Prosecution Insights
Last updated: July 17, 2026
Application No. 18/205,878

METHOD AND SYSTEM FOR INDEXING ELECTRON DIFFRACTION PATTERNS

Non-Final OA §112
Filed
Jun 05, 2023
Priority
Jun 06, 2022 — GB 2208289.5
Examiner
DO, AN H
Art Unit
2853
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Oxford Instruments Nanotechnology Tools Limited
OA Round
2 (Non-Final)
90%
Grant Probability
Favorable
2-3
OA Rounds
0m
Est. Remaining
97%
With Interview

Examiner Intelligence

Grants 90% — above average
90%
Career Allowance Rate
1311 granted / 1448 resolved
+22.5% vs TC avg
Moderate +7% lift
Without
With
+6.9%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 1m
Avg Prosecution
25 currently pending
Career history
1470
Total Applications
across all art units

Statute-Specific Performance

§101
6.9%
-33.1% vs TC avg
§103
36.5%
-3.5% vs TC avg
§102
36.9%
-3.1% vs TC avg
§112
2.4%
-37.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1448 resolved cases

Office Action

§112
Notice of Pre-AIA or AIA Status DETAILED ACTION Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after allowance or after an Office action under Ex Parte Quayle, 25 USPQ 74, 453 O.G. 213 (Comm'r Pat. 1935). Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, prosecution in this application has been reopened pursuant to 37 CFR 1.114. Applicant's submission filed on 22 May 2026 has been entered. Information Disclosure Statement The information disclosure statement (IDS) submitted on 22 May 2026 was filed. The submission is in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 1-24 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Applicant needs to clearly define the languages used herein such as “nominal location”, “templates” and “measures” to be consistent with the corresponding referring claimed limitations in order to avoid the lack of antecedent bases. Claim 1 recites the limitations: “the three dimensional distribution" and “the electrons” in line 7; “each nominal location” in line 9; “further simulated templates” in line 22; “the similarity measures” in line 25; and “each nominal location” in the last line. There are insufficient antecedent bases for these limitations in the claim. Dependent claims 2-24 depend on rejected claim 1 and hence, are also rejected. The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Bauer (US 10,663,414) discloses a method for performing electron diffraction pattern analysis upon a sample in a vacuum chamber of a microscope. Firstly a sample is isolated from part of a specimen using a focused particle beam. A manipulator end effector is then attached to the sample so as to effect a predetermined orientation between the end effector and the sample. With the sample detached, the manipulator end effector is rotated about a rotation axis to bring the sample into a predetermined geometry with respect to an electron beam and diffraction pattern imaging apparatus so as to enable an electron diffraction pattern to be obtained from the sample while the sample is still fixed to the manipulator end effector. An electron beam is caused to impinge upon the sample attached to the manipulator end effector so as to obtain an electron diffraction pattern. Taheri et al (US 9,568,442) disclose a sample material is scanned with a transmission electron microscope (TEM) over multiple steps having a predetermined size at a predetermined angle. Each scan at a predetermined step and angle is compared to a template, wherein the template is generated from parameters of the material and the scanning. The data is then analyzed using local mis-orientation mapping and/or Nye's tensor analysis to provide information about local strain states. Contact Information Any inquiry concerning this communication or earlier communications from the examiner should be directed to AN H DO whose telephone number is (571)272-2143. The examiner can normally be reached on M-F 7:00am-4:00pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Ricardo Magallanes can be reached on 571-272-5960. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /AN H DO/Primary Examiner, Art Unit 2853
Read full office action

Prosecution Timeline

Jun 05, 2023
Application Filed
Aug 27, 2025
Non-Final Rejection mailed — §112
Dec 29, 2025
Response Filed
May 22, 2026
Request for Continued Examination
May 26, 2026
Response after Non-Final Action
Jun 17, 2026
Non-Final Rejection mailed — §112 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

2-3
Expected OA Rounds
90%
Grant Probability
97%
With Interview (+6.9%)
2y 1m (~0m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 1448 resolved cases by this examiner. Grant probability derived from career allowance rate.

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