Prosecution Insights
Last updated: April 19, 2026
Application No. 18/437,568

Light Extracting Substrate for Organic Light Emitting Diode

Non-Final OA §DP
Filed
Feb 09, 2024
Examiner
BOOHER, ADAM W
Art Unit
2872
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Vitro Flat Glass LLC
OA Round
1 (Non-Final)
75%
Grant Probability
Favorable
1-2
OA Rounds
2y 11m
To Grant
84%
With Interview

Examiner Intelligence

Grants 75% — above average
75%
Career Allow Rate
372 granted / 498 resolved
+6.7% vs TC avg
Moderate +10% lift
Without
With
+9.6%
Interview Lift
resolved cases with interview
Typical timeline
2y 11m
Avg Prosecution
23 currently pending
Career history
521
Total Applications
across all art units

Statute-Specific Performance

§101
0.5%
-39.5% vs TC avg
§103
49.9%
+9.9% vs TC avg
§102
16.4%
-23.6% vs TC avg
§112
26.2%
-13.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 498 resolved cases

Office Action

§DP
Notice of Pre-AIA or AIA Status The present application is being examined under the pre-AIA first to invent provisions. Status of Claims Claims 1-20 are pending. Claim 12 is objected to. Information Disclosure Statement The information disclosure statement (IDS) submitted on 9/16/2024 has been considered by the examiner. Drawings The drawings were received on 9 February 2024. These drawings are accepted. Double Patenting The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969). A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA . A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b). The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13. The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA /25, or PTO/AIA /26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer. Claims 1-11 and 13-20 are rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-6, 8, and 10 of U.S. Patent No. 10,581,020. Although the claims at issue are not identical, they are not patentably distinct from each other because: Regarding claim 1, US 10,581,020 claims a substrate comprising (see claim 1, line 1, light extraction substrate): a glass substrate having a first surface and a second surface (see claim 1, lines 2-3, homogenous glass substrate); a first region on and/or adjacent the first surface, the first region comprising nanoparticles embedded in the glass substrate at a depth of 0 to 50 microns (see claim 1, lines 4-7); and a second region on at least a portion of the second surface (see claim 1, lines 9-10), wherein the first surface of the glass substrate is smoother than the second surface of the glass substrate (see claim 1, lines 7-8 and 14-16, where a lower average surface roughness is smoother), wherein the first surface has an average surface roughness in the range of 1 nm to 100 nm (see claim 1, lines 7-8, average surface roughness of up to 10 nm), and wherein the second surface has an average surface roughness in the range of 50 nm to 500 nm (see claim 1, lines 14-16). Regarding claim 2¸ US 10,581,020 claims the substrate of claim 1 (see above), wherein the nanoparticles are selected from silver oxide nanoparticles, alumina nanoparticles, titania nanoparticles, cerium oxide nanoparticles, zinc oxide nanoparticles, tin oxide nanoparticles, silica nanoparticles, zirconia nanoparticles, and combinations thereof (see claim 2). Regarding claim 3¸ US 10,581,020 claims the substrate of claim 1 (see above), wherein the nanoparticles are deposited at a depth in the range of 0 microns to 10 microns with respect to the first surface (see claim 10). Regarding claim 4¸ US 10,581,020 claims the substrate of claim 1 (see above), wherein the second region comprises a coating (see claim 3). Regarding claim 5¸ US 10,581,020 claims the substrate of claim 4 (see above), wherein the coating is selected from silica, alumina, zinc oxide, titania, zirconia, tin oxide, silicate coatings, and mixtures thereof (see claim 4). Regarding claim 6¸ US 10,581,020 claims the substrate of claim 1 (see above), wherein the second region is formed by texturing the second surface (see claim 5). Regarding claims 7-10¸ US 10,581,020 claims the substrate of claim 1 (see above), wherein the substrate has haze in the range of 10% to 90%, the substrate has haze in the range of 10% to 80%, the substrate has haze in the range of 1% to 60%, or the substrate has haze in the range of 1% to 50% (see claim 1, lines 11-13, haze in the range of 10% to 40%). Regarding claim 11¸ US 10,581,020 claims the substrate of claim 1 (see above), wherein an anode layer is deposited on the first surface (see claim 6). Regarding claim 13¸ US 10,581,020 claims a substrate comprising (see claim 1, line 1, light extraction substrate): a glass substrate having a first surface and a second surface (see claim 1, lines 2-3, homogenous glass substrate); a first region on and/or adjacent the first surface, the first region comprising nanoparticles embedded in the glass substrate at a depth of 0 to 10 microns (see claim 1, lines 4-7, where the depth of 0 to 10 microns is encompassed in 0 to 50 microns); and a second region on at least a portion of the second surface (see claim 1, lines 9-10), wherein the first surface of the glass substrate is smoother than the second surface of the glass substrate (see claim 1, lines 7-8 and 14-16, where a lower average surface roughness is smoother), wherein the first surface has an average surface roughness in the range of 1 nm to 50 nm (see claim 1, lines 7-8, average surface roughness of up to 10 nm), and wherein the second surface has an average surface roughness in the range of 50 nm to 500 nm (see claim 1, lines 14-16). Regarding claim 14¸ US 10,581,020 claims the substrate of claim 13 (see above), wherein the nanoparticles are selected from silver oxide nanoparticles, alumina nanoparticles, titania nanoparticles, cerium oxide nanoparticles, zinc oxide nanoparticles, tin oxide nanoparticles, silica nanoparticles, zirconia nanoparticles, and combinations thereof (see claim 2). Regarding claim 15¸ US 10,581,020 claims the substrate of claim 13 (see above), wherein the second region comprises a coating (see claim 3). Regarding claim 16¸ US 10,581,020 claims the substrate of claim 15 (see above), wherein the coating is selected from silica, alumina, zinc oxide, titania, zirconia, tin oxide, silicate coatings, and mixtures thereof (see claim 4). Regarding claim 17¸ US 10,581,020 claims the substrate of claim 13, wherein the substrate has haze in the range of 10% to 90% (see claim 1, lines 11-13, haze in the range of 10% to 40%). Regarding claim 18¸ US 10,581,020 claims the substrate of claim 13, further comprising an anode layer deposited on the first surface (see claim 6). Regarding claim 19¸ US 10,581,020 claims the substrate of claim 13, wherein an underlayer coating stack is deposited on the first surface and an anode layer is deposited on the underlayer coating stack, the underlayer coating stack boosts transmittance of the glass substrate with the anode layer and with the first or second region (see claim 8). Regarding claim 20¸ US 10,581,020 claims a substrate comprising (see claim 1, line 1, light extraction substrate): a glass substrate having a first surface and a second surface (see claim 1, lines 2-3, homogenous glass substrate); a first region on and/or adjacent the first surface, the first region comprising nanoparticles embedded in the glass substrate at a depth of 0 to 50 microns (see claim 1, lines 4-7); and a second region on at least a portion of the second surface (see claim 1, lines 9-10), wherein the first surface of the glass substrate is smoother than the second surface of the glass substrate (see claim 1, lines 7-8 and 14-16, where a lower average surface roughness is smoother), wherein the first surface has an average surface roughness in the range of 1 nm to 100 nm (see claim 1, lines 7-8, average surface roughness of up to 10 nm), wherein the second surface has an average surface roughness in the range of 50 nm to 500 nm (see claim 1, lines 14-16), and wherein the first region provides haze in the range of 10% to 40% (see claim 1, lines 11-13). Allowable Subject Matter Claim 12 is objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims, for at least the reason that the prior art fails to teach or suggest that an anode layer is deposited on the first surface (claim 11) and that an underlayer coating stack is deposited prior to the anode layer to boost the transmittance of the substrate with the anode layer and with the first and/or second region, as generally set forth in claim 12, the invention including the totality of the particular limitations in claims 1 and 11, from which claim 12 depends. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. EP 1,793,263 to Chiang discloses a substrate comprising embedded diffuser materials and a surface structure (see at least Fig. 8b). Any inquiry concerning this communication or earlier communications from the examiner should be directed to ADAM W BOOHER whose telephone number is (571)270-0573. The examiner can normally be reached M - F: 8:00am - 4:00pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Stephone Allen can be reached at 571-272-2434. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ADAM W BOOHER/ Examiner, Art Unit 2872
Read full office action

Prosecution Timeline

Feb 09, 2024
Application Filed
Jan 06, 2026
Non-Final Rejection — §DP (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
75%
Grant Probability
84%
With Interview (+9.6%)
2y 11m
Median Time to Grant
Low
PTA Risk
Based on 498 resolved cases by this examiner. Grant probability derived from career allow rate.

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