Prosecution Insights
Last updated: April 19, 2026
Application No. 18/006,766

Positive Electrode Active Material Precursor, Method of Preparing the Same, and Method of Preparing Positive Electrode Active Material Using the Same

Non-Final OA §103
Filed
Jan 25, 2023
Examiner
YOUNG, WILLIAM D
Art Unit
1761
Tech Center
1700 — Chemical & Materials Engineering
Assignee
LG Chem, Ltd.
OA Round
1 (Non-Final)
54%
Grant Probability
Moderate
1-2
OA Rounds
3y 0m
To Grant
70%
With Interview

Examiner Intelligence

Grants 54% of resolved cases
54%
Career Allow Rate
365 granted / 681 resolved
-11.4% vs TC avg
Strong +16% interview lift
Without
With
+15.9%
Interview Lift
resolved cases with interview
Typical timeline
3y 0m
Avg Prosecution
46 currently pending
Career history
727
Total Applications
across all art units

Statute-Specific Performance

§101
0.4%
-39.6% vs TC avg
§103
46.5%
+6.5% vs TC avg
§102
16.3%
-23.7% vs TC avg
§112
30.7%
-9.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 681 resolved cases

Office Action

§103
DETAILED ACTION The following Office action concerns Patent Application Number 18/006,766. Claims 1-12 are pending in the application. Claims 4-12 have been withdrawn from consideration as being drawn to non-elected inventions. Election/Restrictions A restriction requirement was sent to the Applicant on October 8, 2025. The Applicant was required to elect among several groups of inventions. The Applicant responded to the restriction requirement on November 26, 2025 and elected Group I, claims 1-3. Since the election was not made with traverse, it is treated as being made without traverse. Accordingly, claims 4-12 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to non-elected inventions. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. § 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1 and 2 are rejected under 35 U.S.C. § 103 as being unpatentable over Maruta (US 6,472,100) in view of Song et al (US 2014/0227594). Maruta teaches a precursor for a positive electrode active material comprising a nickel-aluminum alloy (col. 2, lines 43-50). The molar amount of aluminum or cobalt in the active material is less than or equal to 30 % (col. 2, lines 61-65). Nickel-aluminum alloy with 30 % aluminum satisfies formula 1 with a=0.7, b=0.3, c=0, d=0. It would have been obvious to use up to 30 % aluminum in the precursor since the active material contains up to 30 % aluminum. Maruta does not teach that the precursor is a particle. However, Song et al teaches a precursor for a positive electrode active material wherein the precursor is a particle having an average diameter of 5-40 µm (abstract, par. 13, 16). Maruta teaches a precursor for an active material and further teaches that the active material is a particle. However, Maruta is silent regarding the form and size of the precursor. Song et al teaches that the precursor is a particle having a size. A person of ordinary skill in the art would have been motivated by design need to combine the precursor particle size of Song et al with the precursor of Maruta in order to obtain a precursor having known suitable size and shape. Claim 3 is rejected under 35 U.S.C. § 103 as being unpatentable over Maruta (US 6,472,100) in view of Song et al (US 2014/0227594) and McDonald (US 5,824,166). Maruta in view of Song et al teaches a Ni-Al precursor as described above. Maruta in view of Song et al does not teach the crystal structure of the precursor. However, McDonald teaches that nickel-aluminum alloys have a face-centered cubic structure (col. 4, line 64 to col. 5, line 12). It would have been obvious to combine the FCC crystal structure of McDonald with the Ni-Al precursor of Maruta in view of Song et al because FCC is the known crystal structure of Ni-Al alloys. Examiner’s Information Any inquiry concerning this communication or earlier communications from the examiner should be directed to William Young whose telephone number is (571) 270-5078. The examiner can normally be reached Monday through Friday, 8:30 AM to 5 PM. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Angela Brown-Pettigrew, can be reached at 571-272-2817. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000./WILLIAM D YOUNG/Primary Examiner, Art Unit 1761 January 14, 2026
Read full office action

Prosecution Timeline

Jan 25, 2023
Application Filed
Jan 14, 2026
Non-Final Rejection — §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
54%
Grant Probability
70%
With Interview (+15.9%)
3y 0m
Median Time to Grant
Low
PTA Risk
Based on 681 resolved cases by this examiner. Grant probability derived from career allow rate.

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