Prosecution Insights
Last updated: August 06, 2026
Application No. 18/566,607

MICROFLUIDIC DEVICES WITH PARTIALLY ENCLOSED MICROFLUIDIC CHANNELS AND METHODS FOR FORMING PERFUSABLE VASCULAR NETWORKS

Non-Final OA §102
Filed
Dec 01, 2023
Priority
Jun 01, 2021 — CIP of PCTUS2135277 +2 more
Examiner
HURST, JONATHAN M
Art Unit
Tech Center
Assignee
Qureator Inc.
OA Round
1 (Non-Final)
53%
Grant Probability
Moderate
1-2
OA Rounds
1y 4m
Est. Remaining
72%
With Interview

Examiner Intelligence

Grants 53% of resolved cases
53%
Career Allowance Rate
362 granted / 679 resolved
-6.7% vs TC avg
Strong +18% interview lift
Without
With
+18.4%
Interview Lift
resolved cases with interview
Typical timeline
4y 0m
Avg Prosecution
40 currently pending
Career history
712
Total Applications
across all art units

Statute-Specific Performance

§101
1.4%
-38.6% vs TC avg
§103
54.9%
+14.9% vs TC avg
§102
18.2%
-21.8% vs TC avg
§112
18.3%
-21.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 679 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant's election with traverse of Group I in the reply filed on 7/3/2026 is acknowledged. The traversal is on the ground(s) that the amended claimed invention makes a contribution over the art and thus has a special technical feature that defines a contribution over the art. This is not found persuasive because the claim rejections below demonstrate that the special technical features shared between groups do not make a contribution over the art. The requirement is still deemed proper and is therefore made FINAL. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1, 3, and 5-17 are rejected under 35 U.S.C. 102(a(1) as being anticipated by Jeon et al. (US 2020/0156062 From IDS). Regarding claim 1 Jeon discloses a device, comprising:a substrate having a top surface and a bottom surface opposite to the top surface; a first microfluidic channel defined on the substrate; a second microfluidic channel, distinct from the first microfluidic channel, defined on the substrate and in contact with, and substantially parallel to, the first microfluidic channel; (See Jeon Abstract and Figs. 1-2 wherein a substrate 31/320 has opposite top and bottom surfaces and a first microfluidic channel 222 and second microfluidic channel are provided on the substrate in parallel relation.) a first beam having a bottom surface and side surfaces, the first beam being spaced apart from the top surface of the substrate to define at least the first microfluidic channel; a second beam defining the second microfluidic channel, wherein the second beam has a side surface that defines at least a portion of a side wall of a reservoir. (See Jeon Figs. 1-2 wherein first beam above channel 222 and second beam above channel 221a are spaced apart from the substrate to define the respective channels. The second beam has a side portion defining a side wall of a reservoir 510.) Regarding claim 3 Jeon discloses all the claim limitations as set forth above as well as the device wherein the first beam defines a through-hole extending between the top surface and the bottom surface of the first beam for receiving a first solution.(See Jeon Fig. 1 wherein the first beam forming channel 220 has through holes 231 extending therethrough for receiving a first solution.) Regarding claim 5 Jeon discloses all the claim limitations as set forth above as well as the device wherein the second beam has a top surface and a bottom surface opposite to the top surface, at least a portion of the second beam being spaced apart from the substrate to define the second microfluidic channel between the bottom surface of the second beam and the top surface of the substrate; and the second beam is adjacent to the first beam. (See Jeon Figs. 1-2 wherein the second beam has top and bottom surfaces and wherein it is spaced from the substrate to form channel 221a between the substrate and bottom surface. The second beam is adjacent to the first.) Regarding claim 6 Jeon discloses all the claim limitations as set forth above as well as the device wherein the second beam has a side surface, the second beam being spaced apart from the first beam to define the second microfluidic channel between a first side surface of the first beam and the side surface of the second beam. (See Jeon wherein the second beam is spaced from the first beam to define second microfluidic channel 221a and has a side surface adjacent reservoir 510 and a first side surface of the first beam to define the width of the beam.) Regarding claim 7 Jeon discloses all the claim limitations as set forth above as well as the device wherein the second beam is in contact with the substrate. (See Jeon Figs. 1-2 wherein the second beam is in fluidic contact with the substrate.) Regarding claim 8 Jeon discloses all the claim limitations as set forth above as well as the device wherein the second beam is included in a first side structure with a through-hole for receiving a second solution. (See Jeon Fig. 1 wherein the third beam is included in a side structure with a through hole 510 for receiving a second solution.) Regarding claim 9 Jeon discloses all the claim limitations as set forth above as well as the device wherein the first beam and the second beam are integrally formed. (See Jeon Fig. 1 wherein the first beam forming channel 222 and second beam forming channel 221a are an integral element.) Regarding claim 10 Jeon discloses all the claim limitations as set forth above as well as the device further comprising:a third microfluidic channel in contact with and substantially parallel to the first microfluidic channel. (See Jeon Fig. 1 wherien a third microfluidc channel 221b is in contact and parallel to first channel 222.) Regarding claim 11 Jeon discloses all the claim limitations as set forth above as well as the device including:a third beam defining the third microfluidic channel. (See Jeon wherein a third beam defines a top surface of the third microfluidic channel 221b.) Regarding claim 12 Jeon discloses all the claim limitations as set forth above as well as the device wherein the third beam has a top surface and a bottom surface opposite to the top surface, at least a portion of the third beam being spaced apart from the substrate to define the third microfluidic channel between the bottom surface of the third beam and the top surface of the substrate; and the third beam is adjacent to the first beam. (See Jeon Figs. 1-2 wherein the third beam has top and bottom surfaces and wherein it is spaced from the substrate to form channel 221b between the substrate and bottom surface. The third beam is adjacent to the first) Regarding claim 13 Jeon discloses all the claim limitations as set forth above as well as the device wherein the third beam has a side surface, the third beam being spaced apart from the first beam to define the third microfluidic channel between a second side surface of the first beam and the side surface of the third beam. (See Jeon Figs. 1-2 wherein the third beam is spaced apart from the first beam and defines the third microfluidic channel between third beam side surface adjacent reservoir 520 and first beam second side surface.) Regarding claim 14 Jeon discloses all the claim limitations as set forth above as well as the device wherein the third beam is in contact with the substrate. (See Jeon Figs. 1-2 wherein the third beam is in fluidic contact with the substrate.) Regarding claim 15 Jeon discloses all the claim limitations as set forth above as well as the device wherein the third beam is included in a second side structure with a through-hole for receiving a third solution. (See Jeon Fig. 1 wherein the third beam is included in a second side structure with a through hole 520 for receiving a third solution.) Regarding claim 16 Jeon discloses all the claim limitations as set forth above as well as the device wherein the first beam and the third beam are integrally formed. (See Jeon Fig. 1 wherein the first beam forming channel 222 and third beam forming channel 221b are an integral element.) Regarding claim 17 Jeon discloses all the claim limitations as set forth above as well as the device wherein the substrate is made of a first material and the first beam is made of a second material, the first material and the second material having surface tensions satisfying a predefined capillary force criterion. (See Jeon [00222]-[0223] wherein the substrate is made of glass and the beams are made of plastic and the devices may be hydrophobic, i.e. they have surface tensions satisfying predefined capillary force requirements.) Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to JONATHAN M HURST whose telephone number is (571)270-7065. The examiner can normally be reached on M-F 7AM-4PM. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Michael Marcheschi can be reached on 571-272-1374. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /JONATHAN M HURST/ Primary Examiner, Art Unit 1799
Read full office action

Prosecution Timeline

Dec 01, 2023
Application Filed
Jul 28, 2026
Non-Final Rejection mailed — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
53%
Grant Probability
72%
With Interview (+18.4%)
4y 0m (~1y 4m remaining)
Median Time to Grant
Low
PTA Risk
Based on 679 resolved cases by this examiner. Grant probability derived from career allowance rate.

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