Prosecution Insights
Last updated: April 19, 2026
Application No. 18/726,598

SILICA GLASS BODY MANUFACTURING METHOD AND HEATING DEVICE

Non-Final OA §102§103
Filed
Jul 03, 2024
Examiner
DEHGHAN, QUEENIE S
Art Unit
1741
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Sumitomo Electric Industries, Ltd.
OA Round
1 (Non-Final)
62%
Grant Probability
Moderate
1-2
OA Rounds
3y 5m
To Grant
73%
With Interview

Examiner Intelligence

Grants 62% of resolved cases
62%
Career Allow Rate
519 granted / 839 resolved
-3.1% vs TC avg
Moderate +11% lift
Without
With
+11.1%
Interview Lift
resolved cases with interview
Typical timeline
3y 5m
Avg Prosecution
52 currently pending
Career history
891
Total Applications
across all art units

Statute-Specific Performance

§101
0.3%
-39.7% vs TC avg
§103
52.9%
+12.9% vs TC avg
§102
13.2%
-26.8% vs TC avg
§112
26.1%
-13.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 839 resolved cases

Office Action

§102 §103
DETAILED ACTION Election/Restrictions Applicant’s election without traverse of group I, and species b, which corresponds to claims 1-4 and 9-10 in the reply filed on February 12, 2026 is acknowledged. Specification The lengthy specification has not been checked to the extent necessary to determine the presence of all possible minor errors. Applicant’s cooperation is requested in correcting any errors of which applicant may become aware in the specification. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1 and 10 are rejected under 35 U.S.C. 102 (a)(1) as being anticipated by Tanaka et al. (JP01-183436 as provided for by applicant). Tanaka teaches a method for manufacturing a silica glass body comprising preheating a porous silica glass body (“preheat the preform” in example 1 on page 6), and placing the preheated porous silica glass body in a resonator (2nd passage on page 6) that resonates a microwave having a frequency band of 2GHz-4GHz (bottom of page 5), which falls within the claimed range of 1GHz to 30 GHz, to heat the porous silica glass body with the microwave (example 1 on page 6), wherein at least a part of the porous silica glass body contains an additive other than silicon and oxygen (top of page 6), wherein the porous silica body is preheated to a temperature equal to or higher than a glass transition temperature of the additive-added portion of the porous silica glass body in the preheating (i.e. 1500°C top passage on page 5), and wherein the porous silica glass with the additive is heated with the microwave in the heating with the microwave (example 1 on page 6). Regarding claim 10, Tanaka teaches the porous silica glass body is made with additives, such as fluorine (top of page 6) and inserting the doped porous silica glass body into the furnace for preheating (example 1 on page 6). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1-3 and 9 are rejected under 35 U.S.C. 103 as being unpatentable over Toko et al. (JP 2005-053740 as provided for by applicant) in view of Hu et al. (CN 104817264 as provided for by applicant). Toko discloses a method for manufacturing a silica glass body comprising preheating a porous silica glass body (second heat treatment [0027], [0045]), and placing the preheated porous silica glass body in microwave heating apparatus a microwave operating at a frequency band of 28GHz, which falls within the claimed range of 1GHz to 30 GHz ([0043]) to heat the porous silica glass body with the microwave (third heat treatment [0022], [0030]), wherein at least a part of the porous silica glass body contains an additive (i.e. fluorine) other than silicon and oxygen, wherein the porous silica body is preheated to a temperature equal to or higher than a glass transition temperature of the additive-added portion of the porous silica glass body in the preheating ([0028]), and wherein the porous silica glass with the additive is heated with the microwave in the heating with the microwave ([0030], [0046]). As mentioned, Toko teaches using microwave heating, but doesn’t specify a microwave resonator. Like Toko, Hu also teaches a method for heating a porous silica glass body in a microwave heating apparatus ([0011]). Hu teaches the microwave heating apparatus comprises a resonator that resonates microwaves ([0019], [0025]) at a frequency in the range of 0.3-300 GHz ([0015]), i.e. 2.4GHz ([0033]). Hu teaches such an arrangement of microwave heating can save energy and improve efficiency ([0014]), and allow for the power of the microwave generator be controlled ([0017]). Accordingly, it would have been obvious to one of ordinary skill in the art at the time of the invention to have employed a resonator for resonating microwave for the microwave heater of Toko, as it an efficient and controllable means of heating for porous silica glass bodies, as taught by Hu. Regarding claim 2, Toko teaches the additive is fluorine ([0027]), which is a halogen element. Regarding claim 3, Toko teaches the halogen element is added to the porous silica glass body as the additive in the preheating (i.e. fluoride gas [0027]). Regarding claim 9, Toko teaches the glass transition temperature is within the range of 800°C-1100°C ([0028]). Claim 4 is rejected under 35 U.S.C. 103 as being unpatentable over Toko et al. (JP 2005-053740 as provided for by applicant) and Hu et al. (CN 104817264 as provided for by applicant) as applied to claim 1 above, and further in view of Toko et al. (JP 2004115299 machine translation provided, which be referred to as Toko ‘299). Toko teaches the halogen element is added to the porous silica glass body as the additive by supplying a halogen compound gas into microwave heating apparatus in the preheating ([0045]). Hu further teaches the microwave heating apparatus comprises a core tube 3 including the resonator ([0025]) and supplying a gas into the core tube. Thus, in adopting a similar microwave heating apparatus for the method of Toko, the halogen element would be supplied into a core tube including the resonator. However Toko doesn’t specify supplying the halogen compound gas during heating with microwave. Toko ‘299 teaches in another reference a method for producing a silica glass body comprising heating a porous silica glass body with microwave energy while flowing a dopant gas during heating and vitrification ([0010]-[0011], [0027]-[0028]). Toko ‘299 teaches this provides for a homogenous silica glass body due to uniform heating ([0023]) with a uniform refractive index distribution ([0025]). Accordingly, it would have been obvious to one of ordinary skill in the art at the time of the invention to have supplied the halogen element (dopant) in the preheating and heating steps, when microwave heating is being used, so as to provide for uniform doping and heating of the porous glass body. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to QUEENIE S DEHGHAN whose telephone number is (571)272-8209. The examiner can normally be reached Monday-Friday 8:00-4:30. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Alison Hindenlang can be reached at 571-270-7001. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /QUEENIE S DEHGHAN/Primary Examiner, Art Unit 1741
Read full office action

Prosecution Timeline

Jul 03, 2024
Application Filed
Mar 13, 2026
Non-Final Rejection — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
62%
Grant Probability
73%
With Interview (+11.1%)
3y 5m
Median Time to Grant
Low
PTA Risk
Based on 839 resolved cases by this examiner. Grant probability derived from career allow rate.

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