Prosecution Insights
Last updated: October 02, 2026
Application No. 18/276,833

PARTICLE-IMMOBILIZED SUBSTRATE, METHOD FOR PRODUCING PARTICLE-IMMOBILIZED SUBSTRATE, METHOD FOR PRODUCING DIAMOND-FILM-IMMOBILIZED SUBSTRATE, AND METHOD FOR PRODUCING DIAMOND

Non-Final OA §102
Filed
Aug 10, 2023
Priority
Mar 10, 2021 — JP 2021-038087 +2 more
Examiner
LE, HOA T
Art Unit
1788
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Daicel Corporation
OA Round
1 (Non-Final)
73%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
85%
With Interview

Examiner Intelligence

Grants 73% — above average
73%
Career Allowance Rate
798 granted / 1097 resolved
+7.7% vs TC avg
Moderate +12% lift
Without
With
+12.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 11m
Avg Prosecution
28 currently pending
Career history
1140
Total Applications
across all art units

Statute-Specific Performance

§101
0.7%
-39.3% vs TC avg
§103
42.4%
+2.4% vs TC avg
§102
27.2%
-12.8% vs TC avg
§112
24.2%
-15.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1097 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of claims 1-3 and 5-8 in the reply filed on May 8, 2026, is acknowledged with appreciation. Claims 4 and 9-12 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected invention, there being no allowable generic or linking claim. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-3 and 5-8 are rejected under 35 U.S.C. 102[(a)(1) as being anticipated by Busnaina et al. (US-2009/0087622). 1. (Oinal) A particle-immobilized substrate comprising a substrate and a plurality of Claim 1: Busnaina teaches particle-immobilized substrate comprising a substrate and a plurality of inorganic nanoparticles disposed on the substrate, the plurality of inorganic nanoparticles being disposed in contact with each other in a region, which is defined in Busnaina as “nanowell” or “nanotrench” (Busnaina, para. 0013, 0032 and 0044). The nanoparticles include inorganic nanoparticles, e.g. carbon nanoparticles (para. 0034); the nanowell or nanotrench has a width of at least 20 nm and up to 500 nm or 1000 nm (Busnaina, para. 0040); in particular, the nanotrench has a width of 50 nm to 350 nm (Page 6, Example III) which meets the claimed range of 1 µm or less on the substrate. Claim 2: Busnaina does not report the zeta potential difference between the substrate and the nanoparticles; however, Busnaina teaches a substrate being oxidized silicon substrate and nanoparticles being carbon nanoparticles (See Pagaes 5-6, Examples I-III), and it is known in the art of dispersion stability is that the difference in Zeta potential between the substrate (Si) and the carbon nanoparticles should be at least 30mV for colloidal stability. Therefore, as the carbon nanoparticles are dispersed stability in the silicon substrate (Busnaina, Page 6, Example III), it is necessarily inherent that the zeta potential difference between the substrate and the dispersed nanoparticles is at least 30 mV. Claim 3. Busnaina teaches a plurality of the regions (i.e. nanotrenches) having a width of 1 µm or less is regularly arranged on the substrate, and the inorganic nanoparticles are disposed in each of the plurality of the regions having a width of 1 µm or less. See Figure 12 C (paragraph 0044) and Page 6, Example III. Claim 5: See claims 1 and 2 above. Claims 6-7: Busnaina teaches forming the substrate and aligning the nanoparticles in the nanotrenches in the substrate by DC electrophoresis (Busnaina, para. 0018 and 0031). Electrophoresis works by applying an electric field to a sample containing charged molecules, causing them to migrate through a medium, toward the electrode with the opposite charge. Therefore, it is necessarily inherent that one region (i.e. nanotrench) is negatively charged, the other region (nanotrench) is positively charged. Claim 8. Busnaina teaches a plurality of the regions (i.e. nanotrenches) having a width of 1 µm or less is regularly arranged on the substrate, and the inorganic nanoparticles are disposed in each of the plurality of the regions having a width of 1 µm or less. See Figure 12 C (paragraph 0044) and Page 6, Example III. Any inquiry concerning this communication or earlier communications from the examiner should be directed to HOA (Holly) LE whose telephone number is (571)272-1511. The examiner can normally be reached Monday to Friday, 10:00 am to 7:00 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Alicia Chevalier can be reached at 571-272-1490. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. HOA (Holly) LE Primary Examiner Art Unit 1788 /HOA (Holly) LE/Primary Examiner, Art Unit 1788
Read full office action

Prosecution Timeline

Aug 10, 2023
Application Filed
Sep 10, 2026
Non-Final Rejection mailed — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
73%
Grant Probability
85%
With Interview (+12.2%)
2y 11m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1097 resolved cases by this examiner. Grant probability derived from career allowance rate.

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