Prosecution Insights
Last updated: October 04, 2026
Application No. 18/787,526

GAS ANALYZING APPARATUS AND CONTROL METHOD

Non-Final OA §102
Filed
Jul 29, 2024
Priority
Jan 29, 2021 — JP 2021-013409 +2 more
Examiner
MASKELL, MICHAEL P
Art Unit
Tech Center
Assignee
Atonarp Inc.
OA Round
1 (Non-Final)
86%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
95%
With Interview

Examiner Intelligence

Grants 86% — above average
86%
Career Allowance Rate
935 granted / 1086 resolved
+26.1% vs TC avg
Moderate +9% lift
Without
With
+9.2%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 2m
Avg Prosecution
15 currently pending
Career history
1092
Total Applications
across all art units

Statute-Specific Performance

§101
4.3%
-35.7% vs TC avg
§103
41.8%
+1.8% vs TC avg
§102
35.7%
-4.3% vs TC avg
§112
13.9%
-26.1% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1086 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 2 and 5 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Makarov, et al (U.S. Patent 11,133,162 B2). Regarding claim 2, Makarov discloses a gas analyzing apparatus comprising: A plasma generator (65) and an electron impact ion source (110) as ionization devices that are configured to generate an ion flow of a sample gas; An analyser (100) that is configured to analyze the ion flow supplied from the ionization devices (Fig. 1); A first sample inlet (30) that is configured to supply the sample gas to the plasma generator; and A second sample inlet (75) that is configured to supply the sample gas to the electron impact ion source. Regarding claim 5, Makarov discloses a split-flow type exhaust system that includes a first stage to supply a negative pressure to a chamber of the plasma generator and a second stage to exhaust gas from the analyzer (column 7, lines 34-37). Allowable Subject Matter Claims 6-8 are allowed. The following is an examiner’s statement of reasons for allowance: The prior art fails to teach opening, when an internal pressure of the process chamber is high, the first sample inlet, closing the second sample inlet, deactivating the electron impact ion source and generating a plasma by the plasma generator; and closing, when the internal pressure of the process chamber is low, the first sample inlet, opening the second sample inlet, and activating the electron impact ion source. Makarov does not teach closing either the first inlet or the second inlet at any time; in fact, if either inlet were to be closed in Makarov’s apparatus, no sample would reach the analyzer and the apparatus would not work. Claims 3 and 4 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: The prior art fails to teach the apparatus further comprising a controller that is configured to switch the first sample inlet and the second sample inlet. As described above, closing either sample inlet in Makarov’s apparatus would render it non-functional.. Any comments considered necessary by applicant must be submitted no later than the payment of the issue fee and, to avoid processing delays, should preferably accompany the issue fee. Such submissions should be clearly labeled “Comments on Statement of Reasons for Allowance.” Any inquiry concerning this communication or earlier communications from the examiner should be directed to MICHAEL P MASKELL whose telephone number is (571)270-3210. The examiner can normally be reached M-F 10A-6P. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Georgia Epps can be reached at 571-272-2328. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /MICHAEL MASKELL/Primary Examiner, Art Unit 2878 08 August 2026
Read full office action

Prosecution Timeline

Jul 29, 2024
Application Filed
Aug 12, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12744179
Sample Holder and Analysis System
2y 10m to grant Granted Sep 22, 2026
Patent 12742677
All-Optical Epsilon-Near-Zero Enabled Streak Camera
2y 4m to grant Granted Sep 22, 2026
Patent 12738452
METHOD FOR OPERATING A PARTICLE BEAM MICROSCOPE
2y 6m to grant Granted Sep 15, 2026
Patent 12731753
Energy Filter Assembly for Ion Implantation System with at least one coupling element
3y 2m to grant Granted Sep 08, 2026
Patent 12717188
A METHOD FOR DERIVING A SURFACE PROFILE OF A FREE-FORM MASTER LENS FOR PATTERNING PHOTO-ALIGNMENT LAYERS OF PLANAR OPTICAL COMPONENTS
2y 6m to grant Granted Aug 25, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2
Expected OA Rounds
86%
Grant Probability
95%
With Interview (+9.2%)
2y 2m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1086 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month