Prosecution Insights
Last updated: April 19, 2026
Application No. 18/316,184

FILTER SYSTEM AND SEPARATION METHOD

Non-Final OA §102§103
Filed
May 11, 2023
Examiner
MASKELL, MICHAEL P
Art Unit
2878
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Ketek GmbH Halbleiter-Und Reinraumtechnik
OA Round
1 (Non-Final)
86%
Grant Probability
Favorable
1-2
OA Rounds
2y 4m
To Grant
96%
With Interview

Examiner Intelligence

Grants 86% — above average
86%
Career Allow Rate
917 granted / 1064 resolved
+18.2% vs TC avg
Moderate +10% lift
Without
With
+10.1%
Interview Lift
resolved cases with interview
Typical timeline
2y 4m
Avg Prosecution
17 currently pending
Career history
1081
Total Applications
across all art units

Statute-Specific Performance

§101
3.2%
-36.8% vs TC avg
§103
38.3%
-1.7% vs TC avg
§102
37.4%
-2.6% vs TC avg
§112
15.2%
-24.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1064 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of claims 1-5 and 20 in the reply filed on 10/20/2025 is acknowledged. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim(s) 1 is/are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Scarth (U.S. Patent Application Publication 2014/0216253 A1). Regarding claim 1, Scarth discloses a filter system comprising: A fluid channel configured to guide a fluid (Fig. 1, Air) to be separated into at least two constituents (air with lowered CO2 exiting through port 15, and air with higher CO2 exiting through port 14); An ionizer (12) in or at the fluid channel, the ionizer configured to at least partially ionize the fluid into ions (paragraph 0053); and A separation unit (13) in or at the fluid channel, the separation unit arranged downstream of the ionizer (Fig. 1) and configured to separate the at least two constituents from one another and to guide them separately from one another (paragraph 0056). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 2, 3, 5 and 20 is/are rejected under 35 U.S.C. 103 as being unpatentable over Scarth in view of Murakami, et al (U.S. Patent Application Publication 2023/0134647 A1). Regarding claims 2 and 20, Scarth discloses the filter system according to claim 1, but fails to teach the specific type of ionizer, other than to specify that it is an electron-emission source (paragraph 0053). Murakami teaches an electron-emission ionizer comprising at least one gate-insulator-substrate electron-emission structure (GIS-EE) (Fig. 2); Wherein the at least one GIS-EE is configured to emit low-energy electrons (paragraph 0061) causing the ions, and Wherein the at least one GIS-EE comprises: An electrically conductive substrate (1), An insulator layer (6) of a dielectric material located on the substrate, A gate electrode (3) of a further electrically conductive material located directly on the insulator layer, A first electrical connection located on the substrate (implied by a voltage being applied between electrode substrate 1 and gate electrode 3: the substrate 1 must be connected electrically to either a voltage source or ground in order for this to happen), and A second electrical connection (4) located on the gate electrode. Murakami further teaches that such an electron source is resistant to corrosion and can be used in harsh environments (paragraph 0092). It would have been obvious to one of ordinary skill in the art before the effective filing date of the invention to use Murakami’s electron emission source as the electron emission source in Scarth’s filter, because doing so would allow the device to be used in harsh environments. Regarding claim 3, Murakami’s gate electrode comprises carbon and has a thickness of at most 10 nm (paragraph 0078 – polycrystalline graphite film having a film thickness of 7 nm). Regarding claim 5, Murakami’s GIS-EE is a field ionizer (paragraph 0057). Allowable Subject Matter Claim 4 is objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: the prior art fails to teach wherein the at least one GIS-EE is divided into a plurality of lamellae, or the at least one GIS-EE is lattice-shaped and is penetrated by a plurality of holes, or the lamellae or a lattice with the holes is realized by a plurality of GIS-EEs, and wherein intermediate spaces between the lamellae or the holes are included in the fluid channel. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to MICHAEL P MASKELL whose telephone number is (571)270-3210. The examiner can normally be reached M-F 10A-6P. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Robert Kim can be reached at 571-272-2293. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /MICHAEL MASKELL/Primary Examiner, Art Unit 2881 07 February 2026
Read full office action

Prosecution Timeline

May 11, 2023
Application Filed
Feb 07, 2026
Non-Final Rejection — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12592359
APPARATUS, SYSTEM AND METHOD FOR ENERGY SPREAD ION BEAM
2y 5m to grant Granted Mar 31, 2026
Patent 12584943
Method for Producing a Substrate Comprising Multiple Tips for Scanning Probe Microscopy
2y 5m to grant Granted Mar 24, 2026
Patent 12586748
Structure for Particle Acceleration And Charged Particle Beam Apparatus
2y 5m to grant Granted Mar 24, 2026
Patent 12580092
COLLIMATOR AND METHODS OF FORMING SAME
2y 5m to grant Granted Mar 17, 2026
Patent 12555764
MASS SPECTROMETRY IMAGING
2y 5m to grant Granted Feb 17, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

AI Strategy Recommendation

Get an AI-powered prosecution strategy using examiner precedents, rejection analysis, and claim mapping.
Powered by AI — typically takes 5-10 seconds

Prosecution Projections

1-2
Expected OA Rounds
86%
Grant Probability
96%
With Interview (+10.1%)
2y 4m
Median Time to Grant
Low
PTA Risk
Based on 1064 resolved cases by this examiner. Grant probability derived from career allow rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month