Prosecution Insights
Last updated: April 19, 2026
Application No. 18/668,382

FORMING APPARATUS AND ARTICLE MANUFACTURING METHOD

Non-Final OA §DP
Filed
May 20, 2024
Examiner
WANG, ALEXANDER A
Art Unit
1741
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Canon Kabushiki Kaisha
OA Round
3 (Non-Final)
65%
Grant Probability
Favorable
3-4
OA Rounds
3y 2m
To Grant
87%
With Interview

Examiner Intelligence

Grants 65% — above average
65%
Career Allow Rate
166 granted / 254 resolved
At TC average
Strong +22% interview lift
Without
With
+21.5%
Interview Lift
resolved cases with interview
Typical timeline
3y 2m
Avg Prosecution
51 currently pending
Career history
305
Total Applications
across all art units

Statute-Specific Performance

§101
0.6%
-39.4% vs TC avg
§103
54.7%
+14.7% vs TC avg
§102
16.4%
-23.6% vs TC avg
§112
23.7%
-16.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 254 resolved cases

Office Action

§DP
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on 01/21/2026 has been entered. Response to Amendment Applicant amendment filed 01/21/2026 has been entered and is currently under consideration. Claims 3-4, and 8-11 remain pending in the application. Double Patenting The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969). A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA . A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b). The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13. The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA /25, or PTO/AIA /26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer. Claims 3-4 rejected on the ground of nonstatutory double patenting as being unpatentable over claims 3-4 of U.S. Patent No. 12076910. Although the claims at issue are not identical, they are not patentably distinct from each other. Claim 3 is anticipated by claim 6 of the ‘910 patent. Claim 4 is anticipated by claims 6-7 of the ‘910 patent. Claim 11 is anticipated by claim 6 of the ‘910 patent. Allowable Subject Matter Claims 9-10 objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: Regarding claim 3, Yoshida teaches: A forming apparatus for forming a formable material on a substrate using a mold including a contact region to be brought into contact with the formable material on the substrate ([0005]), the apparatus comprising: a mold holder configured to hold the mold (Fig 1: mold chuck 4b); a substrate holder configured to hold the substrate onto which the formable material has been supplied (Fig 1: substrate chuck 6a); a deforming device configured to deform the mold into a convex shape toward the substrate by applying a pressure to a space on an opposite side of the contact region of the mold ([0005, 0028-0029, 0035]); and a controller configured to perform processing of bringing the contact region and the formable material on the substrate into contact with each other (control unit 9; [0050]), wherein the controller controls: the processing, while controlling deformation of the mold with the deforming device, so as to bring the mold holder and the substrate holder closer to each other at a first relative speed and then bring the mold holder and the substrate holder even closer to each other at a second relative speed lower than the first relative speed ([0005, 0028-0029, 0035, 0050-0051]); and switching from the first relative speed to the second relative speed, so as to compensate a manufacturing error of the mold ([0048]). Yoshida does not teach switching from the first relative speed to the second relative speed, so as to compensate a manufacturing error of the mold, based on a parameter indicating a deformation amount of the mold under a pressure applied by the deforming device. The remaining prior art of record fails to teach or suggest the above limitation. Since the prior art of record fails to teach or suggest each and every limitation of the claim, the claim is indicated for allowable subject matter. However, claim 3 is subject to the above double patenting rejection. Claims 8-9 are indicated for allowable subject matter due to dependency on claim 3. Response to Arguments Applicant's arguments filed 0 have been fully considered but they are not persuasive. Applicant argues that the instant claims recite correcting deformation using a parameter indicating a deformation amount of the mold rather than a difference between a first measured obtained deformation amount of the mold and a second measured obtained deformation amount of a reference mold as recited in claim 6 of ‘910 patent. However, a difference between a first measured obtained deformation amount of the mold and a second measured obtained deformation amount of a reference mold falls under the scope of a parameter indicating a deformation amount of the mold and therefore the parameter indicating a deformation amount of the mold of the instant claim is generic to the deformation amount of the ‘910 patent. For at least the above reasons, the application is not in condition for allowance. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to ALEXANDER A WANG whose telephone number is (571)272-5361. The examiner can normally be reached M-Th 8 am-4 pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Alison Hindenlang can be reached on 571-270-7001. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ALEXANDER A WANG/ Examiner, Art Unit 1741 /ALISON L HINDENLANG/Supervisory Patent Examiner, Art Unit 1741
Read full office action

Prosecution Timeline

May 20, 2024
Application Filed
Sep 18, 2024
Response after Non-Final Action
Apr 16, 2025
Non-Final Rejection — §DP
Jul 21, 2025
Response Filed
Aug 19, 2025
Final Rejection — §DP
Aug 19, 2025
Examiner Interview (Telephonic)
Jan 21, 2026
Request for Continued Examination
Jan 27, 2026
Response after Non-Final Action
Feb 10, 2026
Non-Final Rejection — §DP (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12600075
Valve Device and Blow Molding System
2y 5m to grant Granted Apr 14, 2026
Patent 12594733
PREFORM SHAPING APPARATUS, PREFORM SHAPING METHOD AND COMPOSITE MATERIAL MOLDING METHOD
2y 5m to grant Granted Apr 07, 2026
Patent 12594732
AUTOMATED FIBER PLACEMENT DEVICE FOR PREFORM MANUFACTURING
2y 5m to grant Granted Apr 07, 2026
Patent 12583160
CONTROL DEVICE OF INJECTION MOLDING MACHINE AND INJECTION MOLDING MACHINE
2y 5m to grant Granted Mar 24, 2026
Patent 12576589
PRINT AND RECOAT ASSEMBLIES FOR ADDITIVE MANUFACTURING SYSTEMS AND METHODS FOR USING THE SAME
2y 5m to grant Granted Mar 17, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
65%
Grant Probability
87%
With Interview (+21.5%)
3y 2m
Median Time to Grant
High
PTA Risk
Based on 254 resolved cases by this examiner. Grant probability derived from career allow rate.

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