Prosecution Insights
Last updated: October 01, 2026
Application No. 18/599,112

METASURFACE HAVING A STEPPED SUBSTRATE, METHODS OF DESIGNING AND PROCESSING THE SAME, AND OPTICAL LENS

Non-Final OA §102
Filed
Mar 07, 2024
Priority
Sep 30, 2021 — CN 202111166673.0 +2 more
Examiner
MARTINEZ, JOSEPH P
Art Unit
2872
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Shenzhen Metalenx Technology Co. Ltd.
OA Round
1 (Non-Final)
86%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
89%
With Interview

Examiner Intelligence

Grants 86% — above average
86%
Career Allowance Rate
769 granted / 895 resolved
+17.9% vs TC avg
Minimal +3% lift
Without
With
+3.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 3m
Avg Prosecution
17 currently pending
Career history
907
Total Applications
across all art units

Statute-Specific Performance

§101
2.7%
-37.3% vs TC avg
§103
42.9%
+2.9% vs TC avg
§102
44.0%
+4.0% vs TC avg
§112
4.9%
-35.1% vs TC avg
Black line = Tech Center average estimate • Based on career data from 895 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Information Disclosure Statement The information disclosure statement (IDS) submitted on 3-7-24 is in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner. Claim Objections Claim 2 is objected to under 37 CFR 1.75 as being a substantial duplicate of claim 3. When two claims in an application are duplicates or else are so close in content that they both cover the same thing, despite a slight difference in wording, it is proper after allowing one claim to object to the other as being a substantial duplicate of the allowed claim. See MPEP § 608.01(m). Election/Restrictions Claims 5-20 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected species, there being no allowable generic or linking claim. Election was made without traverse in the reply filed on 4-13-26. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-4 are rejected under 35 U.S.C. 102(a)(1) as being fully anticipated by Kim et al. (US20220082794). Re claim 1, Kim et al. teaches for example in fig. 1, 4, and 6c, a metasurface having a stepped substrate (fig. 4), comprising: the stepped substrate (71) and nanostructures (75); wherein the stepped substrate comprises a plurality of positions for phase design that are configured to modulate a phase of incident light (para. 0046, 0071, 0089, 0093-0095), and substrate heights of two adjacent positions for phase design are different (fig. 4; para. 0046, 0071, 0089, 0093-0095); substrate heights of respective positions for phase design are related to functions of the metasurface (para. 0046, 0071, 0089, 0093-0095); the nanostructures are respectively arranged at the respective positions for phase design (para. 0046, 0071, 0089, 0093-0095). Re claim 2, Kim et al. further teaches for example in fig. 1, 4, and 6c, a filler material (EN11; para. 0097); the metasurface is covered by the filler material to form a top surface that is parallel to a bottom of the metasurface (fig. 4). Re claim 3, Kim et al. further teaches for example in fig. 1, 4, and 6c, a filler material (EN11; para. 0097); the metasurface is covered by the filler material to form a top surface that is parallel to a bottom of the metasurface (fig. 4). Re claim 4, Kim et al. further teaches for example in fig. 1, 4, and 6c, an anti-reflection film (77; para. 0050) or a protective layer; wherein the anti-reflection film or the protective layer is provided on the top surface of filler material (fig. 4). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOSEPH P MARTINEZ whose telephone number is (571)272-2335. The examiner can normally be reached Monday-Thursday 9am to 7pm PACIFIC. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Bumsuk Won can be reached at (571) 272-2713. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /Joseph P Martinez/ Primary Examiner, Art Unit 2872 8-6-26
Read full office action

Prosecution Timeline

Mar 07, 2024
Application Filed
Aug 11, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
86%
Grant Probability
89%
With Interview (+3.2%)
2y 3m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 895 resolved cases by this examiner. Grant probability derived from career allowance rate.

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