Prosecution Insights
Last updated: April 19, 2026
Application No. 18/267,470

FIELD OF VIEW VISUALIZATION FOR PHASE CONTRAST X-RAY IMAGING SYSTEMS

Non-Final OA §102
Filed
Jun 15, 2023
Examiner
WONG, DON KITSUN
Art Unit
2884
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Koninklijke Philips N V
OA Round
1 (Non-Final)
90%
Grant Probability
Favorable
1-2
OA Rounds
2y 0m
To Grant
95%
With Interview

Examiner Intelligence

Grants 90% — above average
90%
Career Allow Rate
208 granted / 231 resolved
+22.0% vs TC avg
Minimal +5% lift
Without
With
+4.8%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 0m
Avg Prosecution
5 currently pending
Career history
236
Total Applications
across all art units

Statute-Specific Performance

§101
2.9%
-37.1% vs TC avg
§103
18.4%
-21.6% vs TC avg
§102
52.5%
+12.5% vs TC avg
§112
7.0%
-33.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 231 resolved cases

Office Action

§102
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . The indicated allowability of claims 1-8 is withdrawn in view of the newly discovered reference(s) to Kitamura et al. (JP 2017 104202 ). Rejections based on the newly cited reference(s) follow. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1, 2, 3 and 6 are rejected under 35 U.S.C. 102 (a)(1) as being anticipated by Kitamura et al. (JP 20171040202 A) Regarding claim 1, Kitamura et al. disclose (see figure 3) a phase contrast X-ray imaging system (x-ray Talbot imaging apparatus), comprising: an X-ray source (11, x-ray generator) configured to emit an X-ray beam through an examination region towards a target area located within the examination region (the target area is located on a subject H, located within the examination region) [page 4, para. 2]; an X-ray detector (16, x-ray detector) positioned on an opposite side of the examination region from the X-ray source (see figure 3, the detector 16 and x-ray generator 11 are located on opposite sides of the examination region of subject H) [page 5, para. 1-2]; an X-ray beam shaper (12, G0 grating) configured to shape the X-ray beam to irradiate a radiation area on the target area (see figure 3, G0 grating 12 is provided downstream of the X-ray generator 11 in the x-ray irradiation direction) [page 4, para. 1-5]; a grating (14, G1 grating) positioned between the X-ray source and the detector (see figure 3, grating 14 is located between x-ray generator 11 and x-ray detector 16); a light field projector (113, irradiation field lamp), configured to project a light field in the visible spectrum on the target area (an irradiation field lamp 113 irradiates the subject with visible light), wherein the projected light field corresponds to the radiation area (both areas are located on subject H) [page 4, para. 6]; and a holder (17, support column), arranged to hold the light field projector and the grating (see figure 3, the support column holds, or supports, the irradiation field lamp 113 and the grating 14) [page 4, para. 3-5]. Regarding claim 2, Kitamura further teaches wherein the holder 17 contains a first part (12a) arranged to hold the light field projector (113) and a second part (18) arranged to hold the grating (14), wherein the first part and the second part are fixed to each other (fig. 3). Regarding claim 3, Kitamura further teaches wherein the grating (14) is at least one of a phase grating, (page 4, line 1 of last paragraph) or a source grating, and a sample absorbing grating Regarding claim 6, Kitamura further teaches wherein the light field projector (113) comprises a laser device or a projector (fig. 3). Allowable Subject Matter Claims 4, 5, 7 and 8 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: Kitamura et al. does not teach the details of claims 4, 5, 7 and 8. Any inquiry concerning this communication or earlier communications from the examiner should be directed to DON KITSUN WONG whose telephone number is (571)272-1834. The examiner can normally be reached on Monday – Friday 9:00am – 6:00pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Uzma Alam can be reached on 571 272 3995. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DON K WONG/ Primary Examiner, Art Unit 2884 .
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Prosecution Timeline

Jun 15, 2023
Application Filed
Feb 04, 2026
Non-Final Rejection — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
90%
Grant Probability
95%
With Interview (+4.8%)
2y 0m
Median Time to Grant
Low
PTA Risk
Based on 231 resolved cases by this examiner. Grant probability derived from career allow rate.

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