Prosecution Insights
Last updated: April 18, 2026
Application No. 18/610,563

FLOOR PANEL

Final Rejection §103§DP
Filed
Mar 20, 2024
Examiner
RIVERA, JOSHEL
Art Unit
1746
Tech Center
1700 — Chemical & Materials Engineering
Assignee
UNILIN, BV
OA Round
2 (Final)
73%
Grant Probability
Favorable
3-4
OA Rounds
2y 7m
To Grant
80%
With Interview

Examiner Intelligence

Grants 73% — above average
73%
Career Allow Rate
624 granted / 851 resolved
+8.3% vs TC avg
Moderate +7% lift
Without
With
+6.8%
Interview Lift
resolved cases with interview
Typical timeline
2y 7m
Avg Prosecution
21 currently pending
Career history
872
Total Applications
across all art units

Statute-Specific Performance

§101
0.8%
-39.2% vs TC avg
§103
48.2%
+8.2% vs TC avg
§102
27.5%
-12.5% vs TC avg
§112
14.7%
-25.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 851 resolved cases

Office Action

§103 §DP
Notice of Pre-AIA or AIA Status The present application is being examined under the pre-AIA first to invent provisions. Double Patenting The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969). A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA . A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b). The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13. The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA /25, or PTO/AIA /26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer. Claims 1-13 are rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-3, 6, 12 and 16 of U.S. Patent No. 12,123,201. Although the claims at issue are not identical, they are not patentably distinct from each other because both the claimed invention and the patented document discloses similar method for manufacturing panels. Claim Rejections - 35 USC § 103 The following is a quotation of pre-AIA 35 U.S.C. 103(a) which forms the basis for all obviousness rejections set forth in this Office action: (a) A patent may not be obtained though the invention is not identically disclosed or described as set forth in section 102, if the differences between the subject matter sought to be patented and the prior art are such that the subject matter as a whole would have been obvious at the time the invention was made to a person having ordinary skill in the art to which said subject matter pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under pre-AIA 35 U.S.C. 103(a) are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. This application currently names joint inventors. In considering patentability of the claims under pre-AIA 35 U.S.C. 103(a), the examiner presumes that the subject matter of the various claims was commonly owned at the time any inventions covered therein were made absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and invention dates of each claim that was not commonly owned at the time a later invention was made in order for the examiner to consider the applicability of pre-AIA 35 U.S.C. 103(c) and potential pre-AIA 35 U.S.C. 102(e), (f) or (g) prior art under pre-AIA 35 U.S.C. 103(a). Claim 1 and 4 - 11 is/are rejected under pre-AIA 35 U.S.C. 103(a) as being unpatentable over Chen et al (US 2006/0032175) in view of Burt et al (US Patent 5,560,797) and Thiers (EP 1290290) . With regards to claims 1 and 11, Chen discloses a method for manufacturing panels, where the panels comprises at least a substrate and a top layer (paragraphs 32 – 47 and 82) where the top layer comprises a translucent or transparent layer (paragraphs 38, 71-73 and 75), the method comprising: A step of providing a substrate (paragraphs 32 – 47 and 82) A step of providing a top layer on the substrate (paragraphs 88 and 89) A step of heating the top layer (paragraphs 88, 89, 120 and 121) Chen fails to explicitly disclose that that the top layer includes a thermoplastic layer and that the method comprises a step of feeding the thermoplastic layer in a press device and structuring the thermoplastic layer at least by means of a press treatment with a mechanical press element. Burt discloses a process of producing a plastic floor tile (Abstract), in the same field of endeavor as Chen, where the substrate comprises polyvinyl chloride (column 2 lines 30-43) and a transparent polyvinyl chloride film is applied the substrate (column 2 lines 42 – 55) for wear protection and/or providing or enhance decorative effect (column 1 lines 32 – 50). It would have been obvious to one of ordinary skills in the art before the effective filing date of the claimed invention to have the top layer in Chen include thermoplastic layer, as suggested by Burt. The rationale being that, as stated by Burt, it provides wear protection and/or providing or enhance decorative effect (column 1 lines 32 – 50). Chen and Burt fail to explicitly disclose a step of feeding the thermoplastic layer in a press device and structuring the thermoplastic layer by means of a press treatment. Thiers discloses a process of producing a floor panel comprising a décor, overlay and substrate (Abstract), in the same field of endeavor as Chen and Burt, where Thiers discloses a method comprises a step of feeding the thermoplastic layer in a press device and structuring the thermoplastic layer at least by means of a press treatment with a mechanical press element (paragraphs 52 – 55). It would have been obvious to one of ordinary skills in the art before the effective filing date of the claimed invention to have performed a step of feeding the thermoplastic layer in a press device and structuring the thermoplastic layer at least by means of a press treatment with a mechanical press element, as suggested by Thiers, in Chen’s method as modified by Burt. The rationale being that, as stated by Thiers, it is a preferred method for applying a décor to a thermoplastic layer (paragraphs 25 and 26). With regards to claim 4, the teachings of Chen, Burt and Thiers are presented above. Additionally, Burt teaches that the thermoplastic layer substantially consists of a vinyl compound (column 2 lines 30 – 55). With regards to claim 5, the teachings of Chen, Burt and Thiers are presented above. Additionally, Chen teaches that the substrate is a synthetic material board (paragraphs 32 – 47 and 82). With regards to claim 6, the teachings of Chen, Burt and Thiers are presented above. Additionally, Thiers teaches that the press device is of the cyclic type (paragraphs 52 – 55). With regards to claim 7, the teachings of Chen, Burt and Thiers are presented above. Additionally, Thiers teaches that during the step of heating, at least a pattern or motif is situated on the lower side of the thermoplastic layer (as seen in Figure 14, paragraphs 54 and 55). With regards to claim 8, the teachings of Chen, Burt and Thiers are presented above. Additionally, Chen teaches that the step of providing a top layer on the substrate is performed prior to the step of heating (paragraphs 88, 89, 120 and 121). With regards to claim 9, the teachings of Chen, Burt and Thiers are presented above. Additionally, Chen teaches that the substrate is provided by means of extrusion (paragraphs 32 – 47 and 82). With regards to claim 10, the teachings of Chen, Burt and Thiers are presented above. Additionally, Burt teaches that the substrate is provided as an endless board material which is divided prior to the structuring (column 2 lines 30 – 55). Claims 2, 3, 12 and 13 are rejected under pre-AIA 35 U.S.C. 103(a) as being unpatentable over Chen et al (US 2006/0032175) in view of Burt et al (US Patent 5,560,797) and Thiers (EP 1290290) as applied to claims 1 and 11 above, and further in view of Matsukawa et al (EP 2308678). With regards to claims 2, 3 ,12 and 13, the teachings of Chen, Burt and Thiers are presented above. Chen, Burt and Thiers teaches a heating step but fail to explicitly disclose that the heating step uses a radiation source. Matsukawa teaches a method of providing a decorative sheet with wood grain patterns or other desired textures (Abstract), in the same field of endeavor as Chen, Burt and Thiers, where Matsukawa teaches that the heating step is performed using a radiation source that includes infrared light emitted from one or more infrared heating units (paragraph 59). It would have been obvious to one of ordinary skills in the art before the effective filing date of the claimed invention to have used a radiation source in the heating step, as suggested by Matsukawa, in Chen’s method as modified by Burt and Thiers. The rationale being that, as stated by Matsukawa, it is a well known method for heating (paragraph 59). Additionally, one of ordinary skills in the art would appreciate that infrared radiation would yield a predictable result of heating a surface of an outer layer of a laminate for embossing. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOSHEL RIVERA whose telephone number is (571)270-7655. The examiner can normally be reached M-F 12pm - 8pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Michael Orlando can be reached at (571) 270-5038. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /JOSHEL RIVERA/Examiner, Art Unit 1746 /MICHAEL N ORLANDO/Supervisory Patent Examiner, Art Unit 1746
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Prosecution Timeline

Mar 20, 2024
Application Filed
Nov 24, 2025
Non-Final Rejection — §103, §DP
Feb 25, 2026
Response Filed
Apr 10, 2026
Final Rejection — §103, §DP (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
73%
Grant Probability
80%
With Interview (+6.8%)
2y 7m
Median Time to Grant
Moderate
PTA Risk
Based on 851 resolved cases by this examiner. Grant probability derived from career allow rate.

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