Prosecution Insights
Last updated: April 19, 2026
Application No. 18/604,040

APERTURE STRUCTURE, LENS ASSEMBLY AND TERMINAL

Non-Final OA §102
Filed
Mar 13, 2024
Examiner
TALLMAN, ROBERT E
Art Unit
2872
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
BEIJING XIAOMI MOBILE SOFTWARE CO., LTD.
OA Round
1 (Non-Final)
81%
Grant Probability
Favorable
1-2
OA Rounds
2y 8m
To Grant
96%
With Interview

Examiner Intelligence

Grants 81% — above average
81%
Career Allow Rate
613 granted / 753 resolved
+13.4% vs TC avg
Moderate +15% lift
Without
With
+14.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 8m
Avg Prosecution
29 currently pending
Career history
782
Total Applications
across all art units

Statute-Specific Performance

§101
0.8%
-39.2% vs TC avg
§103
42.8%
+2.8% vs TC avg
§102
34.4%
-5.6% vs TC avg
§112
19.1%
-20.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 753 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Priority Receipt is acknowledged of certified copies of papers required by 37 CFR 1.55. Information Disclosure Statement The information disclosure statement (IDS) submitted on11/08/2024 was filed. The submission is in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-20 are rejected under 35 U.S.C. 102(a1) as being anticipation by Hasegawa (US 2012/0147446 A1). Regarding claim 1 Hasegawa teaches (figs. 1-9) an aperture structure, comprising: a substrate (129; para. 0027); a blade having a light transmitting hole (123; para. 0028, lines 17-29); and a shielding assembly (121), the shielding assembly and the light transmitting hole forming a first aperture hole having a polygonal shape (para. 0028, lines 1-10), where at least one of the blade or the shielding assembly is movably arranged on the substrate in a first direction, to change a size of the first aperture hole (para. 0065). Regarding claim 2 Hasegawa teaches (figs. 1-9) an aperture structure, where the blade and the shielding assembly are movably arranged on the substrate in the first direction (para. 0028). Regarding claim 3 Hasegawa teaches (figs. 1-9) an aperture structure, comprising at least two blades, wherein the at least two blades are stacked together with the shielding assembly in a second direction perpendicular to the first direction, and the shielding assembly and at least two light transmitting holes cooperatively form the first aperture hole having the polygonal shape (para. 0028 and 0065). Regarding claim 4 Hasegawa teaches (figs. 1-9) an aperture structure, comprising two blades, wherein the shielding assembly and the at least two light transmitting holes cooperatively form the first aperture hole having a regular hexagonal shape (see fig. 1 and 2A). Regarding claim 5 Hasegawa teaches (figs. 1-9) an aperture structure, where the shielding assembly comprises two baffle plates, each of the two baffle plates is movably arranged on the substrate in the first direction (para 0011 and 124), and each of the two baffle plates has a straight edge (see fig. 1); each light transmitting hole has a first sub hole having a triangular shape, two first edges of each first sub hole form a vertex angle, and a center line of each first sub hole at the vertex angle extends along the first direction; when the two blades move, two first edges of two first sub holes at a same side are crossed (para. 0028); and two straight edges of the two baffle plates and the two first sub holes cooperatively form the first aperture hole (para. 0028). Regarding claim 6 Hasegawa teaches (figs. 1-9) an aperture structure, where the two straight edges of the two baffle plates are adjacent in the first direction (see fig. 1). Regarding claim 7 Hasegawa teaches (figs. 1-9) an aperture structure, where the two straight edges of the two baffle plates are movable towards each other or away from each other in the first direction (para. 0028). Regarding claim 8 Hasegawa teaches (figs. 1-9) an aperture structure, where each of the two baffle plates is configured as a rectangular plate. Regarding claim 9 Hasegawa teaches (figs. 1-9) an aperture structure, where the two blades are arranged between the substrate and the two baffle plates (see fig. 1). Regarding claim 10 Hasegawa teaches (figs. 1-9) an aperture structure, where the substrate has a through hole, and the first aperture hole is arranged such that a projection of the first aperture hole in the second direction is located in the through hole (see fig. 1); each light transmitting hole has a second sub hole in communication with the first sub hole, and when the two blades move, two second sub holes form an avoidance hole (see fig. 1); and when the two blades moves to a position where a projection of the through hole in the second direction is located in the avoidance hole, the through hole is configured as a second aperture hole (para. 0026 and 0065). Regarding claim 11 Hasegawa teaches (figs. 1-9) an aperture structure, where the through hole is configured as a circular hole (para. 0056). Regarding claim 12 Hasegawa teaches (figs. 1-9) an aperture structure, where each second sub hole has five second edges connected in sequence, and when the two blades move, the two second sub holes form the avoidance hole having an octagonal shape (para. 0028). Regarding claim 13 Hasegawa teaches (figs. 1-9) an aperture structure, where when two vertex angles move away from each other and the two baffle plates move away from each other, the size of the first aperture hole is increased; and when the two vertex angles approach each other and the two baffle plates approach each other, the size of the first aperture hole is be reduced (para. 0028 and 0065). Regarding claim 14 Hasegawa teaches (figs. 1-9) an aperture structure, where the two baffle plates has a same thickness in the second direction (see fig. 1). Regarding claim 15 Hasegawa teaches (figs. 1-9) an aperture structure, where at least one of the shielding assembly or the blade adjusts the size of the first aperture hole by means of linear motion (para. 0028 and 0065). Regarding claim 16 Hasegawa teaches (figs. 1-9) an aperture structure, where the light transmitting hole has a triangular shape (para. 0070). Regarding claim 17 Hasegawa teaches (figs. 1-9) an aperture structure, where the light transmitting hole is configured to have at least two square sub holes arranged in the first direction and communicated in sequence (see fig. 1). Regarding claim 18 Hasegawa teaches (figs. 1-9) an aperture structure, where any two of the at least two square subholes have different sizes (dee fig. 2). Regarding claim 19 Hasegawa teaches (figs. 1-9) a lens assembly, comprising: an aperture structure, comprising: a substrate (129; para. 0027); a blade having a light transmitting hole (123; para. 0028, lines 17-29); and a shielding assembly, the shielding assembly and the light transmitting hole forming a first aperture hole having a polygonal shape (121; para. 0028, lines 1-10), where at least one of the blade or the shielding assembly is movably arranged on the substrate in a first direction, to change a size of the first aperture hole (para. 0028 and 0065). Regarding claim 20 Hasegawa teaches (figs. 1-9) a terminal, comprising: a lens assembly (para. 0030), comprising: an aperture structure (para. 0028), comprising: a substrate (129; para. 0027); a blade having a light transmitting hole 123; para. 0028, lines 17-29); and a shielding assembly, the shielding assembly and the light transmitting hole forming a first aperture hole having a polygonal shape (121; para. 0028, lines 1-10), where at least one of the blade or the shielding assembly is movably arranged on the substrate in a first direction, to change a size of the first aperture hole (para. 0028 and 0065). Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Zhou et. al. (US 2020/0409235 A1), Numnual et. al. (US 2009/0153937 A1) and Yamazaki (US 10,397,547 B2) further teach aperture structures. Any inquiry concerning this communication or earlier communications from the examiner should be directed to ROBERT E TALLMAN whose telephone number is (571)270-3958. The examiner can normally be reached Monday-Friday 10 a.m. -6 p.m.. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Ricky Mack can be reached at 571-272-2333. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /Robert E. Tallman/ Primary Examiner, Art Unit 2872
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Prosecution Timeline

Mar 13, 2024
Application Filed
Mar 21, 2026
Non-Final Rejection — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
81%
Grant Probability
96%
With Interview (+14.9%)
2y 8m
Median Time to Grant
Low
PTA Risk
Based on 753 resolved cases by this examiner. Grant probability derived from career allow rate.

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