Prosecution Insights
Last updated: August 17, 2026
Application No. 18/679,584

PEROVSKITE OXIDE THIN FILM USING A SELECTIVE A-SITE ATOMIC GRADIENT AND METHOD OF PREPARATION THEREOF

Non-Final OA §102
Filed
May 31, 2024
Priority
Jun 15, 2023 — RE 10-2023- 0076849
Examiner
KHATRI, PRASHANT J
Art Unit
1783
Tech Center
1700 — Chemical & Materials Engineering
Assignee
POSTECH Research and Business Development Foundation
OA Round
1 (Non-Final)
61%
Grant Probability
Moderate
1-2
OA Rounds
1y 2m
Est. Remaining
90%
With Interview

Examiner Intelligence

Grants 61% of resolved cases
61%
Career Allowance Rate
532 granted / 871 resolved
-3.9% vs TC avg
Strong +28% interview lift
Without
With
+28.5%
Interview Lift
resolved cases with interview
Typical timeline
3y 5m
Avg Prosecution
36 currently pending
Career history
907
Total Applications
across all art units

Statute-Specific Performance

§101
0.9%
-39.1% vs TC avg
§103
48.6%
+8.6% vs TC avg
§102
18.5%
-21.5% vs TC avg
§112
23.3%
-16.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 871 resolved cases

Office Action

§102
DETAILED ACTION Election/Restrictions Applicant’s election of Group I, claims 1-13 in the reply filed on 5/22/2026 is acknowledged. Because applicant did not distinctly and specifically point out the supposed errors in the restriction requirement, the election has been treated as an election without traverse (MPEP § 818.01(a)). Claims 14-16 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected method, there being no allowable generic or linking claim. Election was made without traverse in the reply filed on 5/22/2026. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-4 and 7-13 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Du et al. (Journal of Crystal Growth). Du discloses a perovskite film disposed on a substrate. Concerning claims 1-4, Du discloses a Ba0.6Sr0.4TiO3 perovskite thin film having a layered structure having the claimed Chemical Formula 1, wherein the film is deposited using a PLD process with a RHEED to determine layer growth (pp. 1992-1994; FIGS. 1 and 2; Experimental procedure). Given that the process is the same as that disclosed, the ratio of A’ atoms to all A-sites in one layer is different from at least 3 A-site atomic layers in the thickness direction and has the structure as claimed in claims 3 and 4. With respect to claims 7 and 8, since the process is the same the gradient change would be within the claimed range. Regarding claim 9, the thickness of the film is 25 to 200 nm and specifically 25 nm and 60 nm (pp. 1993-1997). Concerning claim 10, as shown above the atomic ratio of A atoms to A’ atoms is 60:40 which is within the claimed range. In regards to claims 11-13, since the film is the same materials and produced in the same manner, the properties as claimed would be within the claimed ranges. Allowable Subject Matter Claims 5 and 6 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The prior art is silent to the specific chemical formulas for the second, third, and fourth atomic layers as claimed in claims 5 and 6. As such, the subject matter of at least claims 5 and 6 are found to be allowable over the applied and cited prior art. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Kuno et al. (WO 2022/006515), Kondo et al. (US 20050218466), Hiratani et al. (US 5914068), Kocanda et al. (Crystal Structure Theory and Applications), Cheng et al. (Journal of the American Ceramic Society), and Gatea et al. (The European Physical Journal D). Any inquiry concerning this communication or earlier communications from the examiner should be directed to PRASHANT J KHATRI whose telephone number is (571)270-3470. The examiner can normally be reached M-F 10AM-6:30PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Veronica Ewald can be reached at (571) 272-8519. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. PRASHANT J. KHATRI Primary Examiner Art Unit 1783 /PRASHANT J KHATRI/Primary Examiner, Art Unit 1783
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Prosecution Timeline

May 31, 2024
Application Filed
Jul 21, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
61%
Grant Probability
90%
With Interview (+28.5%)
3y 5m (~1y 2m remaining)
Median Time to Grant
Low
PTA Risk
Based on 871 resolved cases by this examiner. Grant probability derived from career allowance rate.

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