Prosecution Insights
Last updated: July 17, 2026
Application No. 18/889,125

HIGH INTENSITY PULSE LASER GENERATION SYSTEM AND METHOD

Non-Final OA §DP
Filed
Sep 18, 2024
Priority
Dec 22, 2022 — continuation of 11/784,454 +1 more
Examiner
CHUNG, DAVID Y
Art Unit
Tech Center
Assignee
Blue Laser Fusion Inc.
OA Round
1 (Non-Final)
70%
Grant Probability
Favorable
1-2
OA Rounds
1y 0m
Est. Remaining
78%
With Interview

Examiner Intelligence

Grants 70% — above average
70%
Career Allowance Rate
493 granted / 707 resolved
+9.7% vs TC avg
Moderate +8% lift
Without
With
+7.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 10m
Avg Prosecution
29 currently pending
Career history
739
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
84.3%
+44.3% vs TC avg
§102
10.2%
-29.8% vs TC avg
§112
2.0%
-38.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 707 resolved cases

Office Action

§DP
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Objections Claim 15 is objected to because of the following informalities: “103 times” should be changed to --103 times--. Appropriate correction is required. Double Patenting The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969). A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA . A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b). The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13. The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA /25, or PTO/AIA /26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer. Claims 1-21 rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-20 of U.S. Patent No. 12,119,609. As to claim 1 of the instant application, claim 1 of U.S. Patent No. 12,119,609 recites A high intensity pulse laser generation system, the system comprising: an optical cavity, the optical cavity being configured to increase an intensity of a laser beam comprising a pulse from a first energy power intensity to a second higher energy power intensity propagating on a first optical path configured within the optical cavity by circulating or reciprocating at least a portion of the laser beam from a light source having a pulse energy power of 0.01 Joule to 1 Mega Joule on the first optical path; an optical path modification device coupled to the optical cavity, the optical path modification device configured to repeatedly change a spatial direction of the laser beam propagating on the first optical path at a predetermined timing to cause the laser beam propagating on the first optical path to change a direction from the first optical path to a second optical path that is outside of the first optical path thereby the optical path modification device is configured to propagate the laser beam on the second optical path generating a high intensity pulse laser beam; at least a pair of mirror devices, each of the mirror devices having a mirror surface area of 1 cm2 and 10000 cm2, and configured with the optical path modification device and provided within the first optical path, at least one the mirror devices configured to change a spatial position of the mirror device being coupled to the laser beam; a timing device configured with the optical path modification device and having a predetermined frequency to adjust the spatial position of the mirror device, the timing device being configured to adjust the spatial position of the mirror device after a predetermined number of cycles associated with the circulating or reciprocating of the laser beam propagating between at least the pair of mirrors such that each cycle of the laser beam progressively increases an intensity from the first energy power intensity to the second energy power intensity to an Nth energy power intensity, where N is an integer greater than 2, to the high intensity pulse laser beam on the second optical path; an spatial driver device coupled to the timing device and the one mirror device, the spatial driver device being configured to adjust the spatial position of the mirror device by changing a thickness of a volume structure by an expansion or contraction process to move the spatial position of the mirror device from a first position to a second position after the predetermined number of cycles. As to claim 2 of the instant application, claim 2 of U.S. Patent No. 12,119,609 recites wherein the spatial driver device comprising a magneto-strictive material that is in mechanical contact with a backside of the mirror devices that is adjusted or monolithically integrated with the backside of the mirror device. Although the patented claim recites a magneto-strictive material instead of a piezo material, such materials were art recognized equivalents. As to claim 3 of the instant application, claim 3 of U.S. Patent No. 12,119,609 recites wherein the mechanical contact is made using a surface region of the magneto-strictive material and a backside of the mirror device, the mechanical contact between the surface region of the magneto-strictive material and the backside surface are substantially matched in area. Although the patented claim recites a magneto-strictive material instead of a piezo material, such materials were art recognized equivalents. As to claim 4 of the instant application, claim 4 of U.S. Patent No. 12,119,609 recites wherein the change of thickness of the volume structure is spatially changed along a plane of the magneto-strictive material parallel to and facing a backside of the mirror device by modulating a magnetic field spatially with and coupled to the magnetic strictive material such that the mirror device is configured to tilt from a first angle to a second angle measured from a direction normal to the mirror surface area of the mirror device. Although the patented claim recites a magneto-strictive material instead of a piezo material, such materials were art recognized equivalents. As to claim 5 of the instant application, claim 5 of U.S. Patent No. 12,119,609 recites wherein the spatial driver device is configured to move the mirror device. As to claim 6 of the instant application, claim 6 of U.S. Patent No. 12,119,609 recites wherein the pair of mirrors comprise, respectively, a first flat mirror device and a second mirror device, the flat mirror being adjusted with the magneto-strictive material, and the second mirror device is configured with the first mirror device to change the direction of the laser beam from the first optical path to the second optical path. As to claim 7 of the instant application, claim 7 of U.S. Patent No. 12,119,609 recites wherein the second mirror device is a curved mirror device. As to claim 8 of the instant application, claim 8 of U.S. Patent No. 12,119,609 recites wherein the laser beam has a wavelength range from 1020 nm to 1070 nm. As to claim 9 of the instant application, claim 9 of U.S. Patent No. 12,119,609 recites wherein the optical path modification device changes an orientation of the mirror device in a time of less than 2 microseconds. As to claim 10 of the instant application, claim 10 of U.S. Patent No. 12,119,609 recites wherein each of the mirror devices has a reflectance to the laser beam of 99.9% or more. As to claim 11 of the instant application, claim 11 of U.S. Patent No. 12,119,609 recites wherein each of the mirror devices comprises a dielectric multilayer mirror surface that includes a fluorine compound. As to claim 12 of the instant application, claim 12 of U.S. Patent No. 12,119,609 recites wherein the laser beam from the light source comprises a pulsed laser with a frequency of more than 100 kHz. As to claim 13 of the instant application, claim 13 of U.S. Patent No. 12,119,609 recites wherein the laser beam from the light source is a single-mode laser. As to claim 14 of the instant application, claim 14 of U.S. Patent No. 12,119,609 recites wherein the light source comprises a semiconductor laser light source containing an AlInGaN-based compound. As to claim 15 of the instant application, claim 15 of U.S. Patent No. 12,119,609 recites wherein the pulse intensity of laser beam generated is at least 103 times greater than a pulse intensity of the laser beam from the light source. As to claim 16 of the instant application, claim 16 of U.S. Patent No. 12,119,609 recites A high intensity pulse laser generation system, the system comprising: an optical cavity maintained in a vacuum, the optical cavity being configured to increase an intensity of a laser beam comprising a pulse from a first energy power intensity to a second higher energy power intensity propagating on a first optical path configured within the optical cavity by circulating or reciprocating at least a portion of the laser beam from a light source on the first optical path; an optical path modification device coupled to the optical cavity, the optical path modification device configured to repeatedly change a spatial direction of the laser beam propagating on the first optical path at a predetermined timing ranging from 20 milliseconds to 3 seconds with the response time from 0.01 microsecond to 30 microseconds to cause the laser beam propagating on the first optical path to change a direction from the first optical path to a second optical path that is outside of the first optical path thereby the optical path modification device is configured to propagate the laser beam on the second optical path generating a high intensity pulse laser beam; at least a pair of mirror devices, each of the mirror devices having a mirror surface area of 1 cm2 and 10000 cm2, and configured with the optical path modification device and provided within the first optical path, at least one the mirror devices configured to change a spatial position of the mirror device being coupled to the laser beam; a timing device configured with the optical path modification device and having a predetermined frequency to adjust the spatial position of the mirror device, the timing device being configured to adjust the spatial position of the mirror device after a predetermined number of cycles associated with the circulating or reciprocating of the laser beam propagating between at least the pair of mirrors such that each cycle of the laser beam progressively increases an intensity from the first energy power intensity to the second energy power intensity to an Nth energy power intensity, where N is an integer greater than 2, to the high intensity pulse laser beam on the second optical path; and a driver device coupled to the timing device and the one mirror device, the driver device being configured to adjust the spatial position of the mirror device to move the spatial position of the mirror device from a first position to a second position after the predetermined number of cycles. As to claim 17 of the instant application, claim 17 of U.S. Patent No. 12,119,609 recites wherein the adjustment in spatial position is provided such that the mirror device is configured to tilt from a first angle to a second angle measured from a direction normal to the mirror surface area of the mirror device; wherein the first angle to the second angle ranges from 0.1 degree to 5 degrees. As to claim 18 of the instant application, claim 18 of U.S. Patent No. 12,119,609 recites wherein the adjustment of the spatial position is provided such that the mirror device changes a direction of the laser beam from the first optical path to the second optical path by changing a spatial location of an incidence of the laser beam on the mirror device from a first location of the mirror surface area to a second location of the mirror surface area. As to claim 19 of the instant application, claim 19 of U.S. Patent No. 12,119,609 recites A method of high intensity pulse laser generation system, the system comprising: in an optical cavity configured to increase an intensity of a laser beam comprising a pulse from a first energy power intensity to a second higher energy power intensity propagating on a first optical path configured within the optical cavity by circulating or reciprocating at least a portion of the laser beam from a light source having a output power of 0.01 Joule to 1 Mega Joule on the first optical path coupled to an optical path modification device coupled to the optical cavity, the optical path modification device configured to repeatedly change a spatial direction of the laser beam propagating on the first optical path at a predetermined timing to cause the laser beam propagating on the first optical path to change a direction from the first optical path to a second optical path that is outside of the first optical path thereby the optical path modification device is configured to propagate the laser beam on the second optical path generating a high intensity pulse laser beam and at least a pair of mirror devices configured with the optical path modification device and provided within the first optical path, at least one the mirror devices configured to change a spatial position of the mirror device being coupled to the laser beam; adjusting the spatial position of the mirror device using a timing device after a predetermined number of cycles associated with the circulating or reciprocating of the laser beam propagating between at least the pair of mirrors such that each cycle of the laser beam progressively increases an intensity from the first energy power intensity to the second energy power intensity to an Nth energy power intensity, where N is an integer greater than 2, to the high intensity pulse laser beam on the second optical path. As to claim 20 of the instant application, claim 20 of U.S. Patent No. 12,119,609 recites wherein at least one of the mirror devices comprises a deformable mirror surface. As to claim 21 of the instant application, claim 19 of U.S. Patent No. 12,119,609 does not recite wherein the optical path modification device comprising a piezo material configured on one of the mirror devices. However, it was well known to provide piezo material on the mirror devices in order to enable the optical path modification through spatial changes in the piezo material. Claims 1-21 rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-4, 6 and 8-22 of U.S. Patent No. 11,784,454. As to claim 1 of the instant application, claim 1 of U.S. Patent No. 11,784,454 recites A high intensity pulse laser generation system, the system comprising: an optical cavity maintained in a vacuum of 300 Torr and less and characterized by a length of free space of 50 meters to 10 kilometers, the optical cavity being configured to increase an intensity of a laser beam comprising a pulse from a first energy power intensity to a second higher energy power intensity propagating on a first optical path configured within the optical cavity by circulating or reciprocating at least a portion of the laser beam from a light source having a pulse energy power of 0.01 Joule to 1 Mega Joule on the first optical path; an optical path modification device coupled to the optical cavity, the optical path modification device configured to repeatedly change a spatial direction of the laser beam propagating on the first optical path at a predetermined timing ranging from 20 milliseconds to 3 seconds with the response time from 0.01 microsecond to 30 microseconds to cause the laser beam propagating on the first optical path to change a direction from the first optical path to a second optical path that is outside of the first optical path thereby the optical path modification device is configured to propagate the laser beam on the second optical path generating a high intensity pulse laser beam; at least a pair of mirror devices, each of the mirror devices having a mirror surface area of 1 cm2 and 10000 cm2, and configured with the optical path modification device and provided within the first optical path, at least one the mirror devices configured to change a spatial position of the mirror device being coupled to the laser beam; a timing device configured with the optical path modification device and having a predetermined frequency to adjust the spatial position of the mirror device, the timing device being configured to adjust the spatial position of the mirror device after a predetermined number of cycles associated with the circulating or reciprocating of the laser beam propagating between at least the pair of mirrors such that each cycle of the laser beam progressively increases an intensity from the first energy power intensity to the second energy power intensity to an Nth energy power intensity, where N is an integer greater than 2, to the high intensity pulse laser beam on the second optical path; an spatial driver device comprising a magneto-strictive material, the spatial driver device being coupled to the timing device and the one mirror device, the spatial driver device being configured to adjust the spatial position of the mirror device by changing a thickness of a volume structure ranging from 0.01 mm to 2 mm including the magneto-strictive material of the spatial driver device by an expansion or contraction process to move the spatial position of the mirror device from a first position to a second position after the predetermined number of cycles. As to claim 2 of the instant application, claim 2 of U.S. Patent No. 11,784,454 recites wherein the magneto-strictive material is in mechanical contact with a backside of the mirror devices that is adjusted or monolithically integrated with the backside of the mirror device. Although the patented claim recites a magneto-strictive material instead of a piezo material, such materials were art recognized equivalents. As to claim 3 of the instant application, claim 3 of U.S. Patent No. 11,784,454 recites wherein the mechanical contact is made using a surface region of the magneto-strictive material and a backside of the mirror device, the mechanical contact between the surface region of the magneto-strictive material and the backside surface are substantially matched in area. Although the patented claim recites a magneto-strictive material instead of a piezo material, such materials were art recognized equivalents. As to claim 4 of the instant application, claim 4 of U.S. Patent No. 11,784,454 recites wherein the change of thickness of the volume structure is spatially changed along a plane of the magneto-strictive material parallel to and facing a backside of the mirror device by modulating a magnetic field spatially with and coupled to the magnetic strictive material such that the mirror device is configured to tilt from a first angle to a second angle measured from a direction normal to the mirror surface area of the mirror device. Although the patented claim recites a magneto-strictive material instead of a piezo material, such materials were art recognized equivalents. As to claim 5 of the instant application, claim 6 of U.S. Patent No. 11,784,454 recites wherein the magneto-strictive material is configured to move the mirror device. As to claim 6 of the instant application, claim 8 of U.S. Patent No. 11,784,454 recites wherein the pair of mirrors comprise, respectively, a first flat mirror device and a second mirror device, the flat mirror being adjusted with the magneto-strictive material, and the second mirror device is configured with the first mirror device to change the direction of the laser beam from the first optical path to the second optical path. Although the patented claim recites a magneto-strictive material instead of a piezo material, such materials were art recognized equivalents. As to claim 7 of the instant application, claim 9 of U.S. Patent No. 11,784,454 recites wherein the second mirror device is a curved mirror device. As to claim 8 of the instant application, claim 10 of U.S. Patent No. 11,784,454 recites wherein the laser beam has a wavelength range from 1020 nm to 1070 nm. As to claim 9 of the instant application, claim 11 of U.S. Patent No. 11,784,454 recites wherein the optical path modification device changes an orientation of the mirror device in a time of less than 2 microseconds. As to claim 10 of the instant application, claim 12 of U.S. Patent No. 11,784,454 recites wherein each of the mirror devices has a reflectance to the laser beam of 99.9% or more. As to claim 11 of the instant application, claim 13 of U.S. Patent No. 11,784,454 recites wherein each of the mirror devices comprises a dielectric multilayer mirror surface that includes a fluorine compound. As to claim 12 of the instant application, claim 14 of U.S. Patent No. 11,784,454 recites wherein the laser beam from the light source comprises a pulsed laser with a frequency of more than 100 kHz. As to claim 13 of the instant application, claim 15 of U.S. Patent No. 11,784,454 recites wherein the laser beam from the light source is a single-mode laser. As to claim 14 of the instant application, claim 16 of U.S. Patent No. 11,784,454 recites wherein the light source comprises a semiconductor laser light source containing an AlInGaN-based compound. As to claim 15 of the instant application, claim 17 of U.S. Patent No. 11,784,454 recites wherein the pulse intensity of laser beam generated is at least 103 times greater than a pulse intensity of the laser beam from the light source. As to claim 16 of the instant application, claim 18 of U.S. Patent No. 11,784,454 recites A high intensity pulse laser generation system, the system comprising: an optical cavity maintained in a vacuum of 300 Torr and less and characterized by a length of free space of 50 meters to 10 kilometers, the optical cavity being configured to increase an intensity of a laser beam comprising a pulse from a first energy power intensity to a second higher energy power intensity propagating on a first optical path configured within the optical cavity by circulating or reciprocating at least a portion of the laser beam from a light source having a output power of 0.01 Joule to 1 Mega Joule on the first optical path; an optical path modification device coupled to the optical cavity, the optical path modification device configured to repeatedly change a spatial direction of the laser beam propagating on the first optical path at a predetermined timing ranging from 20 milliseconds to 3 seconds with the response time from 0.01 microsecond to 30 microseconds to cause the laser beam propagating on the first optical path to change a direction from the first optical path to a second optical path that is outside of the first optical path thereby the optical path modification device is configured to propagate the laser beam on the second optical path generating a high intensity pulse laser beam; at least a pair of mirror devices, each of the mirror devices having a mirror surface area of 1 cm.sup.2 and 10000 cm.sup.2, and configured with the optical path modification device and provided within the first optical path, at least one the mirror devices configured to change a spatial position of the mirror device being coupled to the laser beam; a timing device configured with the optical path modification device and having a predetermined frequency to adjust the spatial position of the mirror device, the timing device being configured to adjust the spatial position of the mirror device after a predetermined number of cycles associated with the circulating or reciprocating of the laser beam propagating between at least the pair of mirrors such that each cycle of the laser beam progressively increases an intensity from the first energy power intensity to the second energy power intensity to an Nth energy power intensity, where N is an integer greater than 2, to the high intensity pulse laser beam on the second optical path; and an spatial driver device comprising a magneto-strictive material or a piezo electric material, the spatial driver device being coupled to the timing device and the one mirror device, the spatial driver device being configured to adjust the spatial position of the mirror device by changing a thickness of a volume structure ranging from 0.01 mm to 2 mm including the magneto-strictive material or the piezo electric material of the spatial driver device by an expansion or contraction process to move the spatial position of the mirror device from a first position to a second position after the predetermined number of cycles. As to claim 17 of the instant application, claim 19 of U.S. Patent No. 11,784,454 recites wherein the change of thickness of the volume structure is spatially changed along a plane of the magneto-strictive material or the piezo electric material parallel to and facing a backside of the mirror device by modulating a magnetic field spatially with and coupled to the magnetic strictive material or by modulating an electric field spatially with and coupled to the piezo electric material such that the mirror device is configured to tilt from a first angle to a second angle measured from a direction normal to the mirror surface area of the mirror device; wherein the first angle to the second angle ranges from 0.1 degree to 5 degrees. As to claim 18 of the instant application, claim 20 of U.S. Patent No. 11,784,454 recites wherein the thickness of the volume structure of the magneto-strictive material or the piezo electric material is changed from a first thickness to a second thickness along an entire volume provided between a first surface region and a second surface region of the magneto-strictive material or the piezo electric material coupled to a backside of the mirror device by applying a uniform electric magnetic field to the magnetic strictive material or electric field to the piezo electric material such that the mirror device changes a direction of the laser beam from the first optical path to the second optical path by changing a spatial location of an incidence of the laser beam on the mirror device from a first location of the mirror surface area to a second location of the mirror surface area. As to claim 19 of the instant application, claim 21 of U.S. Patent No. 11,784,454 recites A high intensity pulse laser generation system, the system comprising: an optical cavity maintained in a vacuum of 300 Torr and less and characterized by a length of free space of 50 meters to 10 kilometers, the optical cavity being configured to increase an intensity of a laser beam comprising a pulse from a first energy power intensity to a second higher energy power intensity propagating on a first optical path configured within the optical cavity by circulating or reciprocating at least a portion of the laser beam from a light source having a output power of 0.01 Joule to 1 Mega Joule on the first optical path; an optical path modification device coupled to the optical cavity, the optical path modification device configured to repeatedly change a spatial direction of the laser beam propagating on the first optical path at a predetermined timing ranging from 20 milliseconds to 3 seconds with the response time from 0.01 microsecond to 30 microseconds to cause the laser beam propagating on the first optical path to change a direction from the first optical path to a second optical path that is outside of the first optical path thereby the optical path modification device is configured to propagate the laser beam on the second optical path generating a high intensity pulse laser beam; at least a pair of mirror devices, each of the mirror devices having a mirror surface area of 10 cm.sup.2 and 10000 cm.sup.2, and configured with the optical path modification device and provided within the first optical path, at least one the mirror devices configured to change a spatial position of the mirror device being coupled to the laser beam; a timing device configured with the optical path modification device and having a predetermined frequency to adjust the spatial position of the mirror device, the timing device being configured to adjust the spatial position of the mirror device after a predetermined number of cycles associated with the circulating or reciprocating of the laser beam propagating between at least the pair of mirrors such that each cycle of the laser beam progressively increases an intensity from the first energy power intensity to the second energy power intensity to an Nth energy power intensity, where N is an integer greater than 2, to the high intensity pulse laser beam on the second optical path; an spatial driver device comprising a magneto-strictive material, the spatial driver device being coupled to the timing device and the one mirror device, the spatial driver device being configured to adjust the spatial position of the mirror device by changing a thickness of a volume structure ranging from 0.01 mm to 2 mm including the magneto-strictive material of the spatial driver device by an expansion or contraction process to move the spatial position of the mirror device from a first position to a second position after the predetermined number of cycles. As to claim 20 of the instant application, claim 22 of U.S. Patent No. 11,784,454 recites wherein at least one of the mirror devices comprises a deformable mirror surface. As to claim 21 of the instant application, claim 21 of U.S. Patent No. 11,784,454 recites a magneto-strictive material instead of a piezo material. However, such materials were art recognized equivalents. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to David Chung whose telephone number is (571)272-2288. The examiner can normally be reached Monday - Friday, 8:30 am - 5:00 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Michael Caley can be reached at (571)272-2286. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DAVID Y CHUNG/Primary Examiner, Art Unit 2871
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Prosecution Timeline

Sep 18, 2024
Application Filed
Jun 03, 2026
Non-Final Rejection mailed — §DP (current)

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Prosecution Projections

1-2
Expected OA Rounds
70%
Grant Probability
78%
With Interview (+7.9%)
2y 10m (~1y 0m remaining)
Median Time to Grant
Low
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