Prosecution Insights
Last updated: April 19, 2026
Application No. 18/281,220

SILICON NITRIDE SUBSTRATE

Non-Final OA §102
Filed
Sep 08, 2023
Examiner
AUER, LAURA A
Art Unit
1783
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Proterial Ltd.
OA Round
1 (Non-Final)
49%
Grant Probability
Moderate
1-2
OA Rounds
3y 11m
To Grant
83%
With Interview

Examiner Intelligence

Grants 49% of resolved cases
49%
Career Allow Rate
227 granted / 466 resolved
-16.3% vs TC avg
Strong +34% interview lift
Without
With
+34.3%
Interview Lift
resolved cases with interview
Typical timeline
3y 11m
Avg Prosecution
46 currently pending
Career history
512
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
54.8%
+14.8% vs TC avg
§102
16.5%
-23.5% vs TC avg
§112
20.9%
-19.1% vs TC avg
Black line = Tech Center average estimate • Based on career data from 466 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-4 are rejected under 35 U.S.C. 102(a)(1) and (a)(2) as being anticipated by Imamura et al. (US 2019/0031566). Regarding claim 1, Imamura discloses a large-sized silicon nitride sintered substrate, see abstract. The reference further discloses that in order to suppress the substrate to be formed from being curved or waved, a weight plate is placed on a top surface of the greensheet formed for producing the silicon nitride substrate [0076-0083], see Figures 7-10. While the reference does not specifically disclose the claimed thermal conductivity ratio, it is expected the disclosed silicon nitride substrate will have the same thermal conductivity variation (i.e. the claimed ratio) given the disclosed and claimed substrates are formed using the same or similar method (i.e. molding Si powder into greensheets, placing a weight on the greensheet to prevent it from being curved or waved after sintering, stacking the greensheets in a vertical frame, and nitriding the Si powder); see Imamura [0066-0091] and Applicant’s specification [0047-0052]. See also MPEP 2112.01 I: “Where the claimed and prior art products are identical or substantially identical in structure or composition, or are produced by identical or substantially identical processes, a prima facie case of either anticipation or obviousness has been established.” Regarding claim 2, the reference discloses the substrate has a main surface of a shape larger than a square having a side of a length of 120 mm or than a rectangle of 150 mm x 170 mm [0019]. Note that the ranges in Imamura are considered to disclose the claimed range with “sufficient specificity” so as to anticipate the claimed range; see MPEP 2131.03 II. Regarding claims 3 and 4, while the reference does not specifically disclose the claimed thermal conductivity values, given the reference discloses a substrate of the same or similar composition produced by the same or similar method, it is expected the disclosed silicon nitride substrate will have the same properties regarding thermal conductivity values; see above discussion and MPEP 2112.01 I and II. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to LAURA A AUER whose telephone number is (571)270-5669. The examiner can normally be reached Monday - Friday 9 am - 4 pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, M. Veronica Ewald can be reached at (571)272-8519. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /LAURA A AUER/ Primary Examiner, Art Unit 1783
Read full office action

Prosecution Timeline

Sep 08, 2023
Application Filed
Jan 06, 2026
Non-Final Rejection — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
49%
Grant Probability
83%
With Interview (+34.3%)
3y 11m
Median Time to Grant
Low
PTA Risk
Based on 466 resolved cases by this examiner. Grant probability derived from career allow rate.

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