Prosecution Insights
Last updated: April 19, 2026
Application No. 18/747,466

SUBSTRATE PROCESSING METHOD

Final Rejection §102
Filed
Jun 19, 2024
Examiner
CARRILLO, BIBI SHARIDAN
Art Unit
1711
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Tes Co. Ltd.
OA Round
2 (Final)
62%
Grant Probability
Moderate
3-4
OA Rounds
2y 8m
To Grant
45%
With Interview

Examiner Intelligence

Grants 62% of resolved cases
62%
Career Allow Rate
470 granted / 759 resolved
-3.1% vs TC avg
Minimal -17% lift
Without
With
+-17.1%
Interview Lift
resolved cases with interview
Typical timeline
2y 8m
Avg Prosecution
44 currently pending
Career history
803
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
44.0%
+4.0% vs TC avg
§102
18.4%
-21.6% vs TC avg
§112
33.3%
-6.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 759 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1-2, 4, and 6-7 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Fukui et al. (US 2024/0096650A1; previously cited on PTO-892 of 9/17/2025). Re claim 1, Fukui et al. teach a substrate processing apparatus including a chamber 12 for treating a substrate W using a supercritical fluid, the method comprising, a pressurization operation in which the fluid is supplied into the chamber through a lower side 34 to pressurize the fluid to a predetermined process pressure (paragraphs 55-56), a process operation in which the fluid is supplied into the chamber and is simultaneously discharged from the chamber and the substrate is treated with supercritical fluid (paragraphs 62, 64). Specifically, paragraph 64 teaches when the processing chamber has reached the supercritical state, the second fluid supplier 22 flows through the area above the substrate and is then discharged from the fluid discharger 24. In reference to a depressurization operation, applicant is directed to paragraphs 62 and 64. In reference to the fluid being supplied only to the lower side of the chamber, applicant is directed to paragraph 53 which teaches that the fluid is supplied through first supply line 34. Re claim 2, after the fluid has reached a supercritical state (paragraphs 60 -64), a second time interval occurs in which valves V2, V3, V5-V6 are opened and the second fluid supplier 22 flows through the area above the substrate and valves V1 and V4 are closed, therefore no fluid is flowed through the lower side of the chamber. Re claim 4, the limitations of at least one first time interval and at least one second time interval alternately arranged are met since the prior art teaches supplying the fluid at the lower side of the chamber, followed by closing the supply of the fluid to the lower side of the chamber and supplying the fluid to the upper side of the fluid. Re claim 6, the claim is broadly interpreted as the pulse wave is a result of fluid being inside the chamber. Since Fukui et al. teach the fluid in the chamber, the limitations are inherently met. Additionally, the examiner argues that since Fukui et al. teach pressurization and depressurization of the chamber, the processing steps would inherently result in a pulse wave since Fukui et al. is performing the same steps as the instantly claimed invention. Re claim 7, the limitations are broadly interpreted as performing an exhaustion step, followed by supplying the fluid to the lower side of the chamber, the limitations of which are met since paragraph 79 teaches pressure lowering and pressure raising are repeatedly performed followed by an exhaust process. Response to Arguments 5. The rejection of the claims under 112, second paragraph is withdrawn in view of the newly amended claims. 6. The rejections of the claims as being anticipated and unpatentable over Heo are withdrawn and all arguments are deemed moot in view of the newly amended limitations. The prior art of Fukui et al. is relied upon to cure the deficiency. 7. Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. 8. Any inquiry concerning this communication or earlier communications from the examiner should be directed to Sharidan Carrillo whose telephone number is (571)272-1297. The examiner can normally be reached M-F, 7:00am-4:00pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Michael Barr can be reached at 571-272-1414. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. Sharidan Carrillo Primary Examiner Art Unit 1711 /Sharidan Carrillo/Primary Examiner, Art Unit 1711 bsc
Read full office action

Prosecution Timeline

Jun 19, 2024
Application Filed
Sep 14, 2025
Non-Final Rejection — §102
Dec 14, 2025
Response Filed
Feb 10, 2026
Final Rejection — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12589983
SYSTEMS AND METHODS FOR DISPENSING LIQUID THROUGH A PORTION OF AN ICE STORAGE BIN AND RELATED CLEANING PROCESSES
2y 5m to grant Granted Mar 31, 2026
Patent 12583727
AUTOMATED CLEANING SYSTEM FOR A BEVERAGE DISPENSER
2y 5m to grant Granted Mar 24, 2026
Patent 12571813
METHOD OF WASHING A FLUIDIC SYSTEM OF AN IN-VITRO DIAGNOSTIC ANALYZER
2y 5m to grant Granted Mar 10, 2026
Patent 12564868
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
2y 5m to grant Granted Mar 03, 2026
Patent 12564475
APPARATUS AND SYSTEM FOR CLEANING LENS OF EYE-IMAGING DEVICE AND RELATED METHODS THEREOF
2y 5m to grant Granted Mar 03, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

AI Strategy Recommendation

Get an AI-powered prosecution strategy using examiner precedents, rejection analysis, and claim mapping.
Powered by AI — typically takes 5-10 seconds

Prosecution Projections

3-4
Expected OA Rounds
62%
Grant Probability
45%
With Interview (-17.1%)
2y 8m
Median Time to Grant
Moderate
PTA Risk
Based on 759 resolved cases by this examiner. Grant probability derived from career allow rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month