Prosecution Insights
Last updated: October 02, 2026
Application No. 18/276,366

Precursor For Positive Electrode Active Material And Method Of Preparing The Same

Final Rejection §103
Filed
Aug 08, 2023
Priority
Feb 15, 2021 — RE 10-2021-0020103 +1 more
Examiner
LEE, DANIEL H.
Art Unit
1746
Tech Center
1700 — Chemical & Materials Engineering
Assignee
LG Chem Ltd.
OA Round
2 (Final)
71%
Grant Probability
Favorable
3-4
OA Rounds
0m
Est. Remaining
96%
With Interview

Examiner Intelligence

Grants 71% — above average
71%
Career Allowance Rate
393 granted / 557 resolved
+5.6% vs TC avg
Strong +25% interview lift
Without
With
+25.3%
Interview Lift
resolved cases with interview
Typical timeline
2y 7m
Avg Prosecution
26 currently pending
Career history
573
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
60.8%
+20.8% vs TC avg
§102
9.4%
-30.6% vs TC avg
§112
26.3%
-13.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 557 resolved cases

Office Action

§103
DETAILED ACTION The response filed July 27, 2026 has been entered. Applicant has canceled claim 4. Claims 1-3 and 5-14 are pending. Claim Objections The previous objection to claim 13 has been withdrawn in view of Applicant’s amendment. Claim 1 is objected to because of the following informalities: In claim 1, second to last line, “grown” should be “grow”. Claim Rejections - 35 USC § 103 The text of those sections of Title 35, U.S. Code not included in this action can be found in a prior Office action. Claims 1-3 and 5-14 are rejected under 35 U.S.C. 103 as being unpatentable over Yun et al. (“Yun”, US 2019/0393502 A1). Regarding claims 1 and 11, Yun discloses a nickel-based active material precursor for a lithium secondary battery including positive electrode including nickel-based active material (title) and teaches supplying raw materials including a complexing agent, a pH adjuster, and a metal-containing raw material for forming a nickel-based active material precursor ([0047]). The metal-containing raw materials can be nickel, manganese, and cobalt, inter alia ([0053]). The complexing agent may be ammonia water ([0057]). The pH adjuster may be sodium hydroxide ([0058]). Further regarding claim 1 and regarding claims 2-3, Yun teaches a first, second, and third feed rate ([0047]), each increasing in speed (1.2-2.5 times in the second act ([0050]) and 1.1 to 1.5 times in the third act ([0051]). The first act is considered the formation step and the second and third acts can be considered the growth steps. 2.5 x 1.5 = 3.75. 3.75 would read on claims 2 and 3. Further regarding claim 1, Yun does not expressly teach the claimed ratios for the feed rates are equal. However, Yun teaches in [0057] that to control the growth rates of nickel-based active material precursor particles, the amount of a metal-containing raw material added to grow the particles may be increased by about 15% to about 35%, for example, about 25% in the second act compared to the first act. In addition, the feed rate of complexing agent (e.g., ammonia water) in the second act may be increased by about 10% to about 30%, for example, about 20% with respect to the feed rate of complexing agent (e.g. ammonia water) in the first act ([0057]). Yun also teaches increasing the concentration of the complexing agent in the reaction mixture in the second and third act ([0050], [0051]). In other words, Yun teaches increasing the feed rates in overlapping ranges (15-35% and 10-30%), which would read on equal ratios. Further, Yun clearly appreciates that both concentration and feed rate affect the growth rate of precursor particles. It would have been obvious to one of ordinary skill in the art at the effective filing date of the invention to control the growth rates of precursor particles by controlling the concentration and feed rate, as well as rate of increase (ratio), with the ranges taught in Yun to achieve a positive active material with enhanced lithium availability and enhanced capacity and lifespan due to suppression of crack formation in the active material during charging and discharging. As to claim 5, Yun teaches the reaction mixtures was stirred for 6 hours within the above pH range to allow a first act reaction to occur ([0100]). As to claims 6 and 7, Yun teaches the nickel-based active material precursor may contain Ni up to 85% ([0046]; Ni0.85Co0.1Al0.05). As to claim 8, Yun teaches the pH of the reaction mixture forming and growing a precursor seed may be about 10.5 to about 11.50 ([0049]) in the first act. As to claim 9, Yun teaches the pH of the reaction mixture to further grow the precursor seed may be about 10.5 to about 11.50 ([0049]) in the second act. As to claim 10, Yun teaches the reaction temperature is in a range of about 40oC to about 60oC ([0048]). As to claims 12 and 13, Yun teaches or suggests substantially the same precursor, so there would be a reasonable expectation that the BET specific surface area, tap density, and particle sizes would be substantially similar. As to claim 14, Yun teaches a nickel-based active material precursor with the claimed Formula 1, including Al, W, Mo, Cr, Zr, and Ti as M (see [0044]-[0045]). Response to Arguments Applicant's arguments have been fully considered but are not found persuasive. Applicant argues that Yun does not disclose or suggest that the claimed ratios of feed rates are equal. However, Yun teaches in [0057] that to control the growth rates of nickel-based active material precursor particles, the amount of a metal-containing raw material added to grow the particles may be increased by about 15% to about 35%, for example, about 25% in the second act compared to the first act. In addition, the feed rate of complexing agent (e.g., ammonia water) in the second act may be increased by about 10% to about 30%, for example, about 20% with respect to the feed rate of complexing agent (e.g. ammonia water) in the first act ([0057]). Yun also teaches increasing the concentration of the complexing agent in the reaction mixture in the second and third act ([0050], [0051]). In other words, Yun teaches increasing the feed rates in overlapping ranges (15-35% and 10-30%), which would read on equal ratios. Further, Yun clearly appreciates that both concentration and feed rate affect the growth rate of precursor particles. It would have been obvious to one of ordinary skill in the art at the effective filing date of the invention to control the growth rates of precursor particles by controlling the concentration and feed rate, as well as rate of increase (ratio), with the ranges taught in Yun to achieve a positive active material with enhanced lithium availability and enhanced capacity and lifespan due to suppression of crack formation in the active material during charging and discharging. Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to DANIEL H. LEE whose telephone number is (571)272-2548. The examiner can normally be reached M-F 8:30-5:00. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Michael Orlando can be reached at 5712705038. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. DANIEL H. LEE Primary Examiner Art Unit 1746 /DANIEL H LEE/Primary Examiner, Art Unit 1746
Read full office action

Prosecution Timeline

Aug 08, 2023
Application Filed
Apr 27, 2026
Non-Final Rejection mailed — §103
Jul 27, 2026
Response Filed
Aug 27, 2026
Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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ELECTROLYTIC SOLUTION AND NON-AQUEOUS ELECTROLYTIC SOLUTION SECONDARY BATTERY
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2y 10m to grant Granted May 05, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
71%
Grant Probability
96%
With Interview (+25.3%)
2y 7m (~0m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 557 resolved cases by this examiner. Grant probability derived from career allowance rate.

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