Prosecution Insights
Last updated: April 19, 2026
Application No. 18/233,180

RETICLE CONTAINER HAVING PLATING WITH REDUCED EDGE BUILD

Non-Final OA §102§103
Filed
Aug 11, 2023
Examiner
SPICER, JENINE MARIE
Art Unit
3736
Tech Center
3700 — Mechanical Engineering & Manufacturing
Assignee
Entegris Inc.
OA Round
3 (Non-Final)
51%
Grant Probability
Moderate
3-4
OA Rounds
3y 5m
To Grant
69%
With Interview

Examiner Intelligence

Grants 51% of resolved cases
51%
Career Allow Rate
380 granted / 749 resolved
-19.3% vs TC avg
Strong +18% interview lift
Without
With
+18.4%
Interview Lift
resolved cases with interview
Typical timeline
3y 5m
Avg Prosecution
54 currently pending
Career history
803
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
40.1%
+0.1% vs TC avg
§102
27.2%
-12.8% vs TC avg
§112
27.1%
-12.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 749 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on 1/6/2026 has been entered. This Office Action acknowledges the applicant’s amendment filed on 1/6/2026. Claims 1-18 are pending in the application. Claims 10-18 are withdrawn from consideration. The text of those sections of Title 35, U.S. code not included in this action can be found in a prior Office Action. Claim Rejections - 35 USC § 102 Claim(s) 1-3 and 6-7 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by HSU et al. US 2019/0101821 A1, both previously cited. With regards to claim 1, HSU (Fig. 6(a)(b)) discloses a reticle container, comprising a cover 10 and a baseplate 20, wherein: at least one of the cover or the baseplate 20 includes a base material and a coating layer on said base material (Para. 0022), at least one of the baseplate 20 includes a contact surface (at S2) and: a first relief area (BE2) adjacent to at least a portion of an outer perimeter of the contact surface, and a second relief area (TE2) adjacent to at least a portion of an inner perimeter of the contact surface, and each of the first relief area and the second relief area are configured to avoid contact between the cover and the baseplate when the reticle container is assembled such that the cover and the baseplate make contact at the contact surface, and wherein the contact surface comprises a continuous flat surface between the first relief area and the second relief area. (described in Para. 0033-0043 more specifically para. 0036-0037; the contact surface S2 (top or bottom) is considered a continuous flat surface between the first and second relief areas BE2/TE2, as shown in Fig. 6(a)(b)). With regards to claim 2, HSU (Fig. 6(a)(b)) discloses the first relief area (BE2) or the second relief area (TE2) is a region recessed with respect to the contact surface. With regards to claim 3, HSU (Fig. 6(a)(b)) discloses the first relief area (BE2) is a beveled edge. (the angle forming the relief area is less than 90 degrees, which defines a beveled edge; Para. 0036-0038) With regards to claim 6, HSU (Fig. 6(a)(b)) discloses a transition from the contact surface (S2) to the second relief area (TE2) includes a beveled edge. (the angle forming the relief area is less than 90 degrees, which defines a beveled edge; Para. 0036-0038) With regards to claim 7, HSU (Fig. 6(a)(b)) discloses the first relief area (BE2) or the second relief area (TE2) has a depth of at least 0.1 millimeters (mm) with respect to the contact surface. (Para. 0036-0038) Claim Rejections - 35 USC § 103 Claim(s) 4-5 is/are rejected under 35 U.S.C. 103 as being unpatentable over HSU et al. US 2019/0101821 A1 in view of Evers US 5,836,454, both previously cited. With regards to claim 4, HSU (Fig. 6(a)(b)) discloses the claimed invention as stated above (first and second relief) but it does not specifically disclose the first relief area or the second relief surface includes a radiused region. However, Evers (Fig. 3) teaches that it was known in the art to have a container that includes a relief area 46 that has a radiused region (Col 5:50-56). Evers further recites that it is known in the art that a relief area may have a beveled or radiused edge. Therefore, it would have been obvious to one having ordinary skill in the art before the effective filing date of the claimed invention to have modified the relief area in HSU by providing a radiused region as taught by Evers for the purposes of allowing easier gliding of the cover over the base. With regards to claim 5, the combination of HSU in view of Evers discloses a transition from the contact surface (S2; HSU) to the first relief area (BE2; HSU) or a transition from the contact surface (S2; HSU) to the second relief area (TE2; HSU) is radiused (Col 5:50-56). Claim(s) 8-9 is/are rejected under 35 U.S.C. 103 as being unpatentable over HSU et al. US 2019/0101821 A1 in view CHUANG et al. US 2021/0033989 A1, both previously cited. With regards to claim 8, HSU (Fig. 6(a)(b)) discloses the first relief area (BE2) but it does not specifically disclose the first relief area surrounds the outer perimeter of the contact surface. However, CHUANG teaches that it was known in the art to have a reticle container have a relief area 44 surround the perimeter of the contact surface. (Para. 0032 and 0039, Fig. 5 and 6A) It would have been obvious to one having ordinary skill in the art before the effective filing date of the claimed invention to have modified the first relief area in HSU by having the first relief area surround the perimeter of the contact surface as taught by Evers for the purposes of preventing particles from entering the cavity of the container. With regards to claim 9, HSU (Fig. 6(a)(b)) discloses the second relief area but it does not specifically disclose the second relief area is surrounded by the inner perimeter of the contact surface. However, CHUANG teaches that it was known in the art to have a reticle container have a relief area 44 surrounded by the inner perimeter of the contact surface. (Para. 0032 and 0039, Fig. 5 and 6F) It would have been obvious to one having ordinary skill in the art before the effective filing date of the claimed invention to have modified the second relief area in HSU by having the second relief area surrounded by the inner perimeter of the contact surface as taught by Evers for the purposes of preventing particles from entering the cavity of the container. Response to Arguments Applicant's arguments filed 1/6/2026 have been fully considered but they are not persuasive. The Applicant argues Hsu does not disclose the amended limitations “a reticle container having a cover and a baseplate, wherein at least one of the cover or the baseplate includes a contact surface. The contact surface comprises a continuous flat surface between the first relief area and the second relief area” because Hsu includes a dimple 50 that interrupts the contact surface S2, therefore, it is not considered a continuous flat surface. The Examiner respectfully disagrees. With regards to the claims presented and the reference Hsu, the contact surface S2 is considered a continuous flat surface between the first and second relief areas BE2/TE2, as shown in Fig. 6(a)(b)). The claim does not specify that the contact surface must extend all the way from the first relief area to the second relief area, just that there has to be continuous portion in between. Therefore, Hsu meets the claimed limitations. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to JENINE SPICER whose telephone number is (313)446-4924. The examiner can normally be reached 9:00am-5:00pm, Monday-Thursday. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Orlando E. Avilés can be reached at (571) 270-5531. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /JENINE SPICER/Examiner, Art Unit 3736 /ORLANDO E AVILES/Supervisory Patent Examiner, Art Unit 3736
Read full office action

Prosecution Timeline

Aug 11, 2023
Application Filed
Mar 22, 2025
Non-Final Rejection — §102, §103
Jun 26, 2025
Response Filed
Oct 04, 2025
Final Rejection — §102, §103
Dec 05, 2025
Response after Non-Final Action
Jan 06, 2026
Request for Continued Examination
Feb 03, 2026
Response after Non-Final Action
Mar 06, 2026
Non-Final Rejection — §102, §103 (current)

Precedent Cases

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PROTECTIVE APPARATUS AND TRANSPORT APPARATUS
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RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS
2y 5m to grant Granted Jan 06, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
51%
Grant Probability
69%
With Interview (+18.4%)
3y 5m
Median Time to Grant
High
PTA Risk
Based on 749 resolved cases by this examiner. Grant probability derived from career allow rate.

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