Prosecution Insights
Last updated: October 26, 2026
Application No. 18/426,649

JOINT IMPLANT WITH A POROUS STRUCTURE

Final Rejection §102§103
Filed
Jan 30, 2024
Priority
Feb 10, 2023 — provisional 63/484,255
Examiner
GANESAN, SUBA
Art Unit
3774
Tech Center
3700 — Mechanical Engineering & Manufacturing
Assignee
Waldemar Link GmbH & Co. Kg
OA Round
2 (Final)
74%
Grant Probability
Favorable
3-4
OA Rounds
7m
Est. Remaining
87%
With Interview

Examiner Intelligence

Grants 74% — above average
74%
Career Allowance Rate
504 granted / 683 resolved
+3.8% vs TC avg
Moderate +13% lift
Without
With
+13.4%
Interview Lift
resolved cases with interview
Typical timeline
3y 4m
Avg Prosecution
26 currently pending
Career history
720
Total Applications
across all art units

Statute-Specific Performance

§101
0.9%
-39.1% vs TC avg
§103
49.8%
+9.8% vs TC avg
§102
22.4%
-17.6% vs TC avg
§112
20.4%
-19.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 683 resolved cases

Office Action

§102 §103
9DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-4, 6-12 are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Van Der Meulen et al. (Pub. No.: US 2024/0122717). Van Der Meulen et al. (hereinafter, Van Der Meulen) discloses an implant configured to contact a portion of a bone (abstract), comprising: a stem 100 having a proximal section 114 and a distal section 108; and a porous portion 110 extending a distance along the stem in a longitudinal direction of the stem (e.g., fig. 6). For claim 2, Van Der Meulen discloses the implant of claim 1, further comprising a ridge 114, wherein the porous portion comprises at least two porous portions, wherein the ridge extends along the longitudinal direction of the stem between a first porous portion and a second porous portion of the at least two porous portions (e.g., fig. 20). For claim 3, Van Der Meulen discloses the implant of claim 2, wherein the ridge comprises an apex surface, and the apex surface has an average surface roughness that is lower than an average surface roughness of the porous portion (e.g., fig. 6, ridge is smooth). For claim 4, Van Der Meulen discloses the implant of claim 1, wherein a thickness of the porous portion is 1 mm or more (para. 52). For claim 6, Van Der Meulen discloses the implant of claim 1, wherein the porous portion comprises titanium (para. 77). For claim 7, Van Der Meulen discloses the implant of claim 1, wherein the porous portion comprises titanium, aluminum and vanadium (para. 77). For claim 8, Van Der Meulen discloses the implant of claim 7, wherein the porous portion comprises Ti-6Al-4V (para. 77). For claim 9, Van Der Meulen discloses the implant of claim 1, wherein at least a portion of the implant is formed by an additive manufacturing process (para. 77) For claim 10, Van Der Meulen discloses the implant of claim 9, wherein the porous portion is formed by the additive manufacturing process (para. 77). For claim 11, Van Der Meulen discloses the implant of claim 1, wherein the porous portion comprises a plurality of pores with a pore size in the range of about 200 nm to about 5 mm (para. 52). For claim 12, Van Der Meulen discloses the implant of claim 11, wherein the pore size in in the range of about 275 nm to about 1 mm (para. 52). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 4-5 are rejected under 35 U.S.C. 103 as being unpatentable over Van Der Meulen et al. (Pub. No.: US 2024/0122717) in view of Liu et. al (Pub. No.: US 2023/0338615). For claims 4 and 5, Van Der Meulen fails to specify a thickness of the porous portion of 1mm or more or 3mm or more. Liu et al. (hereinafter, Liu) discloses an prthopedic implant with a porous layer having a thickness of 1mm (para. 23) or 3mm (para. 25) as a suitable thickness for the porous layer. Selection of a thickness of 1mm or 3mm would have occurred using known methods and would have yielded predictable results. This modification would have occurred using known methods and would have yielded new methods. Claim 13 is rejected under 35 U.S.C. 103 as being unpatentable over Van Der Meulen et al. (Pub. No.: US 2024/0122717) in view of Trischler et al. (Pub. No.: US 2024/0058134). Van Der Meulen lacks pore size in the range of 400nm to 1micron. Trischler et al. (hereinafter, Trischler) teaches a pore size in the range of about 400 nm to about 1µm (para. 47) as a suitable pore size for implantable biomaterial for the purpose of enhancing bone integration and in-growth. It would have been obvious to one of ordinary skill in the art to have selected a pore size of 400nm to 1micron as an obvious expedient to select an appropriate pore size for bone ingrowth. This modification would have occurred using known methods and would have yielded new methods. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to SUBA GANESAN whose telephone number is (571)272-3243. The examiner can normally be reached Monday-Friday, 8 AM - 5 PM Mountain Time. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Jerrah Edwards can be reached at (408) 918-7557. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /SUBA GANESAN/Primary Examiner, Art Unit 3774
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Prosecution Timeline

Jan 30, 2024
Application Filed
Jun 03, 2026
Non-Final Rejection mailed — §102, §103
Jul 24, 2026
Response Filed
Oct 22, 2026
Final Rejection mailed — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
74%
Grant Probability
87%
With Interview (+13.4%)
3y 4m (~7m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 683 resolved cases by this examiner. Grant probability derived from career allowance rate.

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