Office Action Predictor
Application No. 18/068,365

POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION

Final Rejection §102
Filed
Dec 19, 2022
Examiner
CURIAC, CHRISTINE
Art Unit
1737
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Samsung Electronics Co., Ltd.,
OA Round
2 (Final)
83%
Grant Probability
Favorable
3-4
OA Rounds
3y 6m
To Grant
99%
With Interview

Examiner Intelligence

83%
Career Allow Rate
10 granted / 12 resolved
Without
With
+18.2%
Interview Lift
avg trend
3y 6m
Avg Prosecution
38 pending
50
Total Applications
career history

Statute-Specific Performance

§103
43.1%
+3.1% vs TC avg
§102
22.8%
-17.2% vs TC avg
§112
10.1%
-29.9% vs TC avg
Black line = Tech Center average estimate • Based on career data

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Response to Amendment Examiner acknowledges the amendments to claims 1, 3-5, 7, and 14-16. No new matter is introduced by the amendments. Response to Arguments Examiner acknowledges the argument in view of the amended claim 1 (see pg. 15 of Applicant Arguments) with respect to the sulfonamide cation being substituted with at least one halogen and initial agreement by the Examiner that Hirano et al. (JP 2013125204 A) did not teach this embodiment. However, after carefully revisiting Hirano et al., the Examiner believes Hirano et al. does in fact teach this embodiment and therefore, the previous rejection under 35 U.S.C. 102(a)(1) remains in effect. The current 35 U.S.C. 102(a)(1) rejection has only modified the previously presented rejection under 35 U.S.C. 102(a)(1) to include the teachings of Hirano et al. with respect to the newly presented embodiments via the amendments to claims 1 and 3-4. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-20 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Hirano et al. (JP 2013125204 A). Hirano et al. teaches a resist composition that contains a base component (A’), also referred to as resin component (A1’) [0017], comprising of a group represented by general formula (a5-10): PNG media_image1.png 510 546 media_image1.png Greyscale wherein Q represents a single bond or a divalent linking group; RX represents a hydrogen atom, a fluorine atom, an alkyl group, or a fluorinated alkyl group; p represents an integer of 1 to 10; A+ is an organic cation; and a structural unit represented by general formula (a3-1): PNG media_image2.png 332 493 media_image2.png Greyscale wherein P0 is -C(=O)-O-, -C(=O)-NR0- (R0 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms) or a single bond; and W0 is a cyclic hydrocarbon group having at least one group selected from the group consisting of -OH, -COOH, -CN, -SO2, -NH2, and -CONH2 as a substituent, and may have an oxygen atom or a sulfur atom at any position [0010] (claims 1-2 and 5). Specific examples of (a5-10) include [0028-0031]: PNG media_image3.png 329 309 media_image3.png Greyscale and PNG media_image4.png 342 312 media_image4.png Greyscale wherein general formula (a5-10) is preferably represented by general formula (a5-1) [0032]: PNG media_image5.png 662 509 media_image5.png Greyscale where R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Q represents a single bond or a divalent linking group; Rx represents a hydrogen atom, a fluorine atom, an alkyl group, or a fluorinated alkyl group; p represents an integer of 1 to 10 [0032-0034]; A+ is an organic cation wherein examples include a sulfonium ion (such as the sulfonium cations depicted above), an iodonium ion, a phosphonium ion, a diazonium ion, an ammonium ion, and a pyridinium ion and specific examples of the cation moiety include those similar to general formula (b-1) to (b-8), and further, the sulfonium ion represented by: S+(R1)(R2)(R3) wherein at least one of R1 to R3 has a substituent [0027] and the iodonium ion represented by: I+ (R5)(R6) [0027] wherein R1 to R3 and R5 to R6 are each further defined as an aryl group, an alkyl group or an alkenyl group which may have a substituent [0152] wherein it is preferable that all of R1 to R3 are aryl groups [0153] with examples of the aryl group including substituted aryl groups in which some or all of the hydrogen atoms of the unsubstituted aryl group are replaced with a halogen atom [0154] (claims 1-4). Specific examples of above general formula (a3-1) include [0100-0108]: PNG media_image6.png 274 187 media_image6.png Greyscale , PNG media_image7.png 296 203 media_image7.png Greyscale , PNG media_image8.png 378 190 media_image8.png Greyscale , PNG media_image9.png 321 168 media_image9.png Greyscale , PNG media_image10.png 389 265 media_image10.png Greyscale , PNG media_image11.png 387 215 media_image11.png Greyscale , PNG media_image12.png 487 344 media_image12.png Greyscale , PNG media_image13.png 388 255 media_image13.png Greyscale , and PNG media_image14.png 439 224 media_image14.png Greyscale (claims 5-9). The amount of structural unit (a5) relative to all structural units is between 1 to 50 mol% [0035] (claim 10) and the proportion of structural unit (a3) relative to all structural units is preferably between 1 to 50 mol% [0109]. Further, polymer synthesis examples 1 to 29 (tables 1-3) comprising of compounds (1) to (25) [0263-0264], such as: PNG media_image15.png 224 91 media_image15.png Greyscale , PNG media_image16.png 253 114 media_image16.png Greyscale , PNG media_image17.png 330 182 media_image17.png Greyscale , PNG media_image18.png 201 111 media_image18.png Greyscale , PNG media_image19.png 287 85 media_image19.png Greyscale , and PNG media_image20.png 239 82 media_image20.png Greyscale , in predetermined composition ratios. Polymer synthesis examples 14, 15, and 28 comprise of the following composition ratios: 14: 2/13/6 = 42.5/41.8/4.8; 15: 2/12/6 = 44.3/40.6/5.1; 28: 1/9/6 = 45.8/49.2/5.0 (claims 11 and 15-16). Regarding claims 13 and 14, the amount of 6 (referred to as polymer of claim 1 in instant claim 13) is in a range of ~5-6 parts by weight based on 100 parts by weight of 2/13 or 2/12 or 1/9 (referred to as the base resin in instant claim 13). The weight average molecular weight of resin component (A1’) is preferably 1,000 to 50,000 [0148] and a dispersity (Mw/Mn) is most preferably from 1.0 to 3.0 (claim 12). Regarding claims 13 and 17-18, Hirano et al. teaches resist composition examples in Table 7 (pg. 102) comprising of the base component (A’), composed of the repeat units as explained above, a compound represented by the chemical formula (B)-2: PNG media_image21.png 500 665 media_image21.png Greyscale (referred to as a photoacid generator in claims 13 and 17-18), a compound represented by the chemical formula (F)-1: PNG media_image22.png 446 571 media_image22.png Greyscale , and a solvent mixture comprising of: propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, cyclohexanone, and γ-butyrolactone. Regarding claims 19-20, Hirano et al. teaches a method of forming a resist pattern comprising: forming a resist film on a support using the resist composition as explained above, exposing the resist film to light, and developing the resist film to form a resist pattern [0249]. The exposure apparatus uses either: ArF, electron beam, or EUV and the development treatment is carried out using either an alkaline developer or an organic solvent [0249]. Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to Christine Curiac whose telephone number is (703)756-1375. The examiner can normally be reached M-F 9:00-6:00 ET. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Mark Huff can be reached at (571) 272-1385. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /CHRISTINE CURIAC/Examiner, Art Unit 1737 /MARK F. HUFF/Supervisory Patent Examiner, Art Unit 1737
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Prosecution Timeline

Dec 19, 2022
Application Filed
Jun 26, 2025
Non-Final Rejection — §102
Aug 27, 2025
Examiner Interview Summary
Aug 27, 2025
Applicant Interview (Telephonic)
Sep 18, 2025
Response Filed
Feb 07, 2026
Final Rejection — §102
Mar 03, 2026
Interview Requested
Mar 12, 2026
Applicant Interview (Telephonic)
Mar 13, 2026
Examiner Interview Summary
Apr 09, 2026
Response after Non-Final Action

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Prosecution Projections

3-4
Expected OA Rounds
83%
Grant Probability
99%
With Interview (+18.2%)
3y 6m
Median Time to Grant
Moderate
PTA Risk
Based on 12 resolved cases by this examiner