Prosecution Insights
Last updated: April 19, 2026
Application No. 18/838,727

METHOD FOR PRODUCING GLASS SHEET

Non-Final OA §103§112
Filed
Aug 15, 2024
Examiner
LEE, STEVEN SHIH-CHING
Art Unit
1741
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Nippon Electric Glass Co., Ltd.
OA Round
1 (Non-Final)
65%
Grant Probability
Favorable
1-2
OA Rounds
3y 1m
To Grant
86%
With Interview

Examiner Intelligence

Grants 65% — above average
65%
Career Allow Rate
109 granted / 167 resolved
At TC average
Strong +20% interview lift
Without
With
+20.5%
Interview Lift
resolved cases with interview
Typical timeline
3y 1m
Avg Prosecution
31 currently pending
Career history
198
Total Applications
across all art units

Statute-Specific Performance

§101
1.9%
-38.1% vs TC avg
§103
53.0%
+13.0% vs TC avg
§102
12.6%
-27.4% vs TC avg
§112
29.6%
-10.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 167 resolved cases

Office Action

§103 §112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Objections Claims 2-6 objected to because of the following informalities: The preamble of claims 2-6 should change “a glass sheet” to “the glass sheet” Appropriate correction is required. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claim 6 is rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Claim 6 requires antecedent basis that “the present formation part has penetrated”. It is not clear what this penetration entails. Parent claim 1 only requires irradiation with laser light. Is the penetration with regards to the irradiation? Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claims 1 and 4-6 is rejected under 35 U.S.C. 103 as being unpatentable over Cui et al (CN-113045209-A, English translation provided by Espacenet) and further in view of Upton (US-3982917-A). Regarding claim 1, Cui teaches a method of manufacturing a glass sheet having a first main surface, a second main surface, and a through hole (Line 130, flat glass having a first main surface and a second main surface with a through hole) that penetrates between the first main surface and the second main surface (Fig. 3-4), the method comprising: a modification step of modifying a preset formation part for the through hole by irradiation with laser light (Line 47, 100-102); and a through hole formation step of forming the through hole in the preset formation part after the modification step (Line 49-53), wherein the through hole formation step comprises: an etching step of etching the glass sheet with an etchant (Line 49). Cui teaches of a removal step of removing residue and residual etchant from the etched glass (Line 52-53). Cui does not expressly teach the residue is a precipitate from etching process. In related etching of glass art, Upton teaches of etching the glass with an etchant (Col. 3 Line 5-10) in which a precipitate is formed when the glass is taken out of the etchant (Col. 3 Line 10-12 ) and the precipitates are removed (Col. 3 Line 12-13). It would be obvious to one of ordinary skill in the art before the effective filing date of the invention that etching glass forms a precipitate when taken out of the etchant in which the skilled artisan would require the removal of the precipitate as a known technique to physically strengthen glass and resist thermal shock (Col. 2 Line 65-69; Col. 3 Line 36-39). Regarding claim 4/6, depending from claim 1, modified Cui incorporates the precipitate washing/removal taught by Upton wherein Upton performs the etching step and the precipitate removal step a plurality of times (Col. 3 Line 23-27), wherein Upton teaches of etching and precipitate removal between a first etching step and a second etching step (Upton Col. 3 Line 26-28). Regarding claim 5, depending from claim 1, Cui teaches that the through hole formation step comprises preforming the precipitate removal step (Line 207-209; and optionally drying precipitate removed glass). Claims 2-3 is rejected under 35 U.S.C. 103 as being unpatentable over Cui et al (CN-113045209-A) and Upton (US-3982917-A) and further in view of Salzle (US-4332649-A). Regarding claim 2, depending from claim 1, modified Cui relies on the etching and precipitate removal taught by Upton which teaches the precipitate is removed by rinsing with water (Col. 3 Line 24-28). Modified Cui does not expressly teach the precipitate removal step comprises removing the precipitate through use of an acid solution. In related etching of glass art, Salzle teaches of first etching glass and the precipitate reaction that adheres to the surface of the glass (Col. 2 Line 48-54) and removing the precipitate by using a sulfuric acid washing (Col. 5 Line 19-21; 50-53). It would be obvious to one of ordinary skill in the art before the effective filing date of the invention to use an acid solution to wash and remove the precipitate formed after etching the glass as a known technique in the art (Col. 2 Line 27-36). Regarding claim 3, depending from claim 2, modified Cui relies on the sulfuric acid solution (Col. 5 Line 19-21; 50-53) taught by Salzle to remove the precipitate form on an etched glass (Col. 2 Line 27-36; 48-54). Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. WO-2021092361-A1, US-202000354262-A1 teaches irradiating a damage track, HF etching forming a precipitate, combining HF with HCl/HNO3/H2SO4 to the HF etching solution to reduce the precipitate reaction CN-110573470-A teaches using laser drilling and a HF/HNO3 etchant CN-110156338-A teaches an acid etching solution comprising HF/HCl/HNO3/H2SO4 US-20190107751-A1 teaches of using HF with either HCl or H2SO4 for an etching solution and use a H2SO4 solution to remove precipitates from the etching solution CN-105924016-A teaches adding HCl and/or H2SO4 to a HF etching solution so precipitate would not form on the glass US-20110079931-A teaches of first pre-treating glass with HCl/HNO3/H2SO4 followed by a HF etch CN-1891651-A teaches of a HF/HNO3 etching solution followed by an alkaline washing step US-20020067459-A1 teaches adding sulfuric acid to a HF etching solution suppresses precipitation on the glass JP-2000313629-A teaches laser irradiating a target area that precipitates after etching, the precipitated region is etched away Any inquiry concerning this communication or earlier communications from the examiner should be directed to STEVEN S LEE whose telephone number is (571)272-2645. The examiner can normally be reached 9am - 5pm Mon-Thurs. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Alison Hindenlang can be reached at 571-270-7001. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /STEVEN S LEE/Examiner, Art Unit 1741 /ERIN SNELTING/Primary Examiner, Art Unit 1741
Read full office action

Prosecution Timeline

Aug 15, 2024
Application Filed
Mar 15, 2026
Non-Final Rejection — §103, §112 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
65%
Grant Probability
86%
With Interview (+20.5%)
3y 1m
Median Time to Grant
Low
PTA Risk
Based on 167 resolved cases by this examiner. Grant probability derived from career allow rate.

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