Prosecution Insights
Last updated: April 19, 2026
Application No. 18/440,747

RETAINER RING MODULE AND CHEMICAL MECHANICAL POLISHING APPARATUS INCLUDING THE SAME

Non-Final OA §102§112
Filed
Feb 13, 2024
Examiner
SOTO, CHRISTOPHER ASHLEY
Art Unit
3723
Tech Center
3700 — Mechanical Engineering & Manufacturing
Assignee
Samsung Electronics Co., Ltd.
OA Round
1 (Non-Final)
54%
Grant Probability
Moderate
1-2
OA Rounds
2y 9m
To Grant
82%
With Interview

Examiner Intelligence

Grants 54% of resolved cases
54%
Career Allow Rate
59 granted / 110 resolved
-16.4% vs TC avg
Strong +29% interview lift
Without
With
+28.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
57 currently pending
Career history
167
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
47.1%
+7.1% vs TC avg
§102
22.8%
-17.2% vs TC avg
§112
26.0%
-14.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 110 resolved cases

Office Action

§102 §112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 9-12, 19, and 20 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Claim 9 recites: “an inlet formed” and “an outlet formed”. Claim 10 recites: “a plurality of inlets are arranged” and “a plurality of outlets are arranged”. Claims 11 and 12 recite: “each inlet of the plurality of inlets” and “each outlet of the plurality of outlets”. As claimed, it is unclear if all the recited inlets are referring to the same feature or entirely different features. As best understood and for examination purposes, claim 9 has been construed as “an inlet of a plurality of inlets”, to clarify the inlet of claim 9 is a singular feature belonging to a plurality. The recited outlets have been construed in a similar manner. Claim 19 recites: “wherein the retainer ring comprises:….. an outer side surface connecting an outer end…. an inlet formed at an outer side surface of the retainer ring”. As claimed, it is unclear if both the recited “outer side surface” are referring to the same or different feature. For examination purposes, both recited “outer side surface” have been construed as the same. Claim 19 recites: “wherein the retainer ring comprises: a lower surface in contact with the upper surface of the polishing pad…. an outlet formed at a lower surface of the retainer ring”. As claimed, it is unclear if both the recited “lower surface” are referring to the same or different feature. For examination purposes, both recited “lower surface” have been construed as the same. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-20 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by ADACHI (US 20180229345 A1). Referring to claim 1: ADACHI discloses a retainer ring module (shown in Fig. 1) comprising: a retainer ring (21/22 Figs. 2A and 2B) on a lower surface of a polishing head (20 Figs. 1, 2A, 2B, and 9), wherein the retainer ring (21/22 Figs. 2A and 2B) is configured to surround a substrate (W Fig. 2B) on an upper surface of a polishing pad (10 Figs. 1, 2B, 6A, 6B, and 9) to which slurry (slurry delivered from 30 Figs. 1 and 6A) is provided; and at least one slurry passage (OP1/OP2 Figs. 3A, 3B, 4A, 4B, 6A, 6B, and 6C) formed at the retainer ring (21/22 Figs. 2A and 2B), in a downward slant direction (“the first and second trenches T1 and T2 may be inclined” [0039]) toward a central portion (“the first and second trenches T1 and T2 may be inclined and extended in some degree from the radially inward or outward direction of the first and second retainer rings R1 and R2” [0039]) of the retainer ring, wherein the at least one slurry passage (OP1/OP2 Figs. 3A, 3B, 4A, 4B, 6A, 6B, and 6C) is configured to introduce the slurry outside (shown in Fig. 6A) the retainer ring (21/22 Figs. 2A and 2B) into a space (shown in Fig. 6B; [0050]) between the substrate (W Fig. 2B) and the polishing pad (10 Figs. 1, 2B, 6A, 6B, and 9). Referring to claim 2: ADACHI discloses the retainer ring module of claim 1, wherein the retainer ring (21/22 Figs. 2A and 2B) comprises: a lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) in contact with the upper surface of the polishing pad (10 Figs. 1, 2B, 6A, 6B, and 9); an upper surface (US Fig. 1-A inserted below) in contact with the lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) of the polishing head (20 Figs. 1, 2A, 2B, and 9); an inner side surface (inner side surface of T1 and T2; “the first and second trenches T1 and T2 may be inclined and extended in some degree from the radially inward or outward direction of the first and second retainer rings R1 and R2” [0039]) connecting an inner end (inner end of US Fig. 1-A inserted below) of the upper surface (US Fig. 1-A inserted below) of the retainer ring (21/22 Figs. 2A and 2B) and an inner end (IS2 Fig. 1-A inserted below) of the lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) of the retainer ring; and an outer side surface (OS1 Fig. 1-A inserted below) connecting an outer end (outer end of US Fig. 1-A inserted above) of the upper surface (US Fig. 1-A inserted below) of the retainer ring and an outer end (OS2 Fig. 1-A inserted below) of the lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) of the retainer ring. PNG media_image1.png 413 824 media_image1.png Greyscale Referring to claim 3: ADACHI discloses the retainer ring module of claim 2, wherein at least one surface of the inner side surface and the outer side surface (OS1 Fig. 1-A inserted above) is a vertical plane (shown in Fig. 1-A inserted above). Referring to claim 4: ADACHI discloses the retainer ring module of claim 3, wherein the lower surface (lower surface of R2 of 22 Figs. 2A and 2B) of the retainer ring has a width larger (WR2 Fig. 1-A inserted above) than a width (WC Fig. 1-A inserted above) of the upper surface of the retainer ring (21/22 Figs. 2A and 2B). Referring to claim 5: ADACHI discloses the retainer ring module of claim 3, wherein the lower surface (lower surface of R1 of 21 Figs. 2A and 2B) of the retainer ring has a width (WR1 Fig. 1-A inserted above) less than a width (WC Fig. 1-A inserted above) of the upper surface of the retainer ring (21/22 Figs. 2A and 2B). Referring to claim 6: ADACHI discloses the retainer ring module of claim 2, wherein the inner side surface (inner side surface of T1 and T2; “the first and second trenches T1 and T2 may be inclined and extended in some degree from the radially inward or outward direction of the first and second retainer rings R1 and R2” [0039]) is a slanted surface (“inclined” [0039]). Referring to claim 7: ADACHI discloses the retainer ring module of claim 6, wherein the lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) of the retainer ring has a width (WR1 Fig. 1-A inserted above) substantially the same as a width (inner width of US Fig. 1-A inserted above) of the upper surface (US Fig. 1-A inserted above) of the retainer ring (21/22 Figs. 2A and 2B). Referring to claim 8: ADACHI discloses the retainer ring module of claim 7, wherein the inner end (inner end of US Fig. 1-A inserted above) of the upper surface (US Fig. 1-A inserted above) of the retainer ring (21/22 Figs. 2A and 2B) has a radius different from a radius of the inner end (IS2 Fig. 1-A inserted above) of the lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) of the retainer ring. Referring to claim 9: ADACHI discloses the retainer ring module of claim 2, wherein the at least one slurry passage comprises: an inlet (T2 Figs. 3A, 3B, 4A, and 4B) formed at the outer side surface (OS1 Fig. 1-A inserted above) of the retainer ring (21/22 Figs. 2A and 2B), wherein the inlet is configured to introduce the slurry; and an outlet (T1 Figs. 3A, 3B, 4A, and 4B) formed at the lower surface (lower surface of R1 of 21 Figs. 2A and 2B) of the retainer ring, wherein the outlet (T1 Figs. 3A, 3B, 4A, and 4B) is configured to discharge the slurry. Referring to claim 10: ADACHI discloses the retainer ring module of claim 9, wherein a plurality of inlets (T2 Figs. 3A, 3B, 4A, and 4B) are arranged in a circumferential line (circumferential line of 21/22 shown in Figs. 2A, 4A, and 4B) of the retainer ring (21/22 Figs. 2A and 2B), and a plurality of outlets (T1 Figs. 3A, 3B, 4A, and 4B) are arranged in the circumferential line (circumferential line of 21/22 shown in Figs. 2A, 4A, and 4B) of the retainer ring (21/22 Figs. 2A and 2B) corresponding to the plurality of inlets (T2 Figs. 3A, 3B, 4A, and 4B). Referring to claim 11: ADACHI discloses the retainer ring module of claim 10, wherein each inlet of the plurality of inlets (T2 Figs. 3A, 3B, 4A, and 4B) and each outlet the plurality of outlets (T1 Figs. 3A, 3B, 4A, and 4B) have an arc shape or a circular shape (arc and circular shape of pluralities of T1 and T2 shown in Figs. 4A and 4B). Referring to claim 12: ADACHI discloses the retainer ring module of claim 10, wherein each inlet of the plurality of inlets (T2 Figs. 3A, 3B, 4A, and 4B) has an arc shape (arc shape of pluralities of T2 shown in Figs. 4A and 4B) and each outlet of the plurality of outlets (T1 Figs. 3A, 3B, 4A, and 4B) has a circular shape (circular shape of pluralities of T1 shown in Figs. 4A and 4B). Referring to claim 13: ADACHI discloses the retainer ring module of claim 1, comprising a shutter (P1/P2 Figs. 3A, 3B, 4A, and 4B) configured to open and close (shown in Figs. 4A and 4B) the at least one slurry passage (OP1/OP2 Figs. 3A, 3B, 4A, 4B, 6A, 6B, and 6C). Referring to claim 14: ADACHI discloses the retainer ring module of claim 13, wherein the shutter (P1/P2 Figs. 3A, 3B, 4A, and 4B) is at an outer side surface (OS2 Fig. 1-A inserted above) of the retainer ring (21/22 Figs. 2A and 2B). Referring to claim 15: ADACHI discloses a retainer ring module (shown in Fig. 1) comprising: a retainer ring (21/22 Figs. 2A and 2B) on a lower surface of a polishing head (20 Figs. 1, 2A, 2B, and 9), wherein the retainer ring (21/22 Figs. 2A and 2B) is configured to surround a substrate (W Fig. 2B) on an upper surface of a polishing pad (10 Figs. 1, 2B, 6A, 6B, and 9) to which slurry (slurry delivered from 30 Figs. 1 and 6A) is provided; at least one slurry passage (OP1/OP2 Figs. 3A, 3B, 4A, 4B, 6A, 6B, and 6C) formed at the retainer ring (21/22 Figs. 2A and 2B) in a downward slant direction (“the first and second trenches T1 and T2 may be inclined” [0039]) toward a central portion (“the first and second trenches T1 and T2 may be inclined and extended in some degree from the radially inward or outward direction of the first and second retainer rings R1 and R2” [0039]) of the retainer ring, wherein the at least one slurry passage (OP1/OP2 Figs. 3A, 3B, 4A, 4B, 6A, 6B, and 6C) is configured to introduce the slurry outside (shown in Fig. 6A) the retainer ring (21/22 Figs. 2A and 2B) into a space (shown in Fig. 6B; [0050]) between the substrate (W Fig. 2B) and the polishing pad (10 Figs. 1, 2B, 6A, 6B, and 9); and a shutter (P1/P2 Figs. 3A, 3B, 4A, and 4B) configured to open and close (shown in Figs. 4A and 4B) the at least one slurry passage (OP1/OP2 Figs. 3A, 3B, 4A, 4B, 6A, 6B, and 6C), wherein the at least one slurry passage comprises: an inlet (T2 Figs. 3A, 3B, 4A, and 4B) formed at an outer side surface (OS1 Fig. 1-A inserted above) of the retainer ring (21/22 Figs. 2A and 2B) to introduce the slurry; and an outlet (T1 Figs. 3A, 3B, 4A, and 4B) formed at a lower surface (lower surface of R1 of 21 Figs. 2A and 2B) of the retainer ring to discharge the slurry. Referring to claim 16: ADACHI discloses the retainer ring module of claim 15, wherein the retainer ring comprises: a lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) in contact with the upper surface of the polishing pad (10 Figs. 1, 2B, 6A, 6B, and 9); an upper surface (US Fig. 1-A inserted below) in contact with the lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) of the polishing head (20 Figs. 1, 2A, 2B, and 9); an inner side surface (inner side surface of T1 and T2; “the first and second trenches T1 and T2 may be inclined and extended in some degree from the radially inward or outward direction of the first and second retainer rings R1 and R2” [0039]) connecting an inner end (inner end of US Fig. 1-A inserted above) of the upper surface (US Fig. 1-A inserted above) of the retainer ring (21/22 Figs. 2A and 2B) and an inner end (IS2 Fig. 1-A inserted above) of the lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) of the retainer ring (21/22 Figs. 2A and 2B); and an outer side surface (OS1 Fig. 1-A inserted above) connecting an outer end (outer end of US Fig. 1-A inserted above) of the upper surface (US Fig. 1-A inserted above) of the retainer ring (21/22 Figs. 2A and 2B) and an outer end (OS2 Fig. 1-A inserted above) of the lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) of the retainer ring (21/22 Figs. 2A and 2B). Referring to claim 17: ADACHI discloses the retainer ring module of claim 16, wherein at least one surface of the inner side surface and the outer side surface (OS1 Fig. 1-A inserted above) is a vertical plane (shown in Fig. 1-A inserted above), and the lower surface (lower surface of R2 of 22 Figs. 2A and 2B) of the retainer ring has a width larger (WR2 Fig. 1-A inserted above) than a width (WC Fig. 1-A inserted above) of the upper surface of the retainer ring (21/22 Figs. 2A and 2B). Referring to claim 18: ADACHI discloses the retainer ring module of claim 16, wherein the inner side surface (inner side surface of T1 and T2; “the first and second trenches T1 and T2 may be inclined and extended in some degree from the radially inward or outward direction of the first and second retainer rings R1 and R2” [0039]) is a slanted surface (“inclined” [0039]), and the lower surface (lower surface of R1 of 21 Figs. 2A and 2B) of the retainer ring has a width (WR1 Fig. 1-A inserted above) substantially the same as a width (inner width of US Fig. 1-A inserted above) of the upper surface (US Fig. 1-A inserted above) of the retainer ring (21/22 Figs. 2A and 2B). Referring to claim 19: ADACHI discloses a retainer ring module (shown in Fig. 1) comprising: a retainer ring (21/22 Figs. 2A and 2B) on a lower surface of a polishing head (20 Figs. 1, 2A, 2B, and 9), wherein the retainer ring (21/22 Figs. 2A and 2B) is configured to surround a substrate (W Fig. 2B) on an upper surface of a polishing pad (10 Figs. 1, 2B, 6A, 6B, and 9) to which slurry (slurry delivered from 30 Figs. 1 and 6A) is provided; at least one slurry passage (OP1/OP2 Figs. 3A, 3B, 4A, 4B, 6A, 6B, and 6C) formed at the retainer ring (21/22 Figs. 2A and 2B) in a downward slant (“the first and second trenches T1 and T2 may be inclined” [0039]) direction toward a central portion (“the first and second trenches T1 and T2 may be inclined and extended in some degree from the radially inward or outward direction of the first and second retainer rings R1 and R2” [0039]) of the retainer ring, wherein the at least one slurry passage (OP1/OP2 Figs. 3A, 3B, 4A, 4B, 6A, 6B, and 6C) is configured to introduce the slurry outside (shown in Fig. 6A) the retainer ring (21/22 Figs. 2A and 2B) into a space (shown in Fig. 6B; [0050]) between the substrate (W Fig. 2B) and the polishing pad (10 Figs. 1, 2B, 6A, 6B, and 9); and a shutter (10 Figs. 1, 2B, 6A, 6B, and 9) configured to open and close (shown in Figs. 4A and 4B) the at least one slurry passage (OP1/OP2 Figs. 3A, 3B, 4A, 4B, 6A, 6B, and 6C), wherein the retainer ring comprises: a lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) in contact with the upper surface of the polishing pad (10 Figs. 1, 2B, 6A, 6B, and 9); an upper surface (US Fig. 1-A inserted below) in contact with the lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) of the polishing head (20 Figs. 1, 2A, 2B, and 9); an inner side surface (inner side surface of T1 and T2; “the first and second trenches T1 and T2 may be inclined and extended in some degree from the radially inward or outward direction of the first and second retainer rings R1 and R2” [0039]) connecting an inner end (inner end of US Fig. 1-A inserted above) of the upper surface (US Fig. 1-A inserted above) of the retainer ring (21/22 Figs. 2A and 2B) and an inner end (IS2 Fig. 1-A inserted above) of the lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) of the retainer ring (21/22 Figs. 2A and 2B); and an outer side surface (OS1 Fig. 1-A inserted above) connecting an outer end (outer end of US Fig. 1-A inserted above) of the upper surface (US Fig. 1-A inserted above) of the retainer ring (21/22 Figs. 2A and 2B) and an outer end (OS2 Fig. 1-A inserted above) of the lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) of the retainer ring (21/22 Figs. 2A and 2B), and wherein the at least one slurry passage comprises: an inlet (T2 Figs. 3A, 3B, 4A, and 4B) formed at an outer side surface (OS1 Fig. 1-A inserted above) of the retainer ring (21/22 Figs. 2A and 2B) to introduce the slurry; and an outlet (T1 Figs. 3A, 3B, 4A, and 4B) formed at a lower surface (lower surface of R1/R2 of 21/22 Figs. 2A and 2B) of the retainer ring to discharge the slurry. Referring to claim 20: ADACHI discloses the retainer ring module of claim 19, wherein at least one surface of the inner side surface and the outer side surface (OS1 Fig. 1-A inserted above) is a vertical plane (shown in Fig. 1-A inserted above). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to CHRISTOPHER SOTO whose telephone number is (571)272-8172. The examiner can normally be reached Monday-Friday, 8a.m. - 5 p.m.. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Monica Carter can be reached at 571-272-4475. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. CHRISTOPHER SOTO Examiner Art Unit 3723 /CHRISTOPHER SOTO/Examiner, Art Unit 3723 /MONICA S CARTER/Supervisory Patent Examiner, Art Unit 3723
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Prosecution Timeline

Feb 13, 2024
Application Filed
Mar 18, 2026
Non-Final Rejection — §102, §112 (current)

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Prosecution Projections

1-2
Expected OA Rounds
54%
Grant Probability
82%
With Interview (+28.9%)
2y 9m
Median Time to Grant
Low
PTA Risk
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