Prosecution Insights
Last updated: April 19, 2026
Application No. 18/463,266

SEMICONDUCTOR STRUCTURES AND FABRICATION METHOD THEREOF, MEMORY DEVICE AND MEMORY SYSTEM

Non-Final OA §102
Filed
Sep 07, 2023
Examiner
BERNSTEIN, ALLISON
Art Unit
2824
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Yangtze Memory Technologies Co. Ltd.
OA Round
1 (Non-Final)
81%
Grant Probability
Favorable
1-2
OA Rounds
2y 4m
To Grant
84%
With Interview

Examiner Intelligence

Grants 81% — above average
81%
Career Allow Rate
719 granted / 889 resolved
+12.9% vs TC avg
Minimal +3% lift
Without
With
+3.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 4m
Avg Prosecution
15 currently pending
Career history
904
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
38.0%
-2.0% vs TC avg
§102
35.8%
-4.2% vs TC avg
§112
15.7%
-24.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 889 resolved cases

Office Action

§102
DETAILED ACTION The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claims 1-14 are pending in the application. Priority Receipt is acknowledged of certified copies of papers required by 37 CFR 1.55. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim(s) 1, 8-11 and 14 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Nam et al. (US 2020/0411106) (hereinafter, “Nam”). Re: independent claim 1, Nam discloses in fig. 28 a fabrication method of a semiconductor structure, wherein the semiconductor structure includes at least one deck structure, and a fabrication method of the deck structure comprises: providing a first stack structure (PERI), wherein a peripheral circuit (2394) is disposed in the first stack structure; forming a first contact (2271a, 2272a) and a second contact (2271b, 2272b) that at least penetrate through the first stack structure, wherein the second contact (2271b, 2272b) is connected with the peripheral circuit (2394), and the first contact (2271a, 2272a) is located on a side of the second contact (2271b, 2272b) far away from the peripheral circuit (2394); providing a second stack structure (CELL), wherein a memory cell array (including 2330) is disposed in the second stack structure; forming a third contact (2371a, 2372a) and a fourth contact (2371b, 2372b) that penetrate through the second stack structure, wherein the fourth contact (2371b, 2372b) is connected with the memory cell array, and the third contact (2371a, 2372a) is located on a side of the fourth contact (2371b, 2372b) far away from the memory cell array; and stacking and bonding the first stack structure and the second stack structure along a first direction to form the deck structure [0134], wherein the first contact (2271a, 2272a) is connected with the third contact (2371a, 2372a) by bonding to form a first interconnection structure, and the second contact (2271b, 2272b) is connected with the fourth contact (2371b, 2372b) by bonding to form a second interconnection structure. Re: independent claim 8, Nam discloses in fig. 28 a semiconductor structure including a deck structure, the deck structure comprising: a first stack structure (PERI) and a second stack structure (CELL) that are disposed in a stack along a first direction, wherein a peripheral circuit (2394) is disposed in the first stack structure, and a memory cell array (including 2330) is disposed in the second stack structure; a first contact (2271a, 2272a) and a second contact (2271b, 2272b) that at least penetrate through the first stack structure (PERI), wherein the second contact (2271b, 2272b) is connected with the peripheral circuit (2394), and the first contact (2271a, 2272a) is located on a side of the second contact (2271b, 2272b) far away from the peripheral circuit; and a third contact (2371a, 2372a) and a fourth contact (2371b, 2372b) that penetrate through the second stack structure (CELL), wherein the fourth contact (2371b, 2372b) is connected with the memory cell array (including 2330), and the third contact (2371a, 2372a) is located on a side of the fourth contact far (2371b, 2372b) away from the memory cell array, wherein the first contact (2271a, 2272a) is connected with the third contact (2372a, 2371a) by bonding to constitute a first interconnection structure [0134], and the second contact (2271b, 2272b) is connected with the fourth contact (2372b, 2371b) by bonding to constitute a second interconnection structure [0134]. Re: claim 9, Nam discloses in fig. 28 the semiconductor structure of claim 8, wherein a composition material of the first contact is the same as a composition material of the second contact ([0134] discloses Cu-Cu bonding). Re: claim 10, Nam discloses in fig. 28 the semiconductor structure of claim 8, wherein a composition material of the first contact is different from a composition material of the second contact ([0134] discloses bonding metals may be copper, aluminum or tungsten). Re: claim 11, Nam discloses in fig. 28 the semiconductor structure of claim 10, wherein the composition material of the first contact (2271a, 2272a) includes copper, and the composition material of the second contact (2271b, 2272b) includes tungsten [0139]. Re: independent claim 14, Nam discloses in fig. 28 a memory system, comprising: a memory device comprising: a semiconductor structure comprising: at least one deck structure comprising: a first stack structure (PERI) and a second stack structure (CELL) that are disposed in a stack along a first direction, wherein a peripheral circuit (2394) is disposed in the first stack structure, and a memory cell array (including 2330) is disposed in the second stack structure; a first contact (2271a, 2271b) and a second contact (2271b, 2272b) that at least penetrate through the first stack structure, wherein the second contact (2271b, 2272b) is connected with the peripheral circuit (2394), and the first contact (2271a, 2272a) is located on a side of the second contact (2271b, 2272b) far away from the peripheral circuit; and a third contact (2372a, 2371a) and a fourth contact (2372b, 2371b) that penetrate through the second stack structure, wherein the fourth contact (2372b, 2371b) is connected with the memory cell array, and the third contact (2372a, 2372b) is located on a side of the fourth contact (2372b, 2371b) far away from the memory cell array, wherein the first contact (2271a, 2272a) is connected with the third contact (2372a, 2371a) by bonding to constitute a first interconnection structure [0134], and the second contact (2271a, 2272b) is connected with the fourth contact (2372b, 2371b) by bonding to constitute a second interconnection structure [0134]; and a memory controller (600 in fig. 26) connected with the memory device and configured to control the memory device. Allowable Subject Matter Claims 2-7 and 12-13 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Ogawa et al. US 11,322,483 teach a memory device containing multiple tiers. Zhang et al. US 12,477,749 teach a three dimensional memory device containing multiple memory array assemblies and multiple periphery structures. The examiner has cited particular columns and line numbers in the references as applied to the claims above for the convenience of the applicant. Although the specified citations are representative of the teachings of the art and are applied to the specific limitations within the individual claim, other passages and figures may apply as well. It is respectfully requested from the applicant in preparing responses, to fully consider the references in entirety as potentially teaching all or part of the claimed invention, as well as the context of the passage as taught by the prior art or disclosed by the Examiner. When responding to this office action, applicants are advised to provide the examiner with the line numbers and page numbers in the application and/or references cited to assist the examiner in locating appropriate paragraphs. Any inquiry concerning this communication or earlier communications from the examiner should be directed to ALLISON BERNSTEIN whose telephone number is (571)272-9011. The examiner can normally be reached M-F 8AM-5PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Richard Elms can be reached on 571-272-1869. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ALLISON BERNSTEIN/Primary Examiner, Art Unit 2824 01/21/2026
Read full office action

Prosecution Timeline

Sep 07, 2023
Application Filed
Jan 21, 2026
Non-Final Rejection — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
81%
Grant Probability
84%
With Interview (+3.2%)
2y 4m
Median Time to Grant
Low
PTA Risk
Based on 889 resolved cases by this examiner. Grant probability derived from career allow rate.

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