Prosecution Insights
Last updated: October 27, 2026
Application No. 18/463,545

VIBRATING BEAM ACCELEROMETER

Final Rejection §112
Filed
Sep 08, 2023
Priority
Jun 01, 2023 — provisional 63/505,540
Examiner
TRINH, MINH N
Art Unit
2837
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Honeywell International Inc.
OA Round
2 (Final)
86%
Grant Probability
Favorable
3-4
OA Rounds
0m
Est. Remaining
95%
With Interview

Examiner Intelligence

Grants 86% — above average
86%
Career Allowance Rate
1317 granted / 1540 resolved
+17.5% vs TC avg
Moderate +10% lift
Without
With
+9.6%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
59 currently pending
Career history
1594
Total Applications
across all art units

Statute-Specific Performance

§101
0.5%
-39.5% vs TC avg
§103
36.4%
-3.6% vs TC avg
§102
15.6%
-24.4% vs TC avg
§112
38.8%
-1.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1540 resolved cases

Office Action

§112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Response to Amendment That the amendment to the claim languages filed on 8/14/26 has been fully considered and made of record. Claims 1- 20 are now pending in that claims 1-5, 7-9, 15-20 are unelected. Claim Objections Claims 6, 10-14 are objected to because of the following informalities: many terms or phrases is /are unclear and confusing the following are examples: “selective laser etching a feature into a resonator beam adjacent to a vertical surface of the a first resonator beam of the resonator, wherein the resonator beam comprises a piezoelectric material, wherein the resonator comprises: the first resonator beam and a second resonator beam extending from a first pad to a second pad, the first resonator beam being parallel to the second resonator beam and separated from the second resonator beam by a first width, and wherein the vertical surface comprises an inner sidewall of the first resonator beam facing the second resonator beam;” (claim 6, lines 3-8) is awkwardly worded and confusing and should be updated as following: --forming a first resonator beam and a second resonator beam for the resonator, wherein the first resonator beam and the second resonator beam comprise a piezoelectric material and a first pad and a second pad at each ends; selective laser etching a feature into a vertical surface of the first resonator beam of the resonator extending the first resonator beam and the second resonator beam from the first pad to the second pad, wherein the first resonator beam being parallel to the second resonator beam and separated from the second resonator beam by a first width, and the vertical surface of the first resonator beam includes an inner sidewall facing the second resonator beam;”-- , for clarity of the method inventive claim formats. “depositing a conductive material onto the surface of the resonator beam adjacent to the feature, wherein a first electrode and a second electrode comprises the conductive material;”(claim 6, lines 8-9) is unclear and confusing in that it is not known whether “the resonator beam” is directed to the “first resonator beam” or “the second resonator beam”? please be more specific. “forming, via the feature, a gap within the conductive material on the surface of the resonator beam by inhibiting deposition of the conductive material on a surface area of the vertical surface corresponding to the gap, wherein the gap electrically isolates the first electrode from the second electrode” (claim 6, lines 10-13) is unclear and confusing in that it is not known what being referring to as “forming, via the feature,” appear to be: -- “wherein in the etching the feature further comprises forming the features includes a gap within the conductive material on the surface of the resonator beam by inhibiting deposition of the conductive material on a surface area of the vertical surface corresponding to the gap, wherein the gap electrically isolates the first electrode from the second electrode “--, for clarity of the claims. “wherein the feature comprises a recess” (claim 10, line 1) is in structure forms and should be updated to: --” wherein the selective etching further comprises forming a recess” --. Claims 11-14 are suggested to update to reflect the same formats as suggested in the above claims. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 6, 10-14 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. “the resonator beam” (claim 6, line 3) lacks proper antecedent basis. “wherein the resonator comprises” (claim 6, line 4) is product limitation which made claim 6 unclear. “the vertical surface” (claim 6, lines 6-7) is unclear and confusing in that it is uncertain whether this directed to the vertical surface of the first resonator beam in line 2-3 of claim 6? “the surface of the resonator beam” (clam 6, line 9) lacks proper antecedent basis. “wherein a first electrode and a second electrode comprises the conductive material;” (claim 6, lines 10) should be more specific as to how “a first and a second are formed” by the conductive material. “the resonator beam” (claim 6, lines 11-12) lacks proper antecedent basis. ““the vertical surface” (claim 6, lines 12-13) lack proper antecedent basis. “the surface of the resonator beam into the resonator beam” (claim 10, line 2) lacks proper antecedent basis. “wherein the recess comprises a first recess length in a first lateral direction and a first recess” (claim 11, lines 1-2) not positive method limitation appears to be product limitation and should be updated to:-- wherein the forming of the recess further comprises forming a first recess length in a first lateral direction and a first recess”--. “the recess forms” (claim 12, line 1); “the resonator beam” (claim 12, line 1-2) lack proper antecedent basis. “the recess forms” (claim 12, line 1) should be updated to reflect changes as in above claim 11. “that is selective laser etched and removed to form the gap” (claim 13, lines 4-5) should be:-- in the selective laser etching to form the gap”-- “the surface of the resonator beam” (claim 14, line 2) lacks proper antecedent basis for this. Response to Arguments Applicant’s arguments with respect to pending rejected claim(s) have been considered but are moot because the new formulated rejection (see above). Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to MINH N TRINH whose telephone number is (571)272-4569. The examiner can normally be reached M-TH ~5:00-3:30. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Thomas J Hong can be reached at 571-272-0993. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /MINH N TRINH/Primary Examiner, Art Unit 3729 mt
Read full office action

Prosecution Timeline

Sep 08, 2023
Application Filed
May 18, 2026
Non-Final Rejection mailed — §112
Aug 14, 2026
Response Filed
Sep 29, 2026
Final Rejection mailed — §112 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
86%
Grant Probability
95%
With Interview (+9.6%)
2y 9m (~0m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 1540 resolved cases by this examiner. Grant probability derived from career allowance rate.

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