Prosecution Insights
Last updated: April 19, 2026
Application No. 18/633,445

VAPOR CHAMBER WITH SANDWICHED UPPER WICK

Non-Final OA §102
Filed
Apr 11, 2024
Examiner
DUONG, THO V
Art Unit
3763
Tech Center
3700 — Mechanical Engineering & Manufacturing
Assignee
Taiwan Microloops Corp.
OA Round
1 (Non-Final)
67%
Grant Probability
Favorable
1-2
OA Rounds
3y 4m
To Grant
84%
With Interview

Examiner Intelligence

Grants 67% — above average
67%
Career Allow Rate
794 granted / 1188 resolved
-3.2% vs TC avg
Strong +18% interview lift
Without
With
+17.7%
Interview Lift
resolved cases with interview
Typical timeline
3y 4m
Avg Prosecution
43 currently pending
Career history
1231
Total Applications
across all art units

Statute-Specific Performance

§103
41.0%
+1.0% vs TC avg
§102
33.6%
-6.4% vs TC avg
§112
23.2%
-16.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1188 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Claims 3-10 are withdrawn from further consideration pursuant to 37 CFR 1.142(b), as being drawn to a nonelected species, there being no allowable generic or linking claim. Applicant timely traversed the restriction (election) requirement in the reply filed on 11/6/2025. Applicant's election with traverse of species A shown in figures 1-3 in the reply filed on 11/6/2025 is acknowledged. The traversal is on the ground(s) that each group of species does not require different search or technical analysis. This is not found persuasive because the basis for the election of the species is that each of the species directs to a patentable distinct vapor chamber and each patentable distinct species requires different search text queries, which places a serious search burden on the examiner. For example, the text search queries for one tube portion comprises a closed end for species C or D is not required for species A and species B. The requirement is still deemed proper and is therefore made FINAL. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-2 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Wang Chin Wen (US 20090236085A1). Regarding claim 1, Wang discloses(figures 7-8) a vapor chamber with a sandwiched upper wick (22), comprising a lower plate (20); and an upper plate (21), covering the lower plate (20) to form a chamber between the lower plate and the upper plate, the upper plate comprising an outer plate (21) , at least one inner plate (1) superposed with the outer plate and located in the chamber and at least one sandwiched wick layer (22) sandwiched between the outer plate (21) and the inner plate (1); wherein the lower plate (20) is disposed with a lower wick structure (22) located in the chamber, the sandwiched wick layer (22) is formed with a connecting edge corresponding to a periphery of the inner plate and projecting from the periphery of the inner plate, and the connecting edge is in contact with the lower wick structure. (connecting edge is a portion of wick 22 on lateral side of upper plate 21). Regarding claim 2, Wang discloses (figure 8) that the lower wick structure (22) is further disposed with a lateral portion (lateral portion of wick 22 extends from the lower plate 20 toward the upper plate) attached along an inner wall of a periphery of the chamber, the lateral portion matches with the inner wall of the peripheral of the chamber and extends toward the outer plate (21) to be in contact with the connecting edge. . Claims 1-2 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Ishida (US 20020179288A1) Regarding claim 1, Ishida discloses (figure 11 and figure A) a vapor chamber with a sandwiched upper wick (see figure A), comprising a lower plate ; and an upper plate, covering the lower plate to form a chamber between the lower plate and the upper plate, the upper plate comprising an outer plate , at least one inner plate (28) superposed with the outer plate and located in the chamber and at least one sandwiched wick layer (upper wick) sandwiched between the outer plate and the inner plate; wherein the lower plate is disposed with a lower wick structure located in the chamber, the sandwiched wick layer is formed with a connecting edge corresponding to a periphery of the inner plate (28) and projecting from the periphery of the inner plate, and the connecting edge is in contact with the lower wick structure (40). Regarding claim 2, Ishida discloses (figure A) that the lower wick structure is further disposed with a lateral portion attached along an inner wall of a periphery of the chamber, the lateral portion matches with the inner wall of the peripheral of the chamber and extends toward the outer plate to be in contact with the connecting edge. (see figure A). PNG media_image1.png 370 866 media_image1.png Greyscale Figure A: the modified figure corresponds to figure 11 with limitations shown. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Zhang et al. (US 8,377,214B2) discloses a vapor chamber with a support plate. Lin Chun-Hung (US 20110168359A1) discloses a heat dissipating plate. Leeyongdeok et al. (KR 20040015887A) discloses a thermal diffuser. Meyer et al. (TW M 336673U) discloses a vapor chamber and supporting structure. Zhou et al. (US 20100139894A1) discloses a plate heat pipe. Any inquiry concerning this communication or earlier communications from the examiner should be directed to THO V DUONG whose telephone number is (571)272-4793. The examiner can normally be reached Monday through Friday 10-6PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Atkisson Jianying can be reached at 571-270-7740. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /THO V DUONG/Primary Examiner, Art Unit 3763
Read full office action

Prosecution Timeline

Apr 11, 2024
Application Filed
Nov 28, 2025
Non-Final Rejection — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12601550
GROOVED VAPOR CHAMBER CAPILLARY REFLOW STRUCTURE
2y 5m to grant Granted Apr 14, 2026
Patent 12601548
Systems and Methods for Thermal Management Using Separable Heat Pipes and Methods of Manufacture Thereof
2y 5m to grant Granted Apr 14, 2026
Patent 12581620
EXIT CHANNEL CONFIGURATION FOR MEMS-BASED ACTUATOR SYSTEMS
2y 5m to grant Granted Mar 17, 2026
Patent 12535278
HEAT DISSIPATION DEVICE OF HEAT PIPE COMBINED WITH VAPOR CHAMBER
2y 5m to grant Granted Jan 27, 2026
Patent 12529525
HEAT DIFFUSION DEVICE
2y 5m to grant Granted Jan 20, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
67%
Grant Probability
84%
With Interview (+17.7%)
3y 4m
Median Time to Grant
Low
PTA Risk
Based on 1188 resolved cases by this examiner. Grant probability derived from career allow rate.

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