Prosecution Insights
Last updated: October 27, 2026
Application No. 18/358,086

PROJECTION OPTICAL APPARATUS AND PROJECTOR

Non-Final OA §103
Filed
Jul 25, 2023
Priority
Jul 25, 2022 — JP 2022-117786
Examiner
LE, BAO-LUAN Q
Art Unit
2882
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Seiko Epson Corporation
OA Round
3 (Non-Final)
52%
Grant Probability
Moderate
3-4
OA Rounds
0m
Est. Remaining
69%
With Interview

Examiner Intelligence

Grants 52% of resolved cases
52%
Career Allowance Rate
522 granted / 998 resolved
-15.7% vs TC avg
Strong +16% interview lift
Without
With
+16.4%
Interview Lift
resolved cases with interview
Typical timeline
3y 1m
Avg Prosecution
44 currently pending
Career history
1050
Total Applications
across all art units

Statute-Specific Performance

§101
0.5%
-39.5% vs TC avg
§103
59.1%
+19.1% vs TC avg
§102
26.3%
-13.7% vs TC avg
§112
10.5%
-29.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 998 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Status The filing on 05/18/2026 amended claims 1, 5 and cancelled claim 2. Claims 1, 3-5 and 7-9 are pending and rejected on new grounds of rejections necessitated by the amendments of claim 1. A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on 05/18/2026 has been entered. Claim Rejections - AIA 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102 of this title, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1, 3-5 and 7-9 are rejected under 35 U.S.C. 103 as being unpatentable over Pang (CN 112505995 A) in view of Gou (US 20210240060 A1). Regarding claim 1, Pang teaches a projection optical apparatus (000) comprising: an optical system (refractive portion of 200) that image light enters; a reflector (201) that reflects the image light that exits out of the optical system (refractive portion of 200); and an enclosure (100, 300, 500, 600) that houses the optical system (refractive portion of 200) and the reflector (201), which has a body/base having an light incident surface, i.e., a first surface, and a back surface, i.e,. a second surface, opposite from the first surface. The incident surface reflects incident light. Pang does not explicitly teach a reflection layer provided at the first surface of the base, and a heat conductive layer provided at the second surface of the base, and the heat conductive layer has heat conductivity higher than heat conductivity of the base. Guo teaches a reflector (7) including a base (72) having a first surface (opposite of 721) on which the image light is incident and a second surface (721) opposite from the first surface (opposite of 721), a reflection layer (71) provided at the first surface (opposite of 721) of the base (72), and a heat conductive layer (10) provided at the second surface (721) of the base (72), and the heat conductive layer (10) has heat conductivity higher than heat conductivity of the base (72; [0030], [0033]); and the surface roughness and the thickness of the heat conductive layer (10) being greater than surface roughness and thickness of the reflection layer (71), respectively ([0030], [0033]). It would have been obvious to a person of ordinary skills in the art at the time of the invention to combine Pang with Guo; because it allows producing a cost effective and stable mirror for high heat intensity operating environment. The combination of Pang and Guo consequently results in an illuminance distribution formed by the image light at the reflection layer has a first region where the illuminance is locally higher than a predetermined value; and the heat conductive layer is provided at the second surface at least at a second region thereof, the second region being a region of the second surface that physically overlaps with an outer shape of the first region in a direction of a shortest thickness of the reflection layer and the base. Regarding claim 3, Pang further teaches the enclosure (100, 300, 500, 600) has a hermetically sealed structure (see highlighted portions of the supplied translation of Pang) that seals a housing space that houses the optical system (refractive portion of 200) and the reflector (201). Regarding claim 4, the combination of Pang and Guo consequently results in the base (72 of Guo) is made of a plastic material ([0030] of Guo). Regarding claim 5, the combination of Pang and Guo consequently results in wherein the reflection layer (71, e.g., ReflecTech reflective film of SkyFuel Company; [0030] of Guo) and the heat conductive layer (10 of Guo) are each made of a metal material ([0033] of Guo). Regarding claim 7, Pang further teaches the reflection layer (71) has a concave shape (Fig. 3-7). Regarding claim 8, Pang further teaches the image light that exits via a reduction-side conjugate plane enters the optical system (refractive portion of 200), and the reflector (201) reflects and projects the image light into an enlargement-side conjugate plane (Fig. 9; see highlighted portions of the supplied translation of Pang). Regarding claim 9, Pang further teaches a projector comprising: a light source apparatus that outputs light; a light modulator that modulates the light from the light source apparatus; and the projection optical apparatus (000) according to claim 1 that projects modulated image light from the light modulator (Fig. 9; see highlighted portions of the supplied translation of Pang). Response to Arguments Applicant's arguments with respect to claim 1 have been fully considered but are moot in in view of new ground/s of rejection necessitated by the amendment/s of claim 1. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to BAO-LUAN Q LE whose telephone number is (571)270-5362. The examiner can normally be reached on Monday-Friday; 9:00AM-5:00PM. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Minh-Toan Ton can be reached on (571) 272 230303. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. Any response to this action should be mailed to: Commissioner for Patents P.O. Box 1450 Alexandria, Virginia 22313-1450 Or faxed to: (571) 273-8300, (for formal communications intended for entry) Or: (571) 273-7490, (for informal or draft communications, please label “PROPOSED” or “DRAFT”) Hand-delivered responses should be brought to: Customer Service Window Randolph Building 401 Dulany Street Alexandria, VA 22314 /BAO-LUAN Q LE/ Primary Examiner, Art Unit 2882
Read full office action

Prosecution Timeline

Jul 25, 2023
Application Filed
Oct 20, 2025
Non-Final Rejection mailed — §103
Jan 13, 2026
Response Filed
Feb 18, 2026
Final Rejection mailed — §103
May 18, 2026
Request for Continued Examination
May 22, 2026
Response after Non-Final Action
Oct 01, 2026
Non-Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12754464
PROJECTOR
3y 7m to grant Granted Oct 06, 2026
Patent 12754468
ILLUMINATION SYSTEM AND PROJECTION DEVICE
2y 11m to grant Granted Oct 06, 2026
Patent 12756805
CONTROL METHOD FOR PROJECTOR, PROJECTOR, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM STORING PROGRAM
2y 10m to grant Granted Oct 06, 2026
Patent 12742967
INCORPORATING COMPONENTS INSIDE OPTICAL STACKS OF HEADMOUNTED DEVICES
5y 6m to grant Granted Sep 22, 2026
Patent 12736867
PROJECTION SYSTEM AND PROJECTOR
3y 8m to grant Granted Sep 15, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
52%
Grant Probability
69%
With Interview (+16.4%)
3y 1m (~0m remaining)
Median Time to Grant
High
PTA Risk
Based on 998 resolved cases by this examiner. Grant probability derived from career allowance rate.

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