Prosecution Insights
Last updated: April 19, 2026
Application No. 18/461,167

LAUNDRY MACHINE AND CORRESPONDING CABINET CONFIGURATION

Non-Final OA §102
Filed
Sep 05, 2023
Examiner
TREMARCHE, CONNOR J.
Art Unit
3762
Tech Center
3700 — Mechanical Engineering & Manufacturing
Assignee
Whirlpool Corporation
OA Round
1 (Non-Final)
65%
Grant Probability
Favorable
1-2
OA Rounds
3y 0m
To Grant
93%
With Interview

Examiner Intelligence

Grants 65% — above average
65%
Career Allow Rate
407 granted / 623 resolved
-4.7% vs TC avg
Strong +27% interview lift
Without
With
+27.4%
Interview Lift
resolved cases with interview
Typical timeline
3y 0m
Avg Prosecution
61 currently pending
Career history
684
Total Applications
across all art units

Statute-Specific Performance

§101
0.5%
-39.5% vs TC avg
§103
61.4%
+21.4% vs TC avg
§102
15.5%
-24.5% vs TC avg
§112
21.4%
-18.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 623 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-20 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by CN 203683955 (Gai hereinafter). Regarding claim 1, Gai teaches a laundry machine that discloses a drum configured to (i) receive clothing articles (Figure 1 shows a washing machine with the drum being at 2 for holding clothing) and (ii) rotate at less than or equal to a maximum operating frequency (The washing machine of Gai is fully capable of this operating range); and a cabinet (i) housing the drum (Housing 1) and (ii) having exterior panels (Exterior panels 11 in Figures 1 and 3), wherein (a) at least one of the exterior panels includes an array of embossments (Figure 3, embossments 1111/1112/1121/1122/1123), (b) depths of the embossments vary between embossments within the array (Figure 4 shows the relative depths of the embossments), and (c) the depths of the embossments increase along the array in first and second opposing directions that extend away from a central region of the array such that a natural frequency of the at least one of the exterior panels is greater than the maximum operating frequency (Figure 4 per ¶ 38: h1 is 5.4 mm, h2 is 4.1 mm, h3 is 4.2 mm, h4 is 5.4 mm, h5 is 7.2 mm; ¶ 2 and 37 detail the increase in natural frequency). Regarding claim 2, Gai’s modified teachings are described above in claim 1 where Gai further discloses that the embossments are stacked in a vertically extending column (Figure 3 of Gai). Regarding claim 3, Gai’s modified teachings are described above in claim 2 where Gai further discloses that the depths of the embossments increase along the array in directions extending upward and downward from one or more centrally positioned embossments (¶ 38 with h1 is 5.4 mm, h2 is 4.1 mm, h3 is 4.2 mm, h4 is 5.4 mm, h5 is 7.2 mm). Regarding claim 4, Gai’s modified teachings are described above in claim 1 where Gai further discloses that each embossment extends inward from an exterior surface of the at least one of the exterior panels to a corresponding depth (Evident from Figure 4). Regarding claim 5, Gai’s modified teachings are described above in claim 4 where Gai further discloses that each embossment includes a chamfer extending from the exterior surface of the at least one of the exterior panels to the corresponding depth (Chamfered transition seen in Figure 4 from the plane of 11 to the depth of each embossment). Regarding claim 6, Gai’s modified teachings are described above in claim 4 where Gai further discloses that each chamfer extends about an outer periphery of a corresponding embossment (Evident from Figures 3 and 4). Regarding claim 7, Gai’s modified teachings are described above in claim 4 where Gai further discloses that the depth of each embossment is substantially constant within an entirety of an area that is internal relative to a corresponding chamfer (Evident from Figures 3 and 4). Regarding claim 8, Gai teaches a laundry machine (Figures 1-3) that discloses a rear panel (Rear panel between the two embossed side panels in Figure 3); and a side panel extending from the rear panel (Side panel[s] 11 in Figure 3), wherein (i) the side panel includes a plurality of embossments (Embossments 1111/1112/1121/1122/1123 in Figures 3 and 4), (ii) the embossments are aligned in an array (Figure 3), and (iii) depths of the embossments increase along the array in opposing directions that extend outward from a central region of the side panel (Figure 4 per ¶ 38: h1 is 5.4 mm, h2 is 4.1 mm, h3 is 4.2 mm, h4 is 5.4 mm, h5 is 7.2 mm). Regarding claim 9, Gai’s modified teachings are described above in claim 8 where Gai further discloses that each embossment extends inward from an exterior surface of the side panel to a corresponding depth (Evident from Figures 3 and 4). Regarding claim 10, Gai’s modified teachings are described above in claim 9 where Gai further discloses that each embossment includes a chamfer extending from the exterior surface of the side panel to the corresponding depth (Chamfered transition seen in Figure 4 from the plane of 11 to the depth of each embossment). Regarding claim 11, Gai’s modified teachings are described above in claim 9 where Gai further discloses that each chamfer extends about an outer periphery of a corresponding embossment (Evident form Figures 3 and 4). Regarding claim 12, Gai’s modified teachings are described above in claim 9 where Gai further discloses that the depth of each embossment is substantially constant within an area that is internal relative to a corresponding chamfer (Evident from Figures 3 and 4). Regarding claim 13, Gai’s modified teachings are described above in claim 9 where Gai further discloses that the depths of the embossments increase in directions extending upward and downward from one or more centrally positioned embossments (¶ 38 with Figure 4: h1 is 5.4 mm, h2 is 4.1 mm, h3 is 4.2 mm, h4 is 5.4 mm, h5 is 7.2 mm). Regarding claim 14, Gai teaches a laundry machine (Figures 1-4) that discloses at least one panel (Figure 3, Panel 11), wherein (i) the at least one panel includes a plurality of embossments (Embossments 1111/1112/1121/1122/1123 in Figures 3 and 4), (ii) depths of the embossments vary (Evident from Figure 4 and ¶ 38), and (iii) the depths of the embossments increase opposing directions that extend away from a central region of the at least one panel such that a natural frequency of the at least one of the panel is greater than an operational frequency of the laundry machine (Figure 4 per ¶ 38: h1 is 5.4 mm, h2 is 4.1 mm, h3 is 4.2 mm, h4 is 5.4 mm, h5 is 7.2 mm; ¶ 2 and 37 detail the increase in natural frequency). Regarding claim 15, Gai’s modified teachings are described above in claim 14 where Gai further discloses that each embossment extends inward from an exterior surface of the at least one panel to a corresponding depth (Evident from Figures 3 and 4). Regarding claim 16, Gai’s modified teachings are described above in claim 15 where Gai further discloses that each embossment includes a chamfer extending from the exterior surface of the at least one panel to the corresponding depth (Chamfered transition seen in Figure 4 from the plane of 11 to the depth of each embossment). Regarding claim 17, Gai’s modified teachings are described above in claim 16 where Gai further discloses that each chamfer extends about an outer periphery of a corresponding embossment (Evident from Figures 3 and 4). Regarding claim 18, Gai’s modified teachings are described above in claim 16 where Gai further discloses that the depth of each embossment is substantially constant within an area that is internal relative to a corresponding chamfer (Evident from Figures 3 and 4). Regarding claim 19, Gai’s modified teachings are described above in claim 14 where Gai further discloses that the embossments are stacked in a vertically extending column (Figure 3). Regarding claim 20, Gai’s modified teachings are described above in claim 19 where Gai further discloses that the depths of the embossments increase in directions extending upward and downward from one or more centrally positioned embossments (¶ 38 with Figure 4: h1 is 5.4 mm, h2 is 4.1 mm, h3 is 4.2 mm, h4 is 5.4 mm, h5 is 7.2 mm). Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. CN 203021793, US 20110227462, US 2011/0234073, CN 104420136, and CN 106436199 all detail side panel embossing for laundry machines. Any inquiry concerning this communication or earlier communications from the examiner should be directed to CONNOR J. TREMARCHE whose telephone number is (571)272-2175. The examiner can normally be reached Monday - Thursday 0700-1700 Eastern. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, MICHAEL HOANG can be reached at (571) 272-6460. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /CONNOR J TREMARCHE/Primary Examiner, Art Unit 3762
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Prosecution Timeline

Sep 05, 2023
Application Filed
Mar 03, 2026
Non-Final Rejection — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
65%
Grant Probability
93%
With Interview (+27.4%)
3y 0m
Median Time to Grant
Low
PTA Risk
Based on 623 resolved cases by this examiner. Grant probability derived from career allow rate.

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