Prosecution Insights
Last updated: April 19, 2026
Application No. 18/534,847

SEMICONDUCTOR PACKAGE AND METHOD FOR MANUFACTURING THE SAME

Non-Final OA §102§103
Filed
Dec 11, 2023
Examiner
SENGDARA, VONGSAVANH
Art Unit
2893
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Nepes Co. Ltd.
OA Round
1 (Non-Final)
71%
Grant Probability
Favorable
1-2
OA Rounds
3y 5m
To Grant
90%
With Interview

Examiner Intelligence

Grants 71% — above average
71%
Career Allow Rate
651 granted / 914 resolved
+3.2% vs TC avg
Strong +19% interview lift
Without
With
+19.1%
Interview Lift
resolved cases with interview
Typical timeline
3y 5m
Avg Prosecution
73 currently pending
Career history
987
Total Applications
across all art units

Statute-Specific Performance

§101
1.8%
-38.2% vs TC avg
§103
48.7%
+8.7% vs TC avg
§102
30.5%
-9.5% vs TC avg
§112
17.5%
-22.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 914 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-5 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Tsai et al. 20200058606. PNG media_image1.png 448 757 media_image1.png Greyscale Regarding claim 1, fig. 16 of Tsai discloses a semiconductor package, comprising: an antenna structure 400 which comprises a dielectric layer 100A that is made of a transparent material (par [0016] – glass), an active antenna pattern 408 (par [0068]) that is formed on one surface of the dielectric layer and a parasitic antenna pattern 410 (par [0068]) that is formed on the other surface of the dielectric layer opposite to the one surface; PNG media_image2.png 238 658 media_image2.png Greyscale a first rewiring structure (fig. 12 above - 409/118/402/116) which is electrically connected to the active antenna pattern of the antenna structure; a molding body 302 which is formed on one surface of the first rewiring structure; a semiconductor chip 220 which is placed within the molding body; a second rewiring structure 210 which is formed on one surface of the molding body; a vertical connection conductor 214 (fig. 14) which is laterally spaced from the semiconductor chip, penetrates the molding layer, and electrically connects the second rewiring structure and the first rewiring structure; and an external connection terminal 306 which is formed on one surface of the second rewiring structure. Regarding claim 2, Tsai discloses wherein the dielectric layer of the antenna structure is made of a glass material (par [0016] – glass). Regarding claim 3, fig. 16 of Tsai disclose wherein the dielectric layer of the antenna structure is a carrier on which the first rewiring structure, the molding body and the second rewiring structure are formed. Regarding claim 4, Tsai discloses wherein the thickness of the dielectric layer is between 100 micrometers and 500 micrometers (par [0016] …The core substrate 101 may have a thickness between about 200 μm and about 1000 μm, such as about 400 μm or about 900 μm). Regarding claim 5, fig. 16 of Tsai discloses further comprising: a protective layer 116 for covering and protecting the other surface of the dielectric layer and the parasitic antenna pattern (see 116 surround 410 and acts as protecting walls). Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 6-8 are rejected under 35 U.S.C. 103 as being unpatentable over Tsai in view of Kim et al. 20200211976. Regarding claim 6, Tsai discloses a method for manufacturing a semiconductor package, comprising: an active antenna pattern formation step of forming an active antenna pattern on one surface of a carrier that is made of a transparent glass material (figs. 1-3); a first rewiring step of forming a first rewiring structure on the surface of the carrier on which the antenna pattern is formed (figs. 4-5); a chip placement step of placing a semiconductor chip on the first rewiring structure (fig. 10A); a molding step of forming a molding body 302 by molding a molding agent on the first rewiring structure on which the semiconductor chip is disposed (fig. 10A); a second rewiring step of forming a second rewiring structure on one surface of the molding body (fig. 10A); and Tsai does not disclose of an individualization step of individualizing the first rewiring structure, molding body, semiconductor chip and second rewiring structure by cutting the same together with the carrier that is made of the glass material. However, fig. 2E discloses a method of forming a semiconductor package comprising an individualization step of individualizing a semiconductor package in order to form individual package. In view of such teaching, it would have been obvious to form a method further comprising an individualization step of individualizing the first rewiring structure, molding body, semiconductor chip and second rewiring structure by cutting the same together with the carrier that is made of the glass material such as taught by Kim in order to form many package at once and then separate them into individual. Regarding claim 7, par [0020] of Tsai discloses wherein after the active antenna pattern formation step, a parasitic antenna pattern formation step is performed by inverting the carrier to form a parasitic antenna pattern on the other surface opposite to the one surface of the carrier (par [0020] -A similar process may then be performed on the opposite side of the core substrate 101 to form conductive features (or remaining portions of through-vias) on the opposite side of the core substrate 101. In this manner, the conductive material may form conductive features and through-vias). Regarding claim 8, par [0020] of Tsai discloses wherein before the active antenna pattern formation step, a parasitic antenna pattern formation step is performed by inverting the carrier to form a parasitic antenna pattern on the other surface opposite to the one surface of the carrier (par [0020] -A similar process may then be performed on the opposite side of the core substrate 101 to form conductive features (or remaining portions of through-vias) on the opposite side of the core substrate 101. In this manner, the conductive material may form conductive features and through-vias). Allowable Subject Matter Claim 9 is allowed. Claim 9 recites “an inversion step of inverting the carrier and the first rewiring structure, molding body, semiconductor chip and second rewiring structure that are built up on the carrier; a parasitic antenna pattern formation step of forming a parasitic antenna pattern on the other surface of the inverted carrier by aligning the same with the active antenna pattern”, this limitation is not taught by prior of record. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to VONGSAVANH SENGDARA whose telephone number is (571)270-5770. The examiner can normally be reached 9AM-6PM EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, PURVIS A. Sue can be reached on (571)272-1236. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /VONGSAVANH SENGDARA/ Primary Examiner, Art Unit 2893
Read full office action

Prosecution Timeline

Dec 11, 2023
Application Filed
Jan 26, 2026
Non-Final Rejection — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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DISPLAY SUBSTRATE AND DISPLAY DEVICE
2y 5m to grant Granted Apr 14, 2026
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2y 5m to grant Granted Apr 07, 2026
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Gate-All-Around Device with Protective Dielectric Layer and Method of Forming the Same
2y 5m to grant Granted Apr 07, 2026
Patent 12588424
NONVOLATILE MEMORY ELEMENT AND METHOD FOR MANUFACTURING THE SAME
2y 5m to grant Granted Mar 24, 2026
Patent 12581835
DISPLAY PANEL
2y 5m to grant Granted Mar 17, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
71%
Grant Probability
90%
With Interview (+19.1%)
3y 5m
Median Time to Grant
Low
PTA Risk
Based on 914 resolved cases by this examiner. Grant probability derived from career allow rate.

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