formed to partially cover the surface of the substrate (Song, Fig. 1, 0044, where completely covering the substrate also meets partially covering the substrate). Regarding claim 6, Song, as modified, discloses the limitations of claim 1, as described above, and further discloses the diamond layer is formed to conformally cover the surface of the substrate (Song, Fig. 1, where the diamond layer conforming to the surface of the substrate means that the diamond layer is conformally covering the surface of the substrate). Regarding claim 7, Song, as modified, discloses the limitations of claim 1, as described above, and further discloses the diamond layer is formed to thin or thicken by less than 20% across the surface of the substrate (Song, 0044, where approximately uniform thickness corresponds to the diamond layer is formed to thin or thicken by less than 20% across the surface of the substrate). Regarding claim 8, Song, as modified, discloses the limitations of claim 1, as described above, and further discloses the diamond layer thickness is substantially uniformly thick over selected regions of the surface of the substrate (Song, 0044, where approximately uniform thickness corresponds to the diamond layer thickness is substantially uniformly thick over selected regions of the surface of the substrate). Regarding claim 9, Song, as modified, discloses the limitations of claim 1, as described above, and further discloses the diamond layer is formed to cover at least a portion of the surface of the substrate (Song, Fig. 1, 0044, where completely covering the substrate also meets covering at least a portion of the substrate). Song, as modified, fails to disclose the diamond layer is a part of a multi-layered structure that includes any combination of one or more other diamond layers and non-diamond layers. Deguchi is also concerned with a substrate with a diamond layer and teaches the diamond layer is a part of a multi-layered structure that includes any combination of one or more other diamond layers and non-diamond layers (9:63-10:36, where a “cubic silicon carbide layer” corresponds to one or more non-diamond layers). It would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains to modify the structure of Song, as modified, to include an additional non-diamond layer, as taught by Deguchi, because Deguchi teaches that providing a non-diamond layer for the diamond layer to adhere to has the following effect: “the diamond orientation was further improved, and thus, highly-oriented diamond films on which many diamond crystal grains had the same surface-direction were obtained” (10:31-34). Regarding claim 10, Song, as modified, discloses the limitations of claim 1, as described above, and further discloses the diamond layer on the surface and the sidewall is formed to have 50% of grains sized to be between 2 nanometers and 500 nanometers in size (Deguchi, 3:62-4:5, where all of the grains being no more than .005μm - .1μm meets this limitation). Regarding claim 11, Song, as modified, discloses the limitations of claim 1, as described above, and further discloses the substrate is opaque at optical wavelengths (Song, 0011, where both ceramic and hard metal alloy are materials which are opaque at certain optical wavelengths). Regarding claim 13, Song discloses a method for depositing a layer, comprising: providing a substrate (Fig. 1 element 10) having a surface (Fig. 2, the top surface of the substrate shown) including at least one sidewall (see annotated Fig. 2 above); and depositing a diamond layer (Fig. 1 element 20, Abstract) having a thickness (0044, where approximately uniform thickness corresponds to thickness) with the diamond coating being deposited on the surface of the substrate over the at least one sidewall (Fig. 1, 0044). Song fails to disclose the diamond layer having a thickness between 10 nanometers and 1000 nanometers and formed from diamond grains sized to be 50% or less of diamond layer thickness, wherein the diamond layer is formed to be substantially smooth and minimally abrasive to a contacting surface. Deguchi is also concerned with a method for depositing a diamond layer on a substrate and teaches the diamond layer (Fig. 2 element 14) having a thickness between 10 nanometers and 1000 nanometers (3:25-34, where less than .5μm is within the claimed range) and formed from diamond grains (3:62-4:5, where diamond grains correspond to diamond grains) sized to be 50% or less of diamond layer thickness (3:62-4:5, where no more than .005 μm - .1μm is provides an infinite number of combinations of diamond layer thickness and diamond grains which meet the limitation). It would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains to modify the method of Song to have the diamond layer thickness and diamond grain size taught by Deguchi because Deguchi teaches that using the a diamond layer thickness in the claimed range can be formed quickly and easily applied to lamination and diamond grains in the claimed range provides the diamond layer film with increased homogeneity, density, and flatness (3:25-31 and 3:62-4:5). Song, as modified, then yields the diamond layer is formed to be substantially smooth and minimally abrasive to a contacting surface (as described in the 35 U.S.C. 112(b) rejection above, a thickness between 10 nanometers and 1000 nanometers and formed from diamond grains sized to be 50% or less of diamond layer thickness meets this limitation). Regarding claim 14, Song, as modified, discloses the limitations of claim 13, as described above, and further discloses the sidewall is defined on a protrusion (Song, Fig. 2 element 11) extending away from the substrate (Song, Fig. 2). Regarding claim 15, Song, as modified, discloses the limitations of claim 13, as described above, and further discloses the sidewall is defined on a cavity extending into the substrate (Song, see annotated Fig. 1 above). Regarding claim 16, Song, as modified, discloses the limitations of claim 13, as described above, and further discloses the diamond layer is formed to continuously cover the surface of the substrate (Song, Fig. 1, 0044). Regarding claim 17, Song, as modified, discloses the limitations of claim 13, as described above, and further discloses the diamond layer is formed to partially cover the surface of the substrate (Song, Fig. 1, 0044, where completely covering the substrate also meets partially covering the substrate). Regarding claim 18, Song, as modified, discloses the limitations of claim 13, as described above, and further discloses the diamond layer is formed to conformally cover the surface of the substrate (Song, Fig. 1, where the diamond layer conforming to the surface of the substrate means that the diamond layer is conformally covering the surface of the substrate). Regarding claim 19, Song, as modified, discloses the limitations of claim 13, as described above, and further discloses the diamond layer is formed to thin or thicken by less than 20% across the surface of the substrate (Song, 0044, where approximately uniform thickness corresponds to the diamond layer is formed to thin or thicken by less than 20% across the surface of the substrate). Regarding claim 20, Song, as modified, discloses the limitations of claim 13, as described above, and further discloses the diamond layer thickness is uniformly thick over selected regions of the surface of the substrate (Song, 0044, where approximately uniform thickness corresponds to the diamond layer thickness is uniformly thick over selected regions of the surface of the substrate). Regarding claim 21, Song, as modified, discloses the limitations of claim 13, as described above, and further discloses the diamond layer is formed to cover at least a portion of the surface of the substrate (Song, Fig. 1, 0044, where completely covering the substrate also meets covering at least a portion of the substrate). Song, as modified, fails to disclose the diamond layer is a part of a multi-layered structure that includes any combination of one or more other diamond layers and non-diamond layers. Deguchi is also concerned with a substrate with a diamond layer and teaches the diamond layer is a part of a multi-layered structure that includes any combination of one or more other diamond layers and non-diamond layers (9:63-10:36, where a “cubic silicon carbide layer” corresponds to one or more non-diamond layers). It would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains to modify the structure of Song, as modified, to include an additional non-diamond layer, as taught by Deguchi, because Deguchi teaches that providing a non-diamond layer for the diamond layer to adhere to has the following effect: “the diamond orientation was further improved, and thus, highly-oriented diamond films on which many diamond crystal grains had the same surface-direction were obtained” (10:31-34). Regarding claim 22, Song, as modified, discloses the limitations of claim 13, as described above, and further discloses the diamond layer on the surface and the sidewall is formed to have 50% of grains sized to be between 2 nanometers and 500 nanometers in size (Deguchi, 3:62-4:5, where all of the grains being no more than .005μm - .1μm meets this limitation). Regarding claim 23, Song, as modified, discloses the limitations of claim 13, as described above, and further discloses the substrate is opaque at optical wavelengths (Song, 0011, where both ceramic and hard metal alloy are materials which are opaque at certain optical wavelengths). Regarding claim 25, Song discloses a wafer tooling structure, comprising: wafer tooling (Fig. 1 element 1) including a substrate (Fig. 1 element 10) having a surface (Fig. 2, the top surface of the substrate shown) including at least one sidewall (see annotated Fig. 2 above); and a diamond layer (Fig. 1 element 20) having a thickness (0044, where approximately uniform thickness corresponds to thickness) with the diamond coating being deposited on the surface of the substrate over the at least one sidewall (Fig. 1, 0044). Song fails to disclose the diamond layer having a thickness between 10 nanometers and 1000 nanometers and formed from diamond grains sized to be 50% or less of diamond layer thickness, wherein the diamond layer is formed to be substantially smooth and minimally abrasive to a contacting surface. Deguchi is also concerned with a wafer tooling structure including a substrate with a diamond layer and teaches the diamond layer (Fig. 2 element 14) having a thickness between 10 nanometers and 1000 nanometers (3:25-34, where less than .5μm is within the claimed range) and formed from diamond grains (3:62-4:5, where diamond grains correspond to diamond grains) sized to be 50% or less of diamond layer thickness (3:62-4:5, where no more than .005 μm - .1μm is provides an infinite number of combinations of diamond layer thickness and diamond grains which meet the limitation). It would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains to modify the wafer tooling structure of Song to have the diamond layer thickness and diamond grain size taught by Deguchi because Deguchi teaches that using the a diamond layer thickness in the claimed range can be formed quickly and easily applied to lamination and diamond grains in the claimed range provides the diamond layer film with increased homogeneity, density, and flatness (3:25-31 and 3:62-4:5). Song, as modified, then yields the diamond layer is formed to be substantially smooth and minimally abrasive to a contacting surface (as described in the 35 U.S.C. 112(b) rejection above, a thickness between 10 nanometers and 1000 nanometers and formed from diamond grains sized to be 50% or less of diamond layer thickness meets this limitation). Regarding claim 26, Song, as modified, discloses the limitations of claim 25, as described above, and further discloses the sidewall is defined on a protrusion (Song, Fig. 2 element 11) extending away from the substrate (Song, Fig. 2). Regarding claim 27, Song, as modified, discloses the limitations of claim 25, as described above, and further discloses the sidewall is defined on a cavity extending into the substrate (Song, see annotated Fig. 1 above). Regarding claim 28, Song, as modified, discloses the limitations of claim 25, as described above, and further discloses the diamond layer is formed to continuously cover the surface of the substrate (Song, Fig. 1, 0044). Regarding claim 29, Song, as modified, discloses the limitations of claim 25, as described above, and further discloses the diamond layer is formed to partially cover the surface of the substrate (Song, Fig. 1, 0044, where completely covering the substrate also meets partially covering the substrate). Regarding claim 30, Song, as modified, discloses the limitations of claim 25, as described above, and further discloses the diamond layer is formed to conformally cover the surface of the substrate (Song, Fig. 1, where the diamond layer conforming to the surface of the substrate means that the diamond layer is conformally covering the surface of the substrate). Regarding claim 31, Song, as modified, discloses the limitations of claim 25, as described above, and further discloses the diamond layer is formed to thin or thicken by less than 20% across the surface of the substrate (Song, 0044, where approximately uniform thickness corresponds to the diamond layer is formed to thin or thicken by less than 20% across the surface of the substrate). Regarding claim 32, Song, as modified, discloses the limitations of claim 25, as described above, and further discloses the diamond layer thickness is uniformly thick over selected regions of the surface of the substrate (Song, 0044, where approximately uniform thickness corresponds to the diamond layer thickness is uniformly thick over selected regions of the surface of the substrate). Regarding claim 33, Song, as modified, discloses the limitations of claim 25, as described above, and further discloses the diamond layer is formed to cover at least a portion of the surface of the substrate (Song, Fig. 1, 0044, where completely covering the substrate also meets covering at least a portion of the substrate). Song, as modified, fails to disclose the diamond layer is a part of a multi-layered structure that includes any combination of one or more other diamond layers and non-diamond layers. Deguchi is also concerned with a substrate with a diamond layer and teaches the diamond layer is a part of a multi-layered structure that includes any combination of one or more other diamond layers and non-diamond layers (9:63-10:36, where a “cubic silicon carbide layer” corresponds to one or more non-diamond layers). It would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains to modify the structure of Song, as modified, to include an additional non-diamond layer, as taught by Deguchi, because Deguchi teaches that providing a non-diamond layer for the diamond layer to adhere to has the following effect: “the diamond orientation was further improved, and thus, highly-oriented diamond films on which many diamond crystal grains had the same surface-direction were obtained” (10:31-34). Regarding claim 34, Song, as modified, discloses the limitations of claim 25, as described above, and further discloses the diamond layer on the surface and the sidewall is formed to have 50% of grains sized to be between 2 nanometers and 500 nanometers in size (Deguchi, 3:62-4:5, where all of the grains being no more than .005μm - .1μm meets this limitation). Regarding claim 35, Song, as modified, discloses the limitations of claim 25, as described above, and further discloses the substrate is opaque at optical wavelengths (Song, 0011, where both ceramic and hard metal alloy are materials which are opaque at certain optical wavelengths). Regarding claim 37, Song discloses a method for depositing a layer on wafer tooling, comprising: providing a wafer tool (Fig. 1 element 10) including substrate (Fig. 1 element 10, where the substrate is a subset of the wafer tool which encompasses the entirety of the wafer tool) having a surface (Fig. 2, the top surface of the substrate shown) including at least one sidewall (see annotated Fig. 2 above); and depositing a diamond layer (Fig. 1 element 20, Abstract) having a thickness (0044, where approximately uniform thickness corresponds to thickness) with the diamond coating being deposited on the surface of the substrate over the at least one sidewall (Fig. 1, 0044). Song fails to disclose the diamond layer having a thickness between 10 nanometers and 1000 nanometers and formed from diamond grains sized to be 50% or less of diamond layer thickness, wherein the diamond layer is formed to be substantially smooth and minimally abrasive to a contacting surface. Deguchi is also concerned with a method for depositing a diamond layer on a substrate and teaches the diamond layer (Fig. 2 element 14) having a thickness between 10 nanometers and 1000 nanometers (3:25-34, where less than .5μm is within the claimed range) and formed from diamond grains (3:62-4:5, where diamond grains correspond to diamond grains) sized to be 50% or less of diamond layer thickness (3:62-4:5, where no more than .005 μm - .1μm is provides an infinite number of combinations of diamond layer thickness and diamond grains which meet the limitation). It would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains to modify the method of Song to have the diamond layer thickness and diamond grain size taught by Deguchi because Deguchi teaches that using the a diamond layer thickness in the claimed range can be formed quickly and easily applied to lamination and diamond grains in the claimed range provides the diamond layer film with increased homogeneity, density, and flatness (3:25-31 and 3:62-4:5). Song, as modified, then yields the diamond layer is formed to be substantially smooth and minimally abrasive to a contacting surface (as described in the 35 U.S.C. 112(b) rejection above, a thickness between 10 nanometers and 1000 nanometers and formed from diamond grains sized to be 50% or less of diamond layer thickness meets this limitation). Claims 12, 24, and 36 are rejected under 35 U.S.C. 103 as being unpatentable over Song et al. (US20130225052), hereinafter Song, in view of Deguchi et al. (US6068883), hereinafter Deguchi, in further view of Patterson et al. (US5316795), hereinafter Patterson. Regarding claim 12, Song, as modified, discloses the limitations of claim 1, as described above, but fails to disclose the diamond layer is deposited at less than 600 degrees Celsius. Patterson is also concerned with a substrate with a diamond layer and teaches the diamond layer is deposited at less than 600 degrees Celsius (Claim 82, where 250-400 degrees Celsius is within the claimed range). Patterson is also concerned with a substrate with a diamond layer and teaches the diamond layer is deposited at less than 600 degrees Celsius (Claim 82, where 250-400 degrees Celsius is within the claimed range). It would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains to modify the structure of Song, as modified, to make the diamond layer be deposited at less than 600 degrees Celsius, at taught by Patterson, because Patterson teaches that the process used to deposit a diamond layer at a temperature within the claimed range makes the process of depositing the diamond layer "simpler and generally more cost effective" than high energy (e.g. higher temperature) methods (2:56-60). Examiner notes that regarding the diamond layer being deposited at less than 600 degrees Celsius, in accordance to MPEP2112, the method of forming the device is not germane to the issue of patentability itself. Therefore, while this limitation has been rejected, this limitation has not been given patentable weight. Please note that even though product-by-process claims are limited by and defined by the process, determination of patentability is based on the product itself. The patentability of a product, i.e. a substrate with a diamond layer, does not depend on its method of production, i.e. depositing the diamond layer at less than 600 degrees Celsius. Regarding claim 24, Song, as modified, discloses the limitations of claim 13, as described above, but fails to disclose the diamond layer is deposited at less than 600 degrees Celsius. Patterson is also concerned with a substrate with a diamond layer and teaches the diamond layer is deposited at less than 600 degrees Celsius (Claim 82, where 250-400 degrees Celsius is within the claimed range). Patterson is also concerned with a method for depositing a diamond layer on a substrate and teaches the diamond layer is deposited at less than 600 degrees Celsius (Claim 82, where 250-400 degrees Celsius is within the claimed range). It would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains to modify the method of Song, as modified, to make the diamond layer be deposited at less than 600 degrees Celsius, at taught by Patterson, because Patterson teaches that the process used to deposit a diamond layer at a temperature within the claimed range makes the process of depositing the diamond layer "simpler and generally more cost effective" than high energy (e.g. higher temperature) methods (2:56-60). Regarding claim 36, Song, as modified, discloses the limitations of claim 25, as described above, but fails to disclose the diamond layer is deposited at less than 600 degrees Celsius. Patterson is also concerned with a substrate with a diamond layer and teaches the diamond layer is deposited at less than 600 degrees Celsius (Claim 82, where 250-400 degrees Celsius is within the claimed range). Patterson is also concerned with a wafer tooling structure including a substrate with a diamond layer and teaches the diamond layer is deposited at less than 600 degrees Celsius (Claim 82, where 250-400 degrees Celsius is within the claimed range). It would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains to modify the structure of Song, as modified, to make the diamond layer be deposited at less than 600 degrees Celsius, at taught by Patterson, because Patterson teaches that the process used to deposit a diamond layer at a temperature within the claimed range makes the process of depositing the diamond layer "simpler and generally more cost effective" than high energy (e.g. higher temperature) methods (2:56-60). Examiner notes that regarding the diamond layer being deposited at less than 600 degrees Celsius, in accordance to MPEP2112, the method of forming the device is not germane to the issue of patentability itself. Therefore, while this limitation has been rejected, this limitation has not been given patentable weight. Please note that even though product-by-process claims are limited by and defined by the process, determination of patentability is based on the product itself. The patentability of a product, i.e. a substrate with a diamond layer, does not depend on its method of production, i.e. depositing the diamond layer at less than 600 degrees Celsius. Response to Arguments Applicant's arguments filed 7/24/2025 have been fully considered but they are not persuasive. Applicant argues that Song, as modified by Deguchi, cannot read on the limitation of “the diamond layer is formed to be substantially smooth and minimally abrasive to a contacting surface” because the diamond film of Song is disclosed to be “rough” and “perform a polishing function” and therefore cannot be considered with substantially smooth or minimally abrasive. Examiner respectfully disagrees. Examiner finds that Applicant lacks support in their specification for the limitation of “the diamond layer is formed to be substantially smooth and minimally abrasive to a contacting surface”. Examiner further finds that both smoothness and abrasiveness are relative qualities (i.e. diamond can be considered abrasive to metal but not abrasive to diamond) and because Applicant fails to provide any definitions for “substantially smooth” and “minimally abrasive”, examiner considers the previous limitations, specifically “a diamond layer having a thickness between 10 nanometers and 1000 nanometers and formed from diamond grains sized to be 50% or less of diamond layer thickness”, in claims 1, 13, 25, and 37 to be what constitutes a diamond layer as meeting these limitations, and examiner finds that Song, as modified by Deguchi, does meet the previous limitations and therefore also meets the limitation of “the diamond layer is formed to be substantially smooth and minimally abrasive to a contacting surface”. Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to CALEB A HOLIZNA whose telephone number is (571)272-5659. The examiner can normally be reached Monday - Friday 8:00-4:30. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Monica Carter can be reached on 571-272-4475. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /C.A.H./Examiner, Art Unit 3723 /MONICA S CARTER/Supervisory Patent Examiner, Art Unit 3723
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Prosecution Timeline

Oct 27, 2022
Application Filed
Apr 18, 2025
Non-Final Rejection — §103, §112
Jul 24, 2025
Response Filed
Sep 29, 2025
Final Rejection — §103, §112
Apr 01, 2026
Request for Continued Examination
Apr 16, 2026
Response after Non-Final Action

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12599280
CLEANING ROLLER FOR CLEANING ROBOTS
2y 5m to grant Granted Apr 14, 2026
Patent 12583079
WAFER POLISHING METHOD AND WAFER POLISHING DEVICE
2y 5m to grant Granted Mar 24, 2026
Patent 12569620
TOOL FOR SERVICING AN AUTO-INJECTOR
2y 5m to grant Granted Mar 10, 2026
Patent 12558756
PROFILE CONTROL DURING POLISHING OF A STACK OF ADJACENT CONDUCTIVE LAYERS
2y 5m to grant Granted Feb 24, 2026
Patent 12528155
ELECTRIC TOOL GRINDING MACHINE WITH STATIC ELECTRICITY DISSIPATION
2y 5m to grant Granted Jan 20, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
67%
Grant Probability
99%
With Interview (+36.8%)
2y 9m
Median Time to Grant
Moderate
PTA Risk
Based on 127 resolved cases by this examiner. Grant probability derived from career allow rate.

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