Prosecution Insights
Last updated: April 18, 2026
Application No. 18/024,768

LEAD SULFATE FILM REMOVING APPARATUS, METHOD, AND SYSTEM

Final Rejection §DP
Filed
Mar 05, 2023
Examiner
DOMONE, CHRISTOPHER P
Art Unit
1725
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Power Support Company Limited
OA Round
2 (Final)
84%
Grant Probability
Favorable
3-4
OA Rounds
2y 8m
To Grant
99%
With Interview

Examiner Intelligence

Grants 84% — above average
84%
Career Allow Rate
497 granted / 592 resolved
+19.0% vs TC avg
Strong +22% interview lift
Without
With
+21.7%
Interview Lift
resolved cases with interview
Typical timeline
2y 8m
Avg Prosecution
18 currently pending
Career history
610
Total Applications
across all art units

Statute-Specific Performance

§101
1.6%
-38.4% vs TC avg
§103
50.9%
+10.9% vs TC avg
§102
24.3%
-15.7% vs TC avg
§112
14.1%
-25.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 592 resolved cases

Office Action

§DP
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Double Patenting The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969). A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA . A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b). The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13. The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA /25, or PTO/AIA /26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer. Claims 1, 2, 3 provisionally rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1, 4, 3 of copending Application No. 18/426,318 (reference application). Although the claims at issue are not identical, they are not patentably distinct from each other because the reference application only differs in the language of “coating removal” as opposed to “film removal”. The reference range of a peak value of 550 mA to 1000 mA overlaps with the claimed range of 550 mA to 750 mA. The reference limitations read upon and overlap with every limitation of the respective claimed invention claims. This is a provisional nonstatutory double patenting rejection because the patentably indistinct claims have not in fact been patented. Allowable Subject Matter Claims 1-3 would be found allowable if the rejection under non-statutory double patenting is overcome. The following is a statement of reasons for the indication of allowable subject matter: claims 1 and 2 respectively require an apparatus and corresponding use method of removing a lead sulfate film generated on an electrode of a lead-acid battery, the apparatus and corresponding method comprising generating a removal signal of the lead sulfate film having a peak value of 550 mA to 750 mA, a pulse width of 5 nsec to 100 nsec, and a frequency of 5 kHz to 50 kHz, based on a signal extracted from the lead-acid battery; and supplying the generated removal signal to the electrode of the lead-acid battery. These tuned method and apparatus parameters provide a lead-acid battery with lower power consumption and damage of an electrode [0005, 0006]. Prior art reference US PGPub 2013/0141053 discloses a desulfation device that enables removal of sulfation on the electrodes of a battery [Abstract]. The frequency is 20 kHz [Abstract]. However, the pulse width is 1.6 µsec [Abstract], which is magnitudes higher than the claimed pulse width of 5 nsec to 100 nsec. The prior art range seeks to avoid resistor damage [0051, 0052] and is selected to reduce the temperature increase to a level equivalent to a conventional temperature increase [0054]. The claimed invention optimizes the smaller pulse width, higher peak removal signal value, and frequency relative to the recognized prior art ranges for the purposes of lower power consumption and electrode damage [0008, 0002, 0011]. None of the prior art references (above and IDS) recognize the benefits of the claimed invention as cited above. Therefore, taking into consideration the aforementioned reasons, the prior art does not disclose, teach, suggest, or render obvious the claimed requirement of an apparatus and corresponding use method of removing a lead sulfate film generated on an electrode of a lead-acid battery, the apparatus and corresponding method comprising generating a removal signal of the lead sulfate film having a peak value of 550 mA to 750 mA, a pulse width of 5 nsec to 100 nsec, and a frequency of 5 kHz to 50 kHz, based on a signal extracted from the lead-acid battery; and supplying the generated removal signal to the electrode of the lead-acid battery. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to CHRISTOPHER P DOMONE whose telephone number is (571)270-7582. The examiner can normally be reached M-F 8:00-4:30 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Basia Ridley can be reached at (571)272-1453. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /CHRISTOPHER P DOMONE/Primary Patent Examiner Art Unit 1725
Read full office action

Prosecution Timeline

Mar 05, 2023
Application Filed
Dec 08, 2025
Non-Final Rejection — §DP
Mar 24, 2026
Response Filed
Apr 10, 2026
Final Rejection — §DP (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
84%
Grant Probability
99%
With Interview (+21.7%)
2y 8m
Median Time to Grant
Moderate
PTA Risk
Based on 592 resolved cases by this examiner. Grant probability derived from career allow rate.

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