Prosecution Insights
Last updated: April 19, 2026
Application No. 18/140,659

LIQUID DROPLET-FORMING DEVICE AND FINE PARTICLE-MANUFACTURING DEVICE

Final Rejection §103
Filed
Apr 28, 2023
Examiner
VALENCIA, ALEJANDRO
Art Unit
2853
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Ricoh Company Ltd.
OA Round
4 (Final)
42%
Grant Probability
Moderate
5-6
OA Rounds
2y 11m
To Grant
48%
With Interview

Examiner Intelligence

Grants 42% of resolved cases
42%
Career Allow Rate
567 granted / 1335 resolved
-25.5% vs TC avg
Moderate +6% lift
Without
With
+5.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 11m
Avg Prosecution
151 currently pending
Career history
1486
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
53.6%
+13.6% vs TC avg
§102
24.4%
-15.6% vs TC avg
§112
20.8%
-19.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1335 resolved cases

Office Action

§103
DETAILED ACTION Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-14 and 16 are rejected under 35 U.S.C. 103 as being unpatentable over Sharma et al. (6,290,323) in view of Hetzer et al. (5,929,877). Regarding claims 1 and 16, Sharma teaches a liquid droplet-forming device, comprising: a liquid chamber (fig. 2, item 77); a nozzle plate (fig. 19, item 80) comprising a discharge hole (fig. 2, item 90) configured to discharge a raw material liquid (fig. 2, item 105) in the liquid chamber in a form of liquid droplets (fig. 2, item 105); sealed space-forming structure (fig. 19, item 195/197/200); and at least two flow paths (fig. 19, flow path through valve 330 and flow path through 417), wherein the sealed space-forming structure is capable of forming a sealed space (fig. 19, space formed by walls 197) communicating with the liquid chamber through the discharge hole on a side opposite to the liquid chamber of the discharge hole, and the at least two flow paths comprise through-holes (fig. 19, through hole through valve 330 and through hole through 417) and pipes (fig. 19, pipe containing valve 430 and pipe containing valve 420) connected to the liquid chamber, and communicate with each other through the sealed space (see fig. 19) wherein the through-holes are formed on a same side as the liquid chamber relative to the nozzle plate (see fig. 19), the at least two flow paths include a first flow path and a second flow path which are connected to the liquid chamber (see fig. 19, note that, as defined above, the limitation is met), a third flow path and a fourth flow path which are connected to the sealed space from two ends of the sealed space in the a direction parallel to a surface of the nozzle plate (see fig. 19, note that, as defined above, the limitation is met). Sharma does not teach wherein the liquid chamber extends in a direction parallel to a surface of the nozzle plate or wherein the first and second flow path are connected to the liquid chamber from two ends of the liquid chamber respectively in the direction parallel to the surface of the nozzle plate or wherein the sealed space covers a whole surface of the nozzle plate opposite from the liquid chamber. Hetzer teaches four flow paths with the claimed arrangement (Hetzer, see figs. 2, 4, Note that the sealed space covers the entire nozzle surface and note that first and second flow paths 291, 292 are connected to the sealed space at opposite ends of the nozzle row). It would have been obvious to one of ordinary skill in the art at the time of invention to use the flow path arrangement disclosed by Hetzer instead of that disclosed by Sharma because doing so would amount to the simple substitution of one known arrangement for another to obtain predictable results. Upon combination, the head and flow path arrangement disclosed by Hetzer would be used with the sealed-space forming structure of Sharma, and the operation of the device would be used according to the controls of Sharma. Regarding claim 2, Sharma in view of Hetzer teaches the liquid droplet-forming device according to Claim 1, wherein an inside of the liquid chamber, the discharge hole, and the sealed space is washable by causing washing liquid to flow to the liquid chamber and the sealed space (Sharma, col. 9, lines 49-55). Regarding claim 3, Sharma in view of Hetzer teaches the liquid droplet-forming device according to Claim 2, further comprising: a washing liquid supplier (Sharma, fig. 19, item 270) to supply the washing liquid (Sharma, see fig. 19); and a waste liquid ejection structure (Sharma, fig. 19, item 260) configured to eject waste liquid generated by washing the inside of the liquid chamber, the discharge hole, and the sealed space (Sharma, see fig. 19), wherein the first flow path and the second flow path are connected to the washing liquid supply unit and the waste liquid ejection unit, and the third flow path and the fourth flow path are connected to the washing liquid supply unit and the waste liquid ejection unit (Sharma, see fig. 19, Note that all four flow paths communicate directly or indirectly with the washing liquid supply unit 270). Regarding claim 4, Sharma in view of Hetzer teaches the liquid droplet-forming device according to claim 3, further comprising: a control unit (Sharma, fig. 1, item 160) configured to control at least the washing liquid supply unit and the waste liquid ejection unit, wherein the control unit performs first washing in which the second flow path and the third flow path are closed, the washing liquid is supplied from the first flow path to the sealed space through the liquid chamber, and the waste liquid is ejected from the fourth flow path to the sealed space (Sharma, see fig. 19). Regarding claim 5, Sharma in view of Hetzer teaches the liquid droplet-forming device according to Claim 3, further comprising: a control unit (Sharma, fig. 1, item 160) configured to control at least the washing liquid supply unit and the waste liquid ejection unit, wherein the control unit performs second washing in which the second flow path is closed, the washing liquid is supplied from one of the third flow path and the fourth flow path to the sealed space, and the waste liquid in the sealed space is ejected from the other of the third flow path and the fourth flow path (Sharma, see fig. 19). Regarding claim 6, Sharma in view of Hetzer teaches the liquid droplet-forming device according to Claim 5, wherein the washing liquid supply unit includes a first supply unit that supplies the washing liquid, and a second supply unit that supplies the washing liquid at a higher pressure than the first supply unit, and in the second washing, the washing liquid is supplied from the second supply unit to the first flow path, and the washing liquid is supplied from the first supply unit to one of the third flow path and the fourth flow path (Sharma, see fig. 19). Regarding claim 7, Sharma in view of Hetzer teaches the liquid droplet-forming device according to Claim 3, further comprising: a control unit (Sharma, fig. 1, item 160) configured to control at least the washing liquid supply unit and the waste liquid ejection unit, wherein the control unit performs third washing in which the first flow path and the fourth flow path are closed, the washing liquid is supplied from the third flow path to the liquid chamber through the sealed space, and the waste liquid in the liquid chamber is ejected from the second flow path (Sharma, see fig. 19). Regarding claim 8, Sharma in view of Hetzer teaches the liquid droplet-forming device according to Claim 3, further comprising: a control unit (Sharma, fig. 1, item 160) configured to control at least the washing liquid supply unit and the waste liquid ejection unit, wherein the control unit performs fourth washing in which the fourth flow path is closed, the washing liquid is supplied from one of the first flow path and the second flow path to the liquid chamber, and the waste liquid in the liquid chamber is ejected from the other of the first flow path and the second flow path (Sharma, see fig. 1). Regarding claim 9, Sharma in view of Hetzer teaches the liquid droplet-forming device according to Claim 8, wherein the washing liquid supply unit includes a first supply unit that supplies the washing liquid, and a second supply unit that supplies the washing liquid at a higher pressure than the first supply unit, and in the fourth washing, the washing liquid is supplied from the second supply unit to the third flow path, and the washing liquid is supplied from the first supply unit to one of the first flow path and the second flow path (Sharma, see fig. 19). Regarding claim 10, Sharma in view of Hetzer teaches the liquid droplet-forming device according to Claim 3, wherein the washing liquid supply unit and a raw material liquid supply unit that supplies the raw material liquid are connected to the first flow path to be switchable (Sharma, see fig. 19, Note that washing fluid can be fed upward through first flow path 420 or raw material liquid can be fed downward toward the nozzle during printing). Regarding claim 11, Sharma in view of Hetzer teaches the liquid droplet-forming device according to claim 1, further comprising: a discharge head (Sharma, fig. 19, item 60) having the liquid chamber (Sharma, see fig. 19) and the discharge hole (Sharma, see fig. 19); and a discharge unit main body to which the discharge head is connected, wherein the discharge head and the discharge unit main body are configured to be attachable and detachable (Sharma, see figs. 1, 4 and 19, Note that this is necessarily the case). Regarding claim 12, Sharma in view of Hetzer teaches the liquid droplet-forming device according to claim 11, wherein the discharge head includes a head main body provided with the liquid chamber, and a nozzle plate that forms a part of a wall surface of the liquid chamber and has the discharge hole, and the discharge head is disassemblable into the head main body and the nozzle plate (Sharma, see fig. 4, Note that “disassemblable” has not been defined. Examiner. Regarding claim 13, Sharma in view of Hetzer teaches the liquid droplet-forming device according to claim 11, wherein the discharge unit main body has a vibration unit that applies vibration to the raw material liquid stored in the liquid chamber (Sharma, cols. 4-5, lines 54-19, Note that a piezoelectric drive element vibrates the liquid). Regarding claim 14, Sharma in view of Hetzer teaches the liquid droplet-forming device according to claim 13, wherein the vibration unit includes a vibrator that generates vibration, and amplification means which is connected to the vibrator and amplifies the vibration (Sharma, cols. 4-5, lines 54-19, Note that a piezoelectric drive element vibrates the liquid, and the drive circuit for driving the piezoelectric element can amplify the vibration signal). Claim(s) 15 is rejected under 35 U.S.C. 103 as being unpatentable over Sharma in view of Hetzer in view of Inoue et al. (2017/0219437). Regarding claim 15, Sharma in view of Hetzer teaches a fine particle-manufacturing device, comprising: the liquid droplet-forming device according to claim 1. Sharma in view of Hetzer does not teach a solidification means configured to solidify liquid droplets discharged from the liquid droplet-forming device. Inoue teaches this (Inoue, [0241], Note that a solidifying means is present). It would have been obvious to one of ordinary skill in the art at the time of invention add a solidifying means of the type disclosed by Inoue to the device of Sharma in view of Hetzer because doing so would allow for processing of toner as opposed to just ink. Response to Arguments Applicant’s arguments with respect to claim(s) 1 have been considered but are moot in light of the new ground(s) of rejection. Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to ALEJANDRO VALENCIA whose telephone number is (571)270-5473. The examiner can normally be reached M-F. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, DOUGLAS X. RODRIGUEZ can be reached at 571-431-0716. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ALEJANDRO VALENCIA/Primary Examiner, Art Unit 2853
Read full office action

Prosecution Timeline

Apr 28, 2023
Application Filed
Feb 20, 2025
Non-Final Rejection — §103
Apr 21, 2025
Examiner Interview Summary
Apr 21, 2025
Applicant Interview (Telephonic)
May 06, 2025
Response Filed
May 12, 2025
Final Rejection — §103
Jul 21, 2025
Applicant Interview (Telephonic)
Jul 21, 2025
Examiner Interview Summary
Jul 29, 2025
Request for Continued Examination
Jul 30, 2025
Response after Non-Final Action
Oct 01, 2025
Non-Final Rejection — §103
Dec 18, 2025
Response Filed
Jan 12, 2026
Final Rejection — §103
Apr 08, 2026
Request for Continued Examination
Apr 16, 2026
Response after Non-Final Action

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12600127
INKJET ASSEMBLY, INKJET PRINTING APPARATUS AND INKJET PRINTING METHOD FOR USE IN PREPARATION OF DISPLAY COMPONENT
2y 5m to grant Granted Apr 14, 2026
Patent 12583238
PAPER SUPPLY CONTROL DEVICE
2y 5m to grant Granted Mar 24, 2026
Patent 12576644
RECORDING DEVICE AND METHOD OF CONTROLLING RECORDING DEVICE
2y 5m to grant Granted Mar 17, 2026
Patent 12570101
RECORDING DEVICE
2y 5m to grant Granted Mar 10, 2026
Patent 12558904
DROP-ON-DEMAND INK DELIVERY SYSTEMS AND METHODS WITH TANKLESS RECIRCULATION FOR CARD PROCESSING SYSTEMS
2y 5m to grant Granted Feb 24, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

AI Strategy Recommendation

Get an AI-powered prosecution strategy using examiner precedents, rejection analysis, and claim mapping.
Powered by AI — typically takes 5-10 seconds

Prosecution Projections

5-6
Expected OA Rounds
42%
Grant Probability
48%
With Interview (+5.9%)
2y 11m
Median Time to Grant
High
PTA Risk
Based on 1335 resolved cases by this examiner. Grant probability derived from career allow rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month