Prosecution Insights
Last updated: July 17, 2026
Application No. 18/364,850

STAGE APPARATUS, PATTERN FORMING APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE

Non-Final OA §102
Filed
Aug 03, 2023
Priority
Sep 12, 2022 — JP 2022-144371
Examiner
COOK, CORTEZ M
Art Unit
2846
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Canon Inc.
OA Round
2 (Non-Final)
84%
Grant Probability
Favorable
2-3
OA Rounds
0m
Est. Remaining
92%
With Interview

Examiner Intelligence

Grants 84% — above average
84%
Career Allowance Rate
420 granted / 498 resolved
+16.3% vs TC avg
Moderate +8% lift
Without
With
+8.2%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 1m
Avg Prosecution
18 currently pending
Career history
509
Total Applications
across all art units

Statute-Specific Performance

§101
1.7%
-38.3% vs TC avg
§103
74.1%
+34.1% vs TC avg
§102
14.5%
-25.5% vs TC avg
§112
8.5%
-31.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 498 resolved cases

Office Action

§102
DETAILED ACTION This office action is in response to amendments filed on 06/12/2026. Claims 1-17 are pending. Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after allowance or after an Office action under Ex Parte Quayle, 25 USPQ 74, 453 O.G. 213 (Comm'r Pat. 1935). Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, prosecution in this application has been reopened pursuant to 37 CFR 1.114. Applicant's submission filed on 06/12/2026 has been entered. Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Priority Receipt is acknowledged of certified copies of papers required by 37 CFR 1.55. Information Disclosure Statement The information disclosure statement (IDS) submitted on 06/12/2026 was filed after the filing date of the application. The submission is in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-2 and 14-16 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Binnard et al. US 20040252287 A1 (Hereinafter “Binnard”). Regarding Claim 1, Binnard teaches a stage apparatus (Fig. 2A, 224) comprising: a first stage (Fig. 2A, 206) configured to be movable in a first direction (Fig. 2A, X); a first driving unit (Fig. 2A, 236A) configured to generate a first thrust force to move the first stage in the first direction ([0053-0054]); a second driving unit (Fig. 2A, 240) configured to generate a second thrust force to move the first stage in a second direction (Fig. 2A, Y) perpendicular to the first direction ([0058]); and a reaction force reducing unit (Fig. 2A, 289) configured to generate a third thrust force to reduce a reaction force generated by the generation of the first thrust force of the first driving unit ([0075]), wherein at least part of the reaction force reducing unit is coupled to a part of the second driving unit (Abstract, the first mass assembly (256) is coupled to the stage mover assembly (204)), and wherein the reaction force reducing unit is configured to generate third thrust forces with different magnitudes from each other at a plurality of positions in the second direction, and to generate third thrust forces with different magnitudes from each other at a plurality of positions in a third direction (Fig. 2A, Z) perpendicular to the first direction and the second direction ([0075]). Regarding Claim 2, Binnard teaches the stage apparatus according to claim 1, further comprising: a measuring unit (Fig. 1, 28) configured to measure a position of the first stage; and a controller (Fig. 2A, 226) configured to control the reaction force reducing unit, wherein the reaction force reducing unit includes a plurality of thrust force generating units (Fig. 2A, 290 & 292) each of which is arranged at respective positions, and wherein the controller is configured to determine at least one thrust force generating unit generating the third thrust force to reduce the reaction force based on the position in the second direction of the first stage measured by the measuring unit ([0075], the control system 226 can direct current to the flywheel mover 292 secured to the Y mass 266A to rotate the flywheel 290 about the Z axis in the first rotational direction. This causes a theta Z correction torque from the flywheel mover 292 to be imparted upon the Y mass 266A about the Z axis in the second rotational direction that counteracts, reduces and/or cancels the theta Z reaction force). Regarding Claim 14, Binnard teaches the stage apparatus according to claim 1, wherein the reaction force reducing unit is provided on both sides in the first direction of the first stage ([0075] Additionally, the reaction frame assembly 230 can include one or more torque reducers 289 that reduce the magnitude of torque experienced by one or both of the mass assemblies 256, 266). Regarding Claim 15, Binnard teaches a pattern forming apparatus for forming a pattern on a substrate, comprising the stage apparatus according to claim 1 configured to control driving of the first stage on which the substrate is mounted ([0012] The present invention is also directed to an exposure apparatus, a device made with the exposure apparatus, a wafer made with the exposure apparatus, a method for making a stage assembly, a method for making an exposure apparatus, a method for making a device and a method for manufacturing a wafer). Regarding Claim 16, Binnard teaches a method for manufacturing an article, comprising: forming a pattern on the substrate by using the pattern forming apparatus according to claim 15; and processing the substrate on which the pattern is formed to obtain the article ([0012] The present invention is also directed to an exposure apparatus, a device made with the exposure apparatus, a wafer made with the exposure apparatus, a method for making a stage assembly, a method for making an exposure apparatus, a method for making a device and a method for manufacturing a wafer). Allowable Subject Matter Claim 17 is allowed. The following is a statement of reasons for the indication of allowable subject matter: determining the magnitudes of the third thrust forces generated at each of the plurality of positions in the second direction based on the position in the second direction of the first stage measured in the measuring step and a gain parameter. Claims 3-13 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Binnard US 6844694 B2 teaches a stage assembly comprising: a guide assembly including: a guide bar movable in a first direction, the guide bar having a center of gravity and a guiding portion; a stage movable along the guiding portion of the guide bar in a second direction substantially perpendicular to the first direction and exerting a reaction force on the guide bar, the stage having a center of gravity spaced apart from the center of gravity of the guide bar in the first direction; a first actuator component positioned on the guide bar and aligned with the center of gravity of the stage in the second direction to apply a compensating force on the guide bar to cancel the reaction force exerted by the stage; and a second actuator component positioned on the guide bar and aligned with the center of gravity of the guide bar in the second direction to apply a force on the guide bar to control a position of the guide bar in the second direction. Mayama US 20020104950 A1 teaches a vibration suppression apparatus adjusts the driving force generated by the linear-acting actuator 51 to drive the inertial load 52 so as to control a thrust applied as a reaction force to the vibration suppression target. Any inquiry concerning this communication or earlier communications from the examiner should be directed to CORTEZ M COOK whose telephone number is (571)270-7954. The examiner can normally be reached Monday-Thursday 7:30-5pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Eduardo Colon-Santana can be reached at 571-272-2060. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /CORTEZ M COOK/ Primary Examiner, Art Unit 2837
Read full office action

Prosecution Timeline

Aug 03, 2023
Application Filed
Nov 14, 2025
Non-Final Rejection mailed — §102
Feb 10, 2026
Response Filed
May 27, 2026
Response after Non-Final Action
Jun 12, 2026
Request for Continued Examination
Jun 23, 2026
Response after Non-Final Action
Jun 29, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12683483
GATE DRIVING DEVICE AND METHOD OF CONTROLLING ELECTRIFIED VEHICLE INCLUDING SAME
2y 9m to grant Granted Jul 14, 2026
Patent 12683530
POSITION DETECTION AND MONITORING
2y 7m to grant Granted Jul 14, 2026
Patent 12678925
Power Tool Dynamic Motor Field Weakening System and Method
2y 4m to grant Granted Jul 14, 2026
Patent 12665535
SYSTEM AND METHOD FOR MODIFIED ACTIVE ZERO SPACE VECTOR PULSE WIDTH MODULATION
2y 2m to grant Granted Jun 23, 2026
Patent 12658837
CONTROL APPARATUS AND METHOD OF CONTROLLING THE APPARATUS
2y 8m to grant Granted Jun 16, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

2-3
Expected OA Rounds
84%
Grant Probability
92%
With Interview (+8.2%)
2y 1m (~0m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 498 resolved cases by this examiner. Grant probability derived from career allowance rate.

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