Prosecution Insights
Last updated: April 19, 2026
Application No. 18/590,563

MODULATION OF SENSOR FILM COMPOSITION FOR ENHANCED GAS DETECTION PERFORMANCE

Non-Final OA §102
Filed
Feb 28, 2024
Examiner
DUNLAP, JONATHAN M
Art Unit
2855
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Honda Motor Co. Ltd.
OA Round
1 (Non-Final)
76%
Grant Probability
Favorable
1-2
OA Rounds
2y 5m
To Grant
93%
With Interview

Examiner Intelligence

Grants 76% — above average
76%
Career Allow Rate
673 granted / 886 resolved
+8.0% vs TC avg
Strong +17% interview lift
Without
With
+16.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
29 currently pending
Career history
915
Total Applications
across all art units

Statute-Specific Performance

§101
4.1%
-35.9% vs TC avg
§103
42.9%
+2.9% vs TC avg
§102
27.2%
-12.8% vs TC avg
§112
20.7%
-19.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 886 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-4, 9-14 and 19 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Wang et al. (NPL – Enhanced Sensitivity of Electrochemical Sensors for Ammonia-Nitrogen via In-Situ PtNi Nanoleaves on Carbon Cloth). Considering claim 1, Wang discloses a chemoresistive film comprising a plurality of metal nanostructures (PtNi alloy nanoleaves, Abstract), the plurality of metal nanostructures having a selective affinity to at least one volatile gas species (ammonia), wherein the chemoresistive film exhibits a change in electrical resistance when the at least one volatile gas species is present in an environment of the chemoresistive film at a first concentration (Pages 9-10, 3.3 Determination of Ammonia, change in current with change in concentration), wherein the first concentration is no more than about 1000 ppm (Table 2; Detection Range = .5-500 μM ~ 9.02ppb-9.02ppm for NH4). Considering claim 2, Wang discloses that the plurality of metal nanostructures comprise one or more of platinum, nickel, copper, palladium, silver, and gold (Abstract, Platinum and Nickel). Considering claim 3, Wang discloses that the at least one volatile gas species comprises acetone, isoprene, methanol, nitric oxide, ammonia, ethanol, formaldehyde, carbon dioxide, carbon monoxide, hydrogen, methane, propane, or a combination thereof (Abstract, Ammonia). Considering claim 4, Wang discloses that the plurality of metal nanostructures comprise platinum and nickel, and wherein the at least one volatile gas species comprises formaldehyde, ammonia, or a combination thereof (Abstract, PtNi alloy nanoleaves used to detect ammonia). Considering claim 9, Wang discloses that the first concentration is no more than about 500 ppm (Table 2; Detection Range = .5-500 μM ~ 9.02ppb-9.02ppm, for NH4). Considering claim 10, Wang discloses that the first concentration is no more than about 20 ppb (Table 2; Detection Range = .5-500 μM ~ 9.02ppb-9.02ppm, for NH4). Considering claim 11, Wang discloses a sensor comprising: - one or more chemoresistive films comprising a first chemoresistive film connected to a first lead and a second lead sufficient to complete a circuit, wherein the sensor is configured to measure electrical resistance across the chemoresistive film (Page 3, 3-electrode DPV technique, 2.2 Apparatus and Equipment requires two leads and the film), wherein the first chemoresistive film comprises a plurality of metal nanostructures (PtNi alloy nanoleaves, Abstract), the plurality of metal nanostructures having a selective affinity to at least one volatile gas species (ammonia), wherein the chemoresistive film exhibits a change in electrical resistance when the at least one volatile gas species is present in an environment of the chemoresistive film at a first concentration (Pages 9-10, 3.3 Determination of Ammonia, change in current with change in concentration). Considering claim 12, Wang discloses that the plurality of metal nanostructures comprise one or more of platinum, nickel, copper, palladium, silver, and gold (Abstract, Platinum and Nickel). Considering claim 13, Wang discloses that the at least one volatile gas species comprises acetone, isoprene, methanol, nitric oxide, ammonia, ethanol, formaldehyde, carbon dioxide, carbon monoxide, hydrogen, methane, propane, or a combination thereof (Abstract, Ammonia). Considering claim 14, Wang discloses that the plurality of metal nanostructures comprise platinum and nickel, and wherein the at least one volatile gas species comprises formaldehyde, ammonia, or a combination thereof (Abstract, PtNi alloy nanoleaves used to detect ammonia). Considering claim 19, Wang discloses that the first concentration is no more than about 1000 ppm (Table 2; Detection Range = .5-500 μM ~ 9.02ppb-9.02ppm for NH4). Claims 1-3, 5-7, 9-13, 15-17 and 19 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Motayed et al. (US 2017/0038326 A1). Considering claim 1, Motayed discloses a chemoresistive film comprising a plurality of metal nanostructures ([0015]; [0018], Claim 1), the plurality of metal nanostructures having a selective affinity to at least one volatile gas species ([0019], Claim 11), wherein the chemoresistive film exhibits a change in electrical resistance when the at least one volatile gas species ([0019], Claim 2) is present in an environment of the chemoresistive film at a first concentration ([0016]), wherein the first concentration is no more than about 1000 ppm ([0020]; Claim 23). Considering claim 2, Motayed discloses that the plurality of metal nanostructures comprise one or more of platinum, nickel, copper, palladium, silver, and gold ([0018]; Claim 7). Considering claim 3, Motayed discloses that the at least one volatile gas species comprises acetone, isoprene, methanol, nitric oxide, ammonia, ethanol, formaldehyde, carbon dioxide, carbon monoxide, hydrogen, methane, propane, or a combination thereof ([0019]; Claim 11, Claim 15). Considering claim 5, Motayed discloses that the plurality of metal nanostructures comprise platinum and palladium ([0018], combination or mixture thereof), and wherein the at least one volatile gas species comprises nitric oxide ([0246], NOx, Claim 11). Considering claim 6, Motayed discloses that the plurality of metal nanostructures comprise platinum and copper ([0018], combination or mixture thereof), and wherein the at least one volatile gas species comprises isoprene, nitric oxide, methanol, or a combination thereof ([0019], methanol, Claim 15, [0246], NOx, Claim 11). Considering claim 7, Motayed discloses that the plurality of metal nanostructures comprise platinum and silver ([0018], combination or mixture thereof), and wherein the at least one volatile gas species comprises acetone ([0019], acetone, Claim 15). Considering claim 9, Motayed discloses that the first concentration is no more than about 500 ppm ([0020]; Claim 23). Considering claim 10, Wang discloses that the first concentration is no more than about 20 ppb ([0020]; Claim 23). Considering claim 11, Motayed discloses a sensor comprising: - one or more chemoresistive films comprising a first chemoresistive film connected to a first lead and a second lead sufficient to complete a circuit (Figure 9; sense current in and out; Figure 13, [0146]), wherein the sensor is configured to measure electrical resistance across the chemoresistive film ([0016]; [0023]), wherein the first chemoresistive film comprises a plurality of metal nanostructures ([0015]; [0018], Claim 1), the plurality of metal nanostructures having a selective affinity to at least one volatile gas species ([0019], Claim 11), wherein the chemoresistive film exhibits a change in electrical resistance when the at least one volatile gas species ([0019], Claim 2) is present in an environment of the chemoresistive film at a first concentration ([0016]). Considering claim 12, Motayed discloses that the plurality of metal nanostructures comprise one or more of platinum, nickel, copper, palladium, silver, and gold ([0018]; Claim 7). Considering claim 13, Motayed discloses that the at least one volatile gas species comprises acetone, isoprene, methanol, nitric oxide, ammonia, ethanol, formaldehyde, carbon dioxide, carbon monoxide, hydrogen, methane, propane, or a combination thereof ([0019]; Claim 11, Claim 15). Considering claim 15, Motayed discloses that the plurality of metal nanostructures comprise platinum and palladium ([0018], combination or mixture thereof), and wherein the at least one volatile gas species comprises nitric oxide ([0246], NOx, Claim 11). Considering claim 16, Motayed discloses that the plurality of metal nanostructures comprise platinum and copper ([0018], combination or mixture thereof), and wherein the at least one volatile gas species comprises isoprene, nitric oxide, methanol, or a combination thereof ([0019], methanol, Claim 15, [0246], NOx, Claim 11). Considering claim 17, Motayed discloses that the plurality of metal nanostructures comprise platinum and silver ([0018], combination or mixture thereof), and wherein the at least one volatile gas species comprises acetone ([0019], acetone, Claim 15). Considering claim 19, Motayed discloses that the first concentration is no more than about 1000 ppm ([0020]; Claim 23). Claim 20 is rejected under 35 U.S.C. 102(a)(1) as being anticipated by Zhong et al. (US 2012/0156099 A1). Considering claim 20, Zhong discloses a method of making a chemoresistive film comprising: providing a solution comprising a plurality of metal nanostructures ([0148]) and a solvent ([0149]; [0151]); applying the solution onto a support ([0152-153]); and drying the solvent ([0152-153]). The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-3, 8-13 and 18-19 are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Kapilov et al. (US 2024/0272108 A1). Considering claim 1, Kapilov discloses a chemoresistive film comprising a plurality of metal nanostructures ([0003]; [0047]), the plurality of metal nanostructures having a selective affinity to at least one volatile gas species ([0029]; [0042]), wherein the chemoresistive film exhibits a change in electrical resistance when the at least one volatile gas species is present in an environment of the chemoresistive film at a first concentration ([0003]), wherein the first concentration is no more than about 1000 ppm ([0027]). Considering claim 2, Kapilov discloses that the plurality of metal nanostructures comprise one or more of platinum, nickel, copper, palladium, silver, and gold ([0047]). Considering claim 3, Kapilov discloses that the at least one volatile gas species comprises acetone, isoprene, methanol, nitric oxide, ammonia, ethanol, formaldehyde, carbon dioxide, carbon monoxide, hydrogen, methane, propane, or a combination thereof ([0095-97]). Considering claim 8, Kapilov discloses that the plurality of metal nanostructures comprise branched nanoparticles ([0003-4]; [0007]; [0071-75]). Considering claim 9, Kapilov discloses that the first concentration is no more than about 500 ppm ([0096]). Considering claim 10, Kapilov discloses that the first concentration is no more than about 20 ppb ([0096]). Considering claim 11, Kapilov discloses a sensor comprising: - one or more chemoresistive films comprising a first chemoresistive film connected to a first lead 120 and a second lead 110 sufficient to complete a circuit ([0043]), wherein the sensor is configured to measure electrical resistance across the chemoresistive film ([0043]), wherein the first chemoresistive film comprises a plurality of metal nanostructures ([0003]; [0047]), the plurality of metal nanostructures having a selective affinity to at least one volatile gas species ([0029]; [0042]), wherein the chemoresistive film exhibits a change in electrical resistance when the at least one volatile gas species is present in an environment of the chemoresistive film at a first concentration ([0003]). Considering claim 12, Kapilov discloses that the plurality of metal nanostructures comprise one or more of platinum, nickel, copper, palladium, silver, and gold ([0047]). Considering claim 13, Kapilov discloses that the at least one volatile gas species comprises acetone, isoprene, methanol, nitric oxide, ammonia, ethanol, formaldehyde, carbon dioxide, carbon monoxide, hydrogen, methane, propane, or a combination thereof ([0095-97]). Considering claim 18, Kapilov discloses that the plurality of metal nanostructures comprise branched nanoparticles ([0003-4]; [0007]; [0071-75]). Considering claim 19, Kapilov discloses that the first concentration is no more than about 1000 ppm ([0027]). Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Bai et al. (NPL - Enhanced gas sensing performance based on the PtCu octahedral alloy nanocrystals decorated SnO2 nanoclusters) discloses a gas sensor using Pt-Cu nanocrystals on semiconductor metal oxides to detect ketones, including acetone. Bai manufactures at least one sensor by dispersing the nanocrystals in a solvent, applying the solvent to a substrate and drying the substrate. Chen et al. (US 2022/0324882 A1) discloses a chemiresistive sensor having electrodes on a substrate, the substrate having thereon a chemiresistive film using nanoparticles of Gold, Silver, Copper, Platinum, Palladium, Nickel or combinations thereof, which have been functionalized or branched, to more selectively detect ammonia in the ppb-ppm range. The functionalized nanoparticles are suspended in a solvent, applied to a substrate and allowed to dry. The sensor has electrodes on opposing ends of the film that complete a circuit. Najar (US 2020/0096473 A1) discloses a semiconductor having Pt, Pd, Au, Cu, Ag, Pt—Pd or Pt—Ag nanoparticles attached to its surface, whereby NO gas is detected based on a change in resistance of the sensor. Beale et al. (US 2024/0399345 A1) discloses the use of Pt, PtCu, PtNi, Pd, PtPd and/or PdCu as NO, nitric oxide, catalysts in an NOx reduction apparatus. It is shown then, that these materials would be suitable for catalytic oxidation chemiresistors, whereby resistance is modified based on the level of oxidation in the presence of a target gas. Swager et al. (US 2021/0341405 A1) discloses chemiresistor that uses oxidation catalysts such as Pt, Cu, Ag, Au, Pd and combinations thereof, in nanoparticle form, on a semiconductor whereby electrical property changes are monitored to determine the presence of a targeted analyte. Snow et al. (WO 03/098202 A1) discloses a chemiresistor having metal core nanoparticle made of two or more of silver, gold, platinum and palladium, encapsulated by a ligand shell and supported on an insulating substrate, whereby electrodes monitor the resistance change to detect the presence of chemical species. Drmosh et al. (US 2023/0304954 A1) disclose a gas sensor having a chemiresistive layer of silver-platinum alloy for detecting the presence of ketones, specifically acetone. Any inquiry concerning this communication or earlier communications from the examiner should be directed to Jonathan M Dunlap whose telephone number is (571)270-1335. The examiner can normally be reached Mon-Fri 10AM - 7PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Peter Macchiarolo can be reached at 571-272-2375. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /JONATHAN M DUNLAP/Primary Examiner, Art Unit 2855 March 13, 2026
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Prosecution Timeline

Feb 28, 2024
Application Filed
Mar 13, 2026
Non-Final Rejection — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
76%
Grant Probability
93%
With Interview (+16.9%)
2y 5m
Median Time to Grant
Low
PTA Risk
Based on 886 resolved cases by this examiner. Grant probability derived from career allow rate.

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