Prosecution Insights
Last updated: September 17, 2026
Application No. 18/714,943

COMPOSITION INCLUDING ONLY NANOWIRES

Non-Final OA §102§103
Filed
May 30, 2024
Priority
Nov 30, 2021 — JP 2021-194762 +1 more
Examiner
RUMP, RICHARD M
Art Unit
Tech Center
Assignee
Nisshin Seifun Group Inc.
OA Round
1 (Non-Final)
75%
Grant Probability
Favorable
1-2
OA Rounds
2m
Est. Remaining
95%
With Interview

Examiner Intelligence

Grants 75% — above average
75%
Career Allowance Rate
809 granted / 1084 resolved
+14.6% vs TC avg
Strong +20% interview lift
Without
With
+20.0%
Interview Lift
resolved cases with interview
Typical timeline
2y 6m
Avg Prosecution
37 currently pending
Career history
1111
Total Applications
across all art units

Statute-Specific Performance

§101
2.0%
-38.0% vs TC avg
§103
48.3%
+8.3% vs TC avg
§102
27.8%
-12.2% vs TC avg
§112
17.9%
-22.1% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1084 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. Status of Application Claims 1 and 2 are pending and presented for examination. Priority Acknowledgement is made of applicant's request for foreign priority under 35 U.S.C. §119(a)-(d). Certified copies of the priority documents have been received. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim 1 is rejected under 35 U.S.C. 102(a)(1) as being anticipated by “High Efficency Generation of Nanomaterials by Pulse-Modulated Inductively Coupled Plasma” to Tanaka (cited and provided by Applicants). Regarding claim 1, Tanaka discloses a composition of only nanowires (as controlling the cooling process per page 1 of the translated document states only nanowires are produced) having a diameter of ~10 nm (Id.). Claims 1 and 2 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by “High-rate synthesis of Si nanowires using modulated induction thermal plasmas” to Ishisaka et al. (hereinafter, “Ishisaka at __”; cited and provided by Applicants). Regarding claim 1, Ishisaka discloses a composition of only Si nanowire (with a SiOx coating so it meets “at least one of Si and SiO”) having a diameter of 10-30 nm and a length of 500 nm for an aspect ratio of 500/30-500/10 (Ishisaka at 096201-1 R col). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1 and 2 are rejected under 35 U.S.C. 103 as being unpatentable over 2017105680 to Tanaka et al. (hereinafter, “Tanaka-2 at __”; cited and provided by Applicants). As to claims 1 and 2, Tanak-2 discloses only silicon nanowires (Tanaka-2 at [0007]) having a diameter of 20-50 nm which overlaps the range instantly claimed of 1-40 which is prima facie obvious (see MPEP 2144.05) and a length 10x or more larger than the diameter (Id.). Claims 1 and 2 are rejected under 35 U.S.C. 103 as being unpatentable over US PG Pub No. 20080261112 to Nagata et al. (hereinafter, “Nagata at __”). Regarding claims 1 and 2, Nagata discloses only nanowires comprising silicon (Nagata at [0009]) having a diameter of 30-50 nm and a length of 100-10000 nm (Nagata at [0038]) which overlaps that range instantly claimed such that a prima facie case of obviousness exists (See MPEP 2144.05). Claims 1 and 2 are rejected under 35 U.S.C. 103 as being unpatentable over US PG Pub No. 20110121257 to Hanrath et al. (hereinafter, “Hanrath at __”). As to claim 1, Hanrath discloses a silicon nanowire (while the claim recites that the composition is only of nanowires Hanrath discloses that less than 1% of the composition is non-nanowires and as such it is prima facie obvious ot cover “only” as “only” would be 0% of non-nanowires and thusly the inherent range is overlapped, see MPEP 2144.05) having a diameter of ~10~20 nm and a length of 1000 nm (Hanrath at [0037] & [0042]). Conclusion Claims 1 and 2 are rejected. Any inquiry concerning this communication or earlier communications from the examiner should be directed to RICHARD M RUMP whose telephone number is (571)270-5848. The examiner can normally be reached Monday-Thursday 06:45 AM to 04:45 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Curtis Mayes can be reached at 571-272-1234. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. RICHARD M. RUMP Primary Examiner Art Unit 1759 /RICHARD M RUMP/Primary Examiner, Art Unit 1759
Read full office action

Prosecution Timeline

May 30, 2024
Application Filed
Aug 19, 2026
Non-Final Rejection mailed — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
75%
Grant Probability
95%
With Interview (+20.0%)
2y 6m (~2m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1084 resolved cases by this examiner. Grant probability derived from career allowance rate.

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