Prosecution Insights
Last updated: April 19, 2026
Application No. 18/296,009

ELECTRONIC DEVICE

Non-Final OA §102
Filed
Apr 05, 2023
Examiner
ROSENAU, DEREK JOHN
Art Unit
2837
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Seiko Epson Corporation
OA Round
1 (Non-Final)
77%
Grant Probability
Favorable
1-2
OA Rounds
3y 1m
To Grant
86%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allow Rate
951 granted / 1229 resolved
+9.4% vs TC avg
Moderate +8% lift
Without
With
+8.2%
Interview Lift
resolved cases with interview
Typical timeline
3y 1m
Avg Prosecution
34 currently pending
Career history
1263
Total Applications
across all art units

Statute-Specific Performance

§103
50.8%
+10.8% vs TC avg
§102
29.3%
-10.7% vs TC avg
§112
17.1%
-22.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1229 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim 1 is rejected under 35 U.S.C. 102(a)(1) as being anticipated by Ortiz et al. (US 2015/0280688). With respect to claim 1, Ortiz et al. discloses an electronic device (Fig 5) comprising: an element (item 120); a first substrate (item 505) including a first surface having a first electrode (item 501) coupled to the element and a second electrode (item 502) coupled to the element and placed in a position different from that of the first electrode (Fig 5 and paragraph 39); and a second substrate (item 535) having a second surface and a third surface and placed with the second surface facing the first surface (Fig 5), wherein the second substrate has a first opening (item 537) penetrating from the second surface to the third surface in a position corresponding to the first electrode (Fig 5), and a second opening (item 538) penetrating from the second surface to the third surface in a position corresponding to the second electrode (Fig 5), a first through electrode electrically coupled to the first electrode is provided in the first opening (Fig 5), a second through electrode electrically coupled to the second electrode is provided in the second opening (Fig 5), in a plan view of the third surface, an area of the first through electrode is larger than an area of the first opening (Fig 5, wherein the portion of the through electrode at the surface of the first substrate is larger than the opening of the through hole), and in the plan view of the third surface, an area of the second through electrode is larger than an area of the second opening (Fig 5, wherein the portion of the through electrode at the surface of the first substrate is larger than the opening of the through hole). Allowable Subject Matter Claims 2-6 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: the prior art does not disclose or suggest “wherein dimples are formed, in the third surface, in a region between the first opening and the second opening” in combination with the remaining elements of claim 2. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to Derek John Rosenau whose telephone number is (571)272-8932. The examiner can normally be reached Monday-Thursday 7 am to 5:30 pm Central Time. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Dedei Hammond can be reached at (571) 270-7938. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DEREK J ROSENAU/Primary Examiner, Art Unit 2837
Read full office action

Prosecution Timeline

Apr 05, 2023
Application Filed
Mar 06, 2026
Non-Final Rejection — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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COMPOSITE STRUCTURE AND ASSOCIATED PRODUCTION METHOD
2y 5m to grant Granted Apr 14, 2026
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2y 5m to grant Granted Apr 07, 2026
Patent 12593611
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2y 5m to grant Granted Mar 24, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
77%
Grant Probability
86%
With Interview (+8.2%)
3y 1m
Median Time to Grant
Low
PTA Risk
Based on 1229 resolved cases by this examiner. Grant probability derived from career allow rate.

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