Prosecution Insights
Last updated: October 02, 2026
Application No. 18/729,797

TRANSPARENT SUBSTRATE PROVIDED WITH A FUNCTIONAL STACK OF THIN LAYERS

Final Rejection §103§DOUBLEPATENT
Filed
Feb 19, 2025
Priority
Jan 27, 2022 — FR FR2200706 +1 more
Examiner
KHAN, TAHSEEN
Art Unit
1781
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Compagnie de Saint-Gobain S.A.
OA Round
2 (Final)
62%
Grant Probability
Moderate
3-4
OA Rounds
1y 8m
Est. Remaining
82%
With Interview

Examiner Intelligence

Grants 62% of resolved cases
62%
Career Allowance Rate
584 granted / 947 resolved
-3.3% vs TC avg
Strong +20% interview lift
Without
With
+20.5%
Interview Lift
resolved cases with interview
Typical timeline
3y 3m
Avg Prosecution
63 currently pending
Career history
997
Total Applications
across all art units

Statute-Specific Performance

§101
0.3%
-39.7% vs TC avg
§103
71.1%
+31.1% vs TC avg
§102
13.6%
-26.4% vs TC avg
§112
6.4%
-33.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 947 resolved cases

Office Action

§103 §DOUBLEPATENT
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Response to Amendment The Examiner acknowledges the remarks and amendments filed on 6/26/26. Claim 21 is newly added. Claim 1 has been amended. Claims 1-21 are pending. Double Patenting The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969). A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA . A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b). The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13. The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA /25, or PTO/AIA /26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer. Claim 1 is provisionally rejected on the ground of nonstatutory double patenting as being unpatentable over claim 1 of copending Application No. 18729809 (reference application). Although the claims at issue are not identical, they are not patentably distinct from each other because the copending claim teaches all of the claimed limitations of instant Claim 1. This is a provisional nonstatutory double patenting rejection because the patentably indistinct claims have not in fact been patented. Claim 1 is provisionally rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-20 of copending Application No. 18860318 (reference application). Although the claims at issue are not identical, they are not patentably distinct from each other because the copending claim teaches all of the claimed limitations of instant Claim 1. This is a provisional nonstatutory double patenting rejection because the patentably indistinct claims have not in fact been patented. Claim 1 is provisionally rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-20 of copending Application No. 18721530 (reference application). Although the claims at issue are not identical, they are not patentably distinct from each other because the copending claim teaches all of the claimed limitations of instant Claim 1. This is a provisional nonstatutory double patenting rejection because the patentably indistinct claims have not in fact been patented. Claim 1 is provisionally rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-20 of copending Application No. 18729779 (reference application). Although the claims at issue are not identical, they are not patentably distinct from each other because the copending claim teaches all of the claimed limitations of instant Claim 1. This is a provisional nonstatutory double patenting rejection because the patentably indistinct claims have not in fact been patented. Claim 1 is provisionally rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-20 of copending Application No. 18860342 (reference application). Although the claims at issue are not identical, they are not patentably distinct from each other because the copending claim teaches all of the claimed limitations of instant Claim 1. This is a provisional nonstatutory double patenting rejection because the patentably indistinct claims have not in fact been patented. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claim(s) 1-8, 11, and 15-21 is/are rejected under 35 U.S.C. 103 as being unpatentable over Hecq USPN_7005182_B1 in view of Guimard EP_3421439_A1. 1. Regarding Claims 1-3, 5, 8, 15, 16, and 21, Hecq discloses a clear (corresponds to claimed transparent) glass substrate (column 5, lines 1-2) having on one of its main surfaces a stack of thin layers consisting of the following layers, starting from the glass substrate: a first tin oxide (corresponds to claimed first dielectric module), a tungsten oxide coating (corresponds to claimed absorbent layer), and a titanium nitride coating or another thin tin oxide (corresponds to claimed second dielectric module) (column 5, lines 3-25; column 6, lines 20-23; column 14, lines 14-34); as is being claimed in instant Claims 1, 5, and 8. Hecq discloses that said tungsten oxide coating (corresponds to claimed absorbent layer) contains sodium (corresponds to a doping element) (column 14, lines 14-34), but does not disclose the use of cesium as its dopant. 2. Guimard teaches a glass substrate having a near infrared absorbing coating that can comprise doped tungsten oxide particles (Claims 1 and 2), which is similar to Hecq’s use of said tungsten oxide layer. Guimard discloses using cesium as a dopant for its tungsten oxide as CsxWyOz wherein 0.001≤x/y≤1 and 2.2≤z/y≤3.0 (paragraph 0016) as part of a substrate used in automotive glazings (paragraphs 0002, 0042). Thus, the molar ratio of Ce to W disclosed encompasses the claimed range of instant Claims 1, 15, and 16. Guimard states that its objective is to provide improved near infrared absorbing coatings that are more compatible with sputtering methods (paragraph 0005). Hecq also uses sputtering methods (column 4, lines 25-42). 3. It would have been obvious to one of ordinary skill in the art at the time the invention was filed to modify the Na dopant, of Hecq, by trying the use of cesium in the molar ratio of Cs to W, of Guimard. One of ordinary skill in the art would have been motivated in trying to see the improvements that can be derived from the use of other similar group 1 alkali metal dopants, such as Cs, at the stated molar ratio within the endeavor of glazings used in automotive applications. Finally, the remaining percent of tungsten in the layer would be greater than 70%, as is being claimed in instant Claim 21. 4. Regarding Claims 4 and 17, Hecq in view of Guimard suggests wherein said tungsten oxide coating (corresponds to claimed absorbent layer) has a thickness of 15 nm to 500 nm (Hecq column 5, lines 3-25). 5. Regarding Claims 6 and 7, Hecq in view of Guimard suggests having a stacking of nitride layers (Hecq column 5, lines 23-25). The remaining limitations of instant Claim 7 have been taught under the rejection of instant Claim 1 above. 6. Regarding Claim 11, Hecq in view of Guimard suggests using magnetron sputtering methods (Guimard: paragraph 0005). 7. Regarding Claims 18-20, Hecq in view of Guimard suggests using tin oxide (Guimard: paragraph 0005) or silicon zirconium nitride (Guimard: paragraph 0020). Claim(s) 9, 10, 12, and 14 is/are rejected under 35 U.S.C. 103 as being unpatentable over Hecq USPN_7005182_B1 in view of Guimard EP_3421439_A1, as applied to Claims 1-8, 11, and 15-20, and further in view of Kamimori USPN_4338000. 8. Regarding Claim 9, Hecq in view of Guimard does not suggest the claimed laminated glass. 9. Kamimori discloses window glass for cars (column 1, lines 14-20) comprising a first transparent plate (corresponds to claimed first transparent substrate), an interlayer having adhesive contact (column 2, lines 20-21), a tungsten oxide film, and a second transparent plate (corresponds to claimed second transparent substrate) (Abstract). 10. It would have been obvious to one of ordinary skill in the art at the time the invention was filed to modify the automotive glazing, of Hecq in view of Guimard, by trying the setup of the glass automotive window, of Kamimori. One of ordinary skill in the art would have been motivated in doing so in order to further the utility of its invention in other like automotive glass applications. 11. Regarding Claim 10, Hecq in view of Guimard and further in view of Kamimori suggests a coloring of the substrate glass (Hecq: Title). 12. Regarding Claims 12 and 14, Hecq in view of Guimard and further in view of Kamimori suggests a deposition temperature as low as 20°C and a pressure of 1 to 5X10-5 torr (Kamimori: column 3, lines 43-47). Claim(s) 13 is/are rejected under 35 U.S.C. 103 as being unpatentable over Hecq USPN_7005182_B1 in view of Guimard EP_3421439_A1, as applied to Claims 1-8, 11, and 15-20, and in view of Meyer USPN_6440592_B1. 13. Regarding Claim 13, Hecq in view of Guimard does not disclose the claimed atmospheric condition. 14. Meyer discloses forming windows (column 1, lines 1-5) comprising tungsten (abstract) having an argon to oxygen ratio of 0.15 (column 5, lines 45-50). 15. It would have been obvious to one of ordinary skill in the art at the time the invention was filed to modify the argon to oxygen ratio, of Hecq in view of Guimard, by using the ratio, of Meyer. One of ordinary skill in the art would have been motivated in selecting a ratio that is used in the same field of endeavor. Response to Arguments Applicant's arguments filed 6/26/26 have been fully considered but they are not persuasive. Applicants state on page 4: “Accordingly, the x/y ratio of Guimard paragraph [0016] defines the elemental composition of an individual cesium-doped tungsten oxide nanoparticle, and not the molar ratio of cesium to tungsten in the absorbent layer required by claim 1.” The Examiner respectfully submits that under broadest reasonable interpretation, the instant claim describes the stoichiometry of the doped tungsten oxide compound itself, exactly what Guimard expresses as CsxWyOz. Doping levels are always expressed as the x/y ratio within the compound formula in this art, not as some separate bulk layer measurement. Absent an express definition in the instant specification requiring the ratio to be measured as an aggregate across the whole layer (including the binder/resin), the Examiner maintains the current rejection. Moreover, Guimard’s disclosure is referring to the uniform distribution of said nanoparticles in the absorbing layer. While the resin in the layer does not itself contain any further cesium or tungsten. Since the only source providing the doped cesium tungsten is the nanoparticles, the aggregate molar ratio of Cs atoms to total W atoms across the whole layer is necessarily identical to the x/y ratio within the nanoparticles themselves. Conclusion THIS ACTION IS MADE FINAL. Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to TAHSEEN KHAN whose telephone number is (571)270-1140. The examiner can normally be reached Mondays-Saturdays 08:00AM-10:00PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Frank Vineis can be reached at 5712701547. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /TAHSEEN KHAN/Primary Examiner, Art Unit 1781 August 17, 2026
Read full office action

Prosecution Timeline

Feb 19, 2025
Application Filed
Apr 14, 2026
Non-Final Rejection mailed — §103, §DOUBLEPATENT
Jun 26, 2026
Response Filed
Aug 20, 2026
Final Rejection mailed — §103, §DOUBLEPATENT (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12747327
POLYESTER FILM FOR WINDOW ATTACHMENT, AND POLYESTER FILM LAYERED BODY FOR WINDOW ATTACHMENT
4y 6m to grant Granted Sep 29, 2026
Patent 12747191
COMPOSITE CERAMIC SUBSTRATE HAVING MULTI-LAYER CONFIGURATION
3y 1m to grant Granted Sep 29, 2026
Patent 12747537
CELLULOSIC FIBER MATERIAL AND PROCESS
2y 8m to grant Granted Sep 29, 2026
Patent 12746741
GLASS PANE OF A VEHICLE GLAZING HAVING A PRINT
2y 7m to grant Granted Sep 29, 2026
Patent 12747625
DOUBLE-PANE GLASS PANEL
2y 4m to grant Granted Sep 29, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

3-4
Expected OA Rounds
62%
Grant Probability
82%
With Interview (+20.5%)
3y 3m (~1y 8m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 947 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month