Prosecution Insights
Last updated: April 19, 2026
Application No. 18/711,297

METHOD AND APPARATUS FOR MEASURING THE THICKNESS OF ONE OR MORE LAYERS OF A MULTI-LAYER FILM OBTAINED BY BLOW EXTRUSION PROCESS

Non-Final OA §102
Filed
May 17, 2024
Examiner
FOX, DANIELLE A
Art Unit
2884
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Syncro S R L
OA Round
1 (Non-Final)
83%
Grant Probability
Favorable
1-2
OA Rounds
2y 8m
To Grant
96%
With Interview

Examiner Intelligence

Grants 83% — above average
83%
Career Allow Rate
590 granted / 711 resolved
+15.0% vs TC avg
Moderate +13% lift
Without
With
+13.3%
Interview Lift
resolved cases with interview
Typical timeline
2y 8m
Avg Prosecution
29 currently pending
Career history
740
Total Applications
across all art units

Statute-Specific Performance

§101
2.9%
-37.1% vs TC avg
§103
39.6%
-0.4% vs TC avg
§102
41.4%
+1.4% vs TC avg
§112
10.4%
-29.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 711 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1-12 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by US 2010/0141275 (Keller). Regarding claim 1, Keller disclose a method for measuring, during production by blow extrusion process of a multi-layer film formed by one or more layers of a first material and one or more layers of a second material, the total thickness (Li) of the first material and/or the total thickness (L2) of the second material, the method comprising the steps of: (a) acquiring by means of an electromagnetic radiation sensor a first measurement signal (Sx) representative of the total thickness of the film (Fig. 1, via 16); (b) acquiring by means of a capacitive sensor a second measuring signal (Scap) which is the sum of the signals given by the first and the second material of the film, wherein the signal given by each material of the film is a function of the thickness (Li, L2) of that material (Fig. 1, via 17); and (c) calculating, from said first and second measurement signals (Sx, Scap), the total thickness (Li) of the first material and/or the total thickness (L2) of the second material [0035]. Regarding claim 2, Keller disclose the method according to claim 1, wherein said electromagnetic radiation sensor is an X-ray retro-reflection sensor (Fig. 1, 16, [0033]). Regarding claim 3, Hausmann disclose the method according to claim 1, wherein said steps a) and b) of acquiring a first measurement signal (Sx) by means of an electromagnetic radiation sensor and acquiring a second measurement signal (Scap) by means of a capacitive sensor, respectively, are performed with said sensors arranged facing an outer surface of the bubble (B) (Fig. 1). Regarding claim 4, Keller disclose the method according to claim 3, wherein said steps a) and b) of acquiring a first measurement signal (Sx) by means of an electromagnetic radiation sensor and acquiring a second measurement signal (Scap) by means of a capacitive sensor, respectively, are performed with said sensors arranged above each other and at a certain distance from each other, in a same plane oriented tangentially with respect to an outer surface of the bubble (B) (Fig. 1). Regarding claim 6, Keller disclose the method according to claim 2, wherein said steps a) and b) of acquiring a first measurement signal (Sx) by means of an electromagnetic radiation sensor and acquiring a second measurement signal (Scap) by means of a capacitive sensor, respectively, are performed by moving said sensors along a circular path around the bubble (B) (Fig. 1, via track 17’). Regarding claim 7, Keller disclose the method according to claim 1, wherein said step c) of calculating the total thickness (Li) of the first material and/or the total thickness (L2) of the second material is based on solving the following system of equations: Sx = kx (Li + L2) Scap = ki Li + k2 L2, wherein the parameter kx is continuously derived from data supplied by dosing means of the film production plant, which measure the quantities of the first material and the second material fed into the plant, wherein the parameter ki is determined, during the start-up phase of the film production plant, based on the value of said second measurement signal (Scap) when the film (F) is formed by the first material only, and wherein the parameter k2 is determined during the film production cycle, based on the average value of said second measurement signal (Scap) and the average values of the total thickness (Li) of the first material and the total thickness (L2) of the second material provided by said dosing means, from the following equation: k2 = (Scap – k1L1)/L2 (see table 2 and 3) . Regarding claim 8, Keller disclose an apparatus for measuring, in a multi-layer film obtained by blow extrusion process and formed of one or more layers of a first material and one or more layers of a second material, the total thickness (Li) of the first material and/or the total thickness (L2) of the second material, said apparatus (10) comprising: - an electromagnetic radiation sensor arranged to provide a first measurement signal (Sx) representative of the total thickness of the film (Fig. 1, 16); - a capacitive sensor arranged to provide a second measurement signal (Scap) which is the sum of the signals given by the first and second materials of the film, wherein the signal given by each material of the film is a function of the thickness (Li, L2) of said material (Fig. 1, 17); and - processing means for calculating, from said first and second measurement signals (Sx, Scap), the total thickness (Li) of the first material and/or the total thickness (L2) of the second material [0035]. Regarding claim 9, Keller disclose the apparatus according to claim 8, wherein said electromagnetic radiation sensor is an X-ray retro-reflection sensor [0033]. Regarding claim 10, Keller disclose a blown film extrusion plant for producing a multi-layer film, comprising an apparatus according to claim 8 (Fig. 1). Regarding claim 11, Keller disclose the plant according to claim 10, wherein said apparatus further comprises a measuring head on which said electromagnetic radiation sensor and said capacitive sensor are mounted so as to lie in a same plane oriented tangentially with respect to the outer surface of the bubble (B) (Fig. 1), guide means arranged around said bubble (B), coaxially to said bubble (B), and on which said measuring head is movably mounted along a circular path (Fig. 1), and driving means for controlling the movement of said measuring head on said guide means (Fig. 1, required to move sensors 16 and 17 around track 17’). Allowable Subject Matter Claims 5 and 12 objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: Regarding claim 5, Keller disclose the method according to claim 4, but fails to teach the details of comprising the step of measuring the distance of said plane from the outer surface of the bubble (B) by means of an ultrasonic sensor. Regarding claim 12, Keller disclose the plant according to claim 11, but fails to teach the details of wherein said apparatus further comprises an ultrasonic sensor arranged to measure the distance between the plane on which said electromagnetic radiation sensor and said capacitive sensor lie and the outer surface of the bubble (B). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to DANI FOX whose telephone number is (571)272-3513. The examiner can normally be reached M-F: 9-5. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, David Makiya can be reached at 571-272-2273. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DANI FOX/Primary Examiner, Art Unit 2884
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Prosecution Timeline

May 17, 2024
Application Filed
Jan 06, 2026
Non-Final Rejection — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
83%
Grant Probability
96%
With Interview (+13.3%)
2y 8m
Median Time to Grant
Low
PTA Risk
Based on 711 resolved cases by this examiner. Grant probability derived from career allow rate.

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