Prosecution Insights
Last updated: October 01, 2026
Application No. 18/481,753

SILICON OXIDE-BASED NEGATIVE ELECTRODE ACTIVE MATERIAL FOR SECONDARY BATTERY, METHOD OF PRODUCING SILICON OXIDE-BASED NEGATIVE ELECTRODE ACTIVE MATERIAL, AND NEGATIVE ELECTRODE FOR SECONDARY BATTERY INCLUDING SILICON OXIDE-BASED NEGATIVE ELECTRODE ACTIVE MATERIAL

Non-Final OA §102§103
Filed
Oct 05, 2023
Priority
Oct 06, 2022 — RE 10-2022-0128147
Examiner
LI, AIQUN
Art Unit
1766
Tech Center
1700 — Chemical & Materials Engineering
Assignee
SK Inc.
OA Round
1 (Non-Final)
64%
Grant Probability
Moderate
1-2
OA Rounds
0m
Est. Remaining
87%
With Interview

Examiner Intelligence

Grants 64% of resolved cases
64%
Career Allowance Rate
539 granted / 845 resolved
-1.2% vs TC avg
Strong +23% interview lift
Without
With
+23.1%
Interview Lift
resolved cases with interview
Typical timeline
3y 0m
Avg Prosecution
50 currently pending
Career history
879
Total Applications
across all art units

Statute-Specific Performance

§101
0.8%
-39.2% vs TC avg
§103
51.4%
+11.4% vs TC avg
§102
24.0%
-16.0% vs TC avg
§112
17.7%
-22.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 845 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Group I, claims 1-10 and 18-20 in the reply filed on 8 September 2026 is acknowledged. Claims 11-17 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected invention, there being no allowable generic or linking claim. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-5, 7-10 and 18-20 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by CN111710845A1 (Deng), which is listed in Applicant’s information disclosure statement. Regarding claims 1-5 and 7-10, Deng teaches a negative electrode active material comprises silicon oxide and lithium silicate Li4SiO4 ([0006] and [0021]), which meets the claimed metal silicate, and a hydrophobic coating layer comprising lauric acid or stearic acid([0015]-[0018]), which meets the claimed hydrocarbon coating layer and fatty acid. Regarding the maximum absorbance peak Pa, Pb, the ratio of area value Sa/Sb, the area value Sa, Sb of FT-IR spectrum at the corresponding wave number of claims 1-5, Deng teaches the same silicon oxide of same metal silicate and the same coating layer of the same fatty acid, the claimed FT-IR characteristics, i.e., peak area, ratio, peak absorbance wave number effects and physical properties, would naturally arise and be achieved by Deng’s material. "Products of identical chemical composition can not have mutually exclusive properties." In re Spada, 911 F.2d 705, 709, 15 USPQ2d 1655, 1658 (Fed. Cir. 1990). See MPEP § 2112.01. Regarding claims 18 and 20, Deng teaches a lithium secondary battery comprises a negative electrode prepared from the active material comprising silicon oxide, lithium silicate and hydrocarbon coating ([0054] and [0105]). Regarding claim 19, Deng teaches the negative electrode further comprises graphite ([0107]). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claim 6 is rejected under 35 U.S.C. 103 as being unpatentable over Deng. The teachings of Deng are set forth above. While teaching the coating layer comprise stearic acid ([0018]), Deng does not teach the instantly claimed oleic acid, however, oleic acid has the same number of carbon atoms as that of stearic acid and is structurally sufficiently similar to oleic acid thus exhibiting similar hydrophobicity that one of ordinary skill in the art would have been motivated to utilize oleic acid in the hydrophobic coating layer of Deng. "An obviousness rejection based on similarity in chemical structure and function entails the motivation of one skilled in the art to make a claimed compound, in the expectation that compounds similar in structure will have similar properties." In re Payne, 606 F.2d 303, 313, 203 USPQ 245, 254 (CCPA 1979). See In re Papesch, 315 F.2d 381, 137 USPQ 43 (CCPA 1963). See MPEP2144.09 I and II. Consequently , the presence of Pc1 and Pc2 peaks derived from the carboxylic group of oleic acid. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to AIQUN LI whose telephone number is (571)270-7736. The examiner can normally be reached Monday-Friday 9:00 am -4:00 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Randy Gulakowski can be reached at 571-2721302. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /AIQUN LI/Ph.D., Primary Examiner, Art Unit 1766
Read full office action

Prosecution Timeline

Oct 05, 2023
Application Filed
Sep 15, 2026
Non-Final Rejection mailed — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
64%
Grant Probability
87%
With Interview (+23.1%)
3y 0m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 845 resolved cases by this examiner. Grant probability derived from career allowance rate.

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