Prosecution Insights
Last updated: April 19, 2026
Application No. 18/701,976

TEST OBJECT ANALYSIS METHOD

Non-Final OA §103
Filed
Apr 17, 2024
Examiner
SMITH, MAURICE C
Art Unit
2877
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Hamamatsu Photonics K K
OA Round
1 (Non-Final)
84%
Grant Probability
Favorable
1-2
OA Rounds
2y 3m
To Grant
80%
With Interview

Examiner Intelligence

Grants 84% — above average
84%
Career Allow Rate
594 granted / 704 resolved
+16.4% vs TC avg
Minimal -4% lift
Without
With
+-4.5%
Interview Lift
resolved cases with interview
Typical timeline
2y 3m
Avg Prosecution
33 currently pending
Career history
737
Total Applications
across all art units

Statute-Specific Performance

§101
3.7%
-36.3% vs TC avg
§103
47.3%
+7.3% vs TC avg
§102
17.1%
-22.9% vs TC avg
§112
30.2%
-9.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 704 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-4 is/are rejected under 35 U.S.C. 103 as being unpatentable over paper of Zhengyi Chen, “Green photoreduction synthesis of dispersible gold nanoparticles and their direct in situ assembling in multidimensional substrates for SERS detection”, 12 July 2022 here after Chen in view of Siliu Tan, “Synthesis of Positively Charged Silver Nanoparticles via Photoreduction of AgNO3 in Branched Polyethyleneimine/HEPES Solutions”, June 15, 2007 hereafter Tan. With regard to claim 1, Chen teaches an analyte analysis method comprising: a mixing step of mixing an analyte “multidimensional substrate” (abstract, lines 9-10) (fig 1, g-C3N4 or MOF), a metal ion solution (fig 1, AuCl4), and a reducing agent (fig 1, CH3OH) to prepare a mixture solution; a metal microstructure generation step of irradiating the mixture solution with light (fig 1, UV light), reducing metal ions in the mixture solution by reducing action average diameter of the “average diameter…AuNPs decreased with the increase in the amount of CH3OH” of the reducing agent in the mixture solution to generate a metal microstructure “produced several Au0 nuclei” (pg. 6, col 2, ¶ 2, lines 1-5) (fig 1, AuNP), and attaching the analyte to the metal microstructure “MIL-101(Cr)@AuNPs” (fig 4, C) “g-C3N4@AuNPs” (fig 3, C); and a measurement step of irradiating the metal microstructure (fig 3 & 4, D) with excitation light, and measuring a spectrum of Raman scattered light generated by the excitation light irradiation. Chen does not teach a support. Tan, in the same field of endeavor of photoreduction of Nanoparticles for SERS, teaches metal structures may be formed on a clean silicon wafer substate (fig 1, SiO2) during photoreduction (pg. 2, ¶ 2, lines 20-25). At the time prior to the effective filing date of the invention it would have been obvious to one of ordinary skill in the art to combine Tan’s support with Chen’s metal microstructures as a design choice for an uncontaminated surface to support the metal microstructures during photoreduction. With regard to claim 2, Chen teaches an analyte analysis method comprising: a mixing step of mixing a metal ion solution (fig 1, AuCl4) and a reducing agent (fig 1, CH3OH) to prepare a mixture solution; a metal microstructure generation step of irradiating the mixture solution with light (fig 1, UV light), and reducing metal ions “average diameter….AuNPs decreased with the increase in the amount of CH3OH” in the mixture solution by reducing action of the reducing agent in the mixture solution to generate a metal microstructure “produced several Au0 nuclei” (pg. 6, col 2, ¶ 2, lines 1-5); an attachment step of attaching an analyte “MIL-101(Cr)@AuNPs” (fig 4, C) “g-C3N4@AuNPs” (fig 3, C) to the metal microstructure on the support; and a measurement step of, after the attachment step, irradiating the metal microstructure (fig 3 & 4, D) with excitation light, and measuring a spectrum of Raman scattered light generated by the excitation light irradiation Chen does not teach a support. Tan, in the same field of endeavor of photoreduction of Nanoparticles for SERS, teaches metal structures may be formed on a clean silicon wafer substate (fig 1, SiO2) during photoreduction (pg. 2, ¶ 2, lines 20-25). At the time prior to the effective filing date of the invention it would have been obvious to one of ordinary skill in the art to combine Tan’s support with Chen’s metal microstructures as a design choice for an uncontaminated surface to support the metal microstructures during photoreduction. With respect to claim 3 according to claim 1, the combination teaches the analyte analysis method wherein, in the metal microstructure generation step, the mixture solution “g-C3N4 nanosheet” is irradiated with the light “70 W UV lamp” (pg. 3, col 1, ¶ 2, lines 3-5 Chen) having a wavelength of 200 nm “365 nm” or more and 400 nm or less “365 nm” (pg. 3, col 1, ¶ 2, line 5 Chen). With respect to claim 4 according to claim 2, the combination teaches the analyte analysis method according wherein, in the metal microstructure generation step, the mixture solution “g-C3N4 nanosheet” is irradiated with the light “70 W UV lamp” having a wavelength of 200 nm or more “365 nm” and 400 nm or less “365 nm” (pg. 3, col 1, ¶ 2, line 5 Chen). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to MAURICE C SMITH whose telephone number is (571)272-2526. The examiner can normally be reached Monday-Friday 9am-5pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Kara Geisel can be reached at (571) 272-2416. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /MAURICE C SMITH/Examiner, Art Unit 2877
Read full office action

Prosecution Timeline

Apr 17, 2024
Application Filed
Sep 25, 2025
Non-Final Rejection — §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
84%
Grant Probability
80%
With Interview (-4.5%)
2y 3m
Median Time to Grant
Low
PTA Risk
Based on 704 resolved cases by this examiner. Grant probability derived from career allow rate.

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