Prosecution Insights
Last updated: April 19, 2026
Application No. 18/812,736

IMAGE RENDERING METHOD AND DEVICE

Non-Final OA §102§103
Filed
Aug 22, 2024
Examiner
CHU, DAVID H
Art Unit
2616
Tech Center
2600 — Communications
Assignee
Smarter Silicon (Shanghai) Technologies Co. Ltd.
OA Round
1 (Non-Final)
78%
Grant Probability
Favorable
1-2
OA Rounds
2y 9m
To Grant
81%
With Interview

Examiner Intelligence

Grants 78% — above average
78%
Career Allow Rate
532 granted / 682 resolved
+16.0% vs TC avg
Minimal +3% lift
Without
With
+2.7%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
32 currently pending
Career history
714
Total Applications
across all art units

Statute-Specific Performance

§101
9.8%
-30.2% vs TC avg
§103
57.8%
+17.8% vs TC avg
§102
18.1%
-21.9% vs TC avg
§112
5.5%
-34.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 682 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1, 2, 4, 10, 11 and 13 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Akenine-Moller et al. (PGPUB Document No. US 2017/0345206, hereinafter referred to as “Moller”). Regarding claim 10, Moller teaches an image rendering device comprising computer readable storage medium storing computer instructions, when executed by one or more processors, the computer instructions implement an image rendering method, comprising: Receiving one or more input models (object that is to be rendered such as character model 1302 (Moller: 0120)); Filtering the one or more input models to obtain one or more filtered input models, a plurality of filtering parameters used in the filtering being established based on data that have an input model already been eliminated in a rendered image frame (“the invention records a bitmask when performing an occlusion query, where one bit per tile (e.g., a tile of 8×8 pixels) is stored. During the occlusion query the bitmask is initialized so that each bit indicates whether the proxy is fully occluded in that tile. The bitmask is used later, when rendering the detailed geometry (i.e., the contained draw call), to efficiently remove work in tiles where we know the detailed geometry will be fully occluded.” The bitmask essentially is filtering the input (Moller: 0118)); And rendering a current image frame based on the one or more filtered input models (the resulting final rendered image frame 1640 (Moller: 0137)). Regarding claim 11, Moller teaches the image rendering device of claim 10, wherein a method for establishing the filtering parameters includes: Establishing initial filtering parameters corresponding to the input model (the bitmask is initialized so that each bit indicates whether the proxy is fully occluded in that tile (Moller: 0118)); Filtering the input model using the initial filtering parameters, and using the filtered input model for image rendering (The bitmask is used later, when rendering the detailed geometry (i.e., the contained draw call), to efficiently remove work in tiles where we know the detailed geometry will be fully occluded (Moller: 0118)); And updating the corresponding filtering parameters based on the data of the input model that has already been eliminated during the image rendering process (the occlusion query comprises of the step of the HiZ-test updating the OQ mask buffer and OQ mask register based on whether a tile is occluded or not (Moller: 0132, FIG.14)), and performing image rendering on a subsequent image frame based on the updated filtering parameters (predicated draw calls 1630 which generate the final rendered image frames 1640, use the information from the bitmask 1615 to ignore tiles which are fully occluded (Moller: 0137)). Regarding claim 13, Moller teaches the image rendering device of claim 11, wherein updating the corresponding filtering parameters based on the data of the input model that has already been eliminated during the image rendering process includes: Updating the corresponding filtering parameters using the data of the input module that has already been eliminated during one of more first processes (in FIG. 14, in response to an occlusion query at 1400, each tile overlapping the proxy geometry is selected at 1401 and an HiZ test is performed using the tile at 1402. Results of the HiZ test 1402 are stored in the occlusion query (0Q) mask buffer at 1404. For example, if the tile is fully occluded, then a 1 will be stored for that tile within the OQ mask buffer 1404. In contrast, if the tile is partially occluded or not occluded, then a 0 will be stored within the OQ mask buffer. In addition, at 1403, an OQ register may be updated as well (Moller: 0132)), The one or more first process including one or more of a backface culling process, a frustum culling process, and a rasterization culling process (the culling of Moller pertain to the rasterization process (Moller: FIG.15, FIG.16, 0134)). Claim(s) 1, 2 and 4 are corresponding method claim(s) of claim(s) 10, 11 and 13. The limitations of claim(s) 1, 2 and 4 are substantially similar to the limitations of claim(s) 10, 11 and 13. Therefore, it has been analyzed and rejected substantially similar to claim(s) 1, 2 and 4. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 3 and 12 is/are rejected under 35 U.S.C. 103 as being unpatentable over Moller as applied to the claim(s) above, and further in view of Voorhies (US Patent No. 7995056). Regarding claim 12, Moller teaches the image rendering device of claim 11, wherein updating the corresponding filtering parameters based on the data of the input model that has already been eliminated during the image rendering process includes: Updating the corresponding filtering parameters when the data of the input model that has been eliminated in the current image frame meets a threshold condition (“Results of the HiZ test 1402 are stored in the occlusion query (OQ) mask buffer at 1404. For example, if the tile is fully occluded, then a 1 will be stored for that tile within the OQ mask buffer 1404. In contrast, if the tile is partially occluded or not occluded, then a 0 will be stored within the OQ mask buffer. In addition, at 1403, an OQ register may be updated as well” (Moller: 0132)). However, Moller does not expressly teach but Voorhies teaches the threshold condition being related to a probability of the data being eliminated in the subsequent image frame after the current image frame (The occlusion assessment metric provides an indication of the probability that an image is "occluded" by the culling data and a pixel associated with the image can be eliminated early in a pipeline (Voorhies: col.3, line 62 – 66)). Therefore, before the effective filing date of the claimed invention, it would have been obvious to one of an ordinary skill in the art to modify the teachings of Moller such as to implement the assessment metric of Voorhies, because this enables added efficiency by implementing a probabilistic metric over the binary occlusion of Moller. Claim 3 is similar in scope to claim 12. Therefore, the rejection to claim 3 similarly apples to claim 3. Allowable Subject Matter Claims 5-9 and 14-18 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to David H Chu whose telephone number is (571)272-8079. The examiner can normally be reached M-F: 9:30 - 1:30pm, 3:30-8:30pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Daniel F Hajnik can be reached at (571) 272-7642. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DAVID H CHU/Primary Examiner, Art Unit 2616
Read full office action

Prosecution Timeline

Aug 22, 2024
Application Filed
Feb 20, 2026
Non-Final Rejection — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
78%
Grant Probability
81%
With Interview (+2.7%)
2y 9m
Median Time to Grant
Low
PTA Risk
Based on 682 resolved cases by this examiner. Grant probability derived from career allow rate.

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