Prosecution Insights
Last updated: April 19, 2026
Application No. 18/611,741

ANALYSIS APPARATUS, ANALYSIS METHOD, AND ANALYSIS PROGRAM

Non-Final OA §102
Filed
Mar 21, 2024
Examiner
KEFAYATI, SOORENA
Art Unit
2884
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Rigaku Corporation
OA Round
1 (Non-Final)
83%
Grant Probability
Favorable
1-2
OA Rounds
2y 10m
To Grant
90%
With Interview

Examiner Intelligence

Grants 83% — above average
83%
Career Allow Rate
330 granted / 397 resolved
+15.1% vs TC avg
Moderate +7% lift
Without
With
+7.1%
Interview Lift
resolved cases with interview
Typical timeline
2y 10m
Avg Prosecution
32 currently pending
Career history
429
Total Applications
across all art units

Statute-Specific Performance

§101
2.2%
-37.8% vs TC avg
§103
42.0%
+2.0% vs TC avg
§102
18.7%
-21.3% vs TC avg
§112
30.6%
-9.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 397 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-2, 4, 6-9, 10-11, 13-14, 16 and 18 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Ito (U.S. 2020/0333267). Regarding claim 1: Ito discloses an analysis apparatus for analyzing a fine structure of a plate-shaped sample formed to have columnar scattering bodies that are long in a thickness direction and periodically arranged, comprising: processing circuitry (Fig. 4, 120) configured to store data of a scattering intensity from the plate-shaped sample measured by transmission of X-rays in one ω scan ([0020], data storage), perform coordinate conversion from the coordinate of the scattering vector to the coordinate of the tilt of the scattering body ([0038]-[0043], scattering vector changing), with respect to a waveform based on an intensity of a specific diffraction point ([0038], diffraction line) on the two-direction components, using the data of the measured scattering intensity ([0038]-[0043], scattering vector changing), specify a peak position of the waveform of the intensity with respect to the coordinate of the tilt applied the coordinate conversion ([0055], peak positions), and calculate a difference ([0054], difference calculations) between the specified peak position and the peak position obtained on the assumption that the scattering body is not tilted from the direction perpendicular to the surface of the plate-shaped sample, on the two-direction components of the tilt of the scattering body ([0054], difference calculations). Regarding claim 2: Ito discloses the analysis apparatus according to claim 1, wherein the processing circuitry is further configured to perform the coordinate conversion to the coordinate of the tilt of the scattering body on at least one of the two-direction components, by a single analysis using a diffraction point at which one of the two-direction components of the scattering vectors is 0 ([0056], scattering intensity pattern at 0). Regarding claim 4: Ito discloses the analysis apparatus according to claim 1, wherein the two-direction components correspond to components in X direction along with the unit cell ([0102], X-direction) and Y direction orthogonal to the X direction ([0102], Y-direction), both of the X and Y directions being parallel to the surface of the plate-shaped sample (fig. 1, X and Y directions are parallel). Regarding claim 6: Ito discloses the analysis apparatus according to claim 1, wherein the processing circuitry is further configured to use a waveform integrated over a plurality of diffraction points as a waveform based on an intensity of a two-direction component of the specific diffraction point ([0063]-[0068], integral using diffraction points). Regarding claim 7: It discloses an analysis method for a fine structure of a plate-shaped sample formed to have columnar scattering bodies that are long in a thickness direction and periodically arranged, comprising: preparing data of a scattering intensity from the plate-shaped sample measured by transmission of X-rays in one ω scan ([0020], data storage); performing coordinate conversion from the coordinate of the scattering vector to the coordinate of the tilt of the scattering body ([0038]-[0043], scattering vector changing), with respect to a waveform based on an intensity of a specific diffraction point ([0038], diffraction line) on the two-direction components, using the data of the measured scattering intensity ([0038]-[0043], scattering vector changing); specifying a peak position of the waveform of the intensity with respect to the coordinate of the tilt applied the coordinate conversion ([0055], peak positions); and calculating a difference between the specified peak position and the peak position ([0054], difference calculations) obtained on the assumption that the scattering body is not tilted from the direction perpendicular to the surface of the plate-shaped sample ([0054], difference calculations), on the two-direction components of the tilt of the scattering body ([0054], difference calculations). Regarding claim 8: Ito discloses a non-transitory computer readable recording medium (Fig. 4, 120) having recorded thereon an analysis program for analyzing a fine structure of a plate-shaped sample formed to have columnar scattering bodies that are long in a thickness direction and periodically arranged, the program causing a computer (Fig. 4, 120) to execute the following processes of: preparing data of a scattering intensity from the plate-shaped sample measured by transmission of X-rays in one ω scan ([0020], data storage); performing coordinate conversion from the coordinate of the scattering vector to the coordinate of the tilt of the scattering body ([0038]-[0043], scattering vector changing), with respect to a waveform based on an intensity of a specific diffraction point ([0038], diffraction line) on the two-direction components, using the data of the measured scattering intensity ([0038]-[0043], scattering vector changing); specifying a peak position of the waveform of the intensity with respect to the coordinate of the tilt applied the coordinate conversion ([0055], peak positions); and calculating a difference between the specified peak position and the peak position ([0054], difference calculations) obtained on the assumption that the scattering body is not tilted from the direction perpendicular to the surface of the plate-shaped sample ([0054], difference calculations), on the two-direction components of the tilt of the scattering body ([0054], difference calculations). Regarding claim 9: Ito discloses the method of claim 7, further comprising: performing the coordinate conversion to the coordinate of the tilt of the scattering body on at least one of the two-direction components, by a single analysis using a diffraction point at which one of the two-direction components of the scattering vectors is 0 ([0056], scattering intensity pattern at 0). Regarding claim 11: Ito discloses the method of claim 7, wherein the two-direction components correspond to components in X direction along with the unit cell ([0102], X-direction) and Y direction orthogonal to the X direction ([0102], Y-direction), both of the X and Y directions being parallel to the surface of the plate-shaped sample (fig. 1, X and Y directions are parallel). Regarding claim 13: Ito discloses the method of claim 7, further comprising: using a waveform integrated over a plurality of diffraction points as a waveform based on an intensity of a two-direction component of the specific diffraction point ([0063]-[0068], integral using diffraction points). Regarding claim 14: Ito discloses the non-transitory computer readable recording medium of claim 8, further comprising: performing the coordinate conversion to the coordinate of the tilt of the scattering body on at least one of the two-direction components, by a single analysis using a diffraction point at which one of the two-direction components of the scattering vectors is 0 ([0056], scattering intensity pattern at 0). Regarding claim 16 Ito discloses the non-transitory computer readable recording medium of claim 8, wherein the two-direction components correspond to components in X direction along with the unit cell ([0102], X-direction) and Y direction orthogonal to the X direction ([0102], Y-direction), both of the X and Y directions being parallel to the surface of the plate-shaped sample (fig. 1, X and Y directions are parallel). Regarding claim 18: Ito discloses the non-transitory computer readable recording medium of claim 8, further comprising: using a waveform integrated over a plurality of diffraction points as a waveform based on an intensity of a two-direction component of the specific diffraction point ([0063]-[0068], integral using diffraction points). Allowable Subject Matter Claim 3, 5, 10, 12, 15, and 17 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: The closest prior art is Ito (U.S. 2020/0333267). Regarding claim 3: Ito discloses the analysis apparatus according to claim 1. However, Ito fails to disclose wherein the processing circuitry is further configured to perform the coordinate conversion to the coordinate of the tilt of the scattering body on the two-direction components, by a loop analysis using a diffraction point where none of the two-direction components of the scattering vectors is not 0. Since the prior art of record fails to teach the details above, nor is there any reason to modify or combine prior art elements absent of applicant’s disclosure, the claim is deemed patentable over the prior art of record, if rewritten in independent form to include all of the limitations of the base claim and any intervening claim. Regarding claim 5: Ito discloses the analysis apparatus according to claim 1. However, Ito fails to disclose wherein the two-direction components correspond to components in a0 direction and being the scanning direction of the ω-scan and a1 direction orthogonal to a0 direction, both of the a0 and a1 directions being parallel to the surface of the plate-shaped sample. Since the prior art of record fails to teach the details above, nor is there any reason to modify or combine prior art elements absent of applicant’s disclosure, the claim is deemed patentable over the prior art of record, if rewritten in independent form to include all of the limitations of the base claim and any intervening claim. Regarding claim 10: Ito discloses the method of claim 7. However, Ito fails to disclose performing the coordinate conversion to the coordinate of the tilt of the scattering body on the two-direction components, by a loop analysis using a diffraction point where none of the two-direction components of the scattering vectors is not 0. Since the prior art of record fails to teach the details above, nor is there any reason to modify or combine prior art elements absent of applicant’s disclosure, the claim is deemed patentable over the prior art of record, if rewritten in independent form to include all of the limitations of the base claim and any intervening claim. Regarding claim 12: Ito discloses the method of claim 7. However, Ito fails to disclose wherein the two-direction components correspond to components in a0 direction and being the scanning direction of the ω-scan and a1 direction orthogonal to a0 direction, both of the a0 and a1 directions being parallel to the surface of the plate-shaped sample. Since the prior art of record fails to teach the details above, nor is there any reason to modify or combine prior art elements absent of applicant’s disclosure, the claim is deemed patentable over the prior art of record, if rewritten in independent form to include all of the limitations of the base claim and any intervening claim. Regarding claim 15: Ito discloses the non-transitory computer readable recording medium of claim 8. However, Ito fails to disclose performing the coordinate conversion to the coordinate of the tilt of the scattering body on the two-direction components, by a loop analysis using a diffraction point where none of the two-direction components of the scattering vectors is not 0. Since the prior art of record fails to teach the details above, nor is there any reason to modify or combine prior art elements absent of applicant’s disclosure, the claim is deemed patentable over the prior art of record, if rewritten in independent form to include all of the limitations of the base claim and any intervening claim. Regarding claim 17: Ito discloses the non-transitory computer readable recording medium of claim 8. However, Ito fails to disclose wherein the two-direction components correspond to components in a0 direction and being the scanning direction of the ω-scan and a1 direction orthogonal to a0 direction, both of the a0 and a1 directions being parallel to the surface of the plate-shaped sample. Since the prior art of record fails to teach the details above, nor is there any reason to modify or combine prior art elements absent of applicant’s disclosure, the claim is deemed patentable over the prior art of record, if rewritten in independent form to include all of the limitations of the base claim and any intervening claim. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to SOORENA KEFAYATI whose telephone number is (469)295-9078. The examiner can normally be reached M to F, 7:30 am to 4:30 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, David Makiya can be reached at 571-272-2273. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /S.K./Examiner, Art Unit 2884 /DAVID J MAKIYA/Supervisory Patent Examiner, Art Unit 2884
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Prosecution Timeline

Mar 21, 2024
Application Filed
Feb 13, 2026
Non-Final Rejection — §102
Mar 26, 2026
Interview Requested
Apr 13, 2026
Applicant Interview (Telephonic)
Apr 13, 2026
Examiner Interview Summary

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
83%
Grant Probability
90%
With Interview (+7.1%)
2y 10m
Median Time to Grant
Low
PTA Risk
Based on 397 resolved cases by this examiner. Grant probability derived from career allow rate.

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