Prosecution Insights
Last updated: October 02, 2026
Application No. 18/890,993

LIGHT PROJECTION DEVICE, LIGHT PROJECTION-AND-RECEPTION APPARATUS, AND DISTANCE MEASUREMENT SYSTEM

Non-Final OA §103
Filed
Sep 20, 2024
Priority
Oct 31, 2023 — JP 2023-186763
Examiner
LEE, NICHOLAS J
Art Unit
Tech Center
Assignee
Ricoh Company, Ltd.
OA Round
1 (Non-Final)
82%
Grant Probability
Favorable
1-2
OA Rounds
3m
Est. Remaining
93%
With Interview

Examiner Intelligence

Grants 82% — above average
82%
Career Allowance Rate
796 granted / 968 resolved
+22.2% vs TC avg
Moderate +11% lift
Without
With
+10.8%
Interview Lift
resolved cases with interview
Typical timeline
2y 3m
Avg Prosecution
12 currently pending
Career history
982
Total Applications
across all art units

Statute-Specific Performance

§101
3.7%
-36.3% vs TC avg
§103
57.8%
+17.8% vs TC avg
§102
23.5%
-16.5% vs TC avg
§112
6.2%
-33.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 968 resolved cases

Office Action

§103
DETAILED ACTION Allowable Subject Matter Claims 2, 4 and 7 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1, 3 and 8-10 is/are rejected under 35 U.S.C. 103 as being unpatentable over US Patent Pub. 2020/0182974 A1 to Kimura in view of US Patent Pub. 2020/0018827 A1 to Yamamoto. As to claim 1, Kimura discloses a light projection device (See Fig. 6) comprising: a light source to emit light (606); and an optical system to project pattern light to an object, the pattern light obtained from the light emitted from the light source (See Fig. 6, 600), the optical system including: a first lens group (608) on which the light emitted from the light source incident, the first lens group having a positive power (¶ 0044); an optical element (610) to form the pattern light from the light passing through the first lens group and incident on the optical element (¶ 0045); and a second lens group (612) on which the pattern light emitted from the optical element incident, the second lens group having a positive power (¶ 0046). Kimura fails to disclose wherein the second lens group includes: a third lens group having a positive power; and a fourth lens group having a negative power, and the third lens group and the fourth lens group are arranged in order of the third lens group and the fourth lens group from the optical element. Yamamoto discloses wherein the second lens group (See Fig. 14) includes: a third lens group (613a) having a positive power; and a fourth lens group (613b) having a negative power, and the third lens group and the fourth lens group are arranged in order of the third lens group and the fourth lens group from the optical element (See Fig. 14). Before the effective filing date, it would have been obvious to one of ordinary skill in the art to have modified Kimura with the teachings of Yamamoto wherein the second lens group includes: a third lens group having a positive power; and a fourth lens group having a negative power, and the third lens group and the fourth lens group are arranged in order of the third lens group and the fourth lens group from the optical element, as suggested by Yamamoto thereby similarly using known configurations of lens groups for projecting light in distance measuring systems. As to claim 3, Kimura discloses wherein the optical element includes a diffraction optical element to form the pattern light from the light passing through the first lens group and incident on the optical element (See Fig. 6; 610 forms patterns from light received from 608). As to claim 8, Kimura discloses wherein the optical element includes a mirror to guide the light to the object as the pattern light, the light passing through the first lens group and incident on the mirror (¶ 0045). As to claim 9, Kimura in view of Yamamoto discloses a light projection-and-reception apparatus comprising: the light projection device according to claim 1 to project the pattern light to the object (See the rejection of claim 1); a light receiver (Kimura, See Fig. 7, 704) to receive a reflection light reflected from the object to which the pattern light is projected (Kimura, ¶ 0050); and circuitry (706) configured to control the light source and the light receiver (¶ 0050). As to claim 10, Kimura in view of Yamamoto discloses a distance measurement system comprising: the light projection-and-reception apparatus according to claim 9 (See the rejection of claim 9); and circuitry configured to calculate a distance to the object based on an output of the light received by the light receiver (¶ 0050-0051). Claim(s) 5 is/are rejected under 35 U.S.C. 103 as being unpatentable over US Patent Pub. 2020/0182974 A1 to Kimura in view of US Patent Pub. 2020/0018827 A1 to Yamamoto, and further in view of US Patent Pub. 2023/0185057 A1 to Hoenle et al (“Hoenle”). As to claim 5, Kimura in view of Yamamoto discloses wherein the first lens group includes at least one positive lens (Kimura, See Fig. 6, 608; ¶ 0044), but fails to disclose the third lens group includes at least two positive lenses, the fourth lens group includes at least two negative meniscus lenses having optical surfaces, and at least one optical surface of the optical surfaces of the two negative meniscus lenses is an aspherical surface. Hoenle discloses the third lens group includes at least two positive lenses (See Fig. 1, 11, 16; ¶ 0118-0120), the fourth lens group includes at least two negative meniscus lenses having optical surfaces (See Fig. 1, 5, 8), and at least one optical surface of the optical surfaces of the two negative meniscus lenses is an aspherical surface (See Fig. 1; ¶ 0025, 0117; Claim 1). Before the effective filing date, it would have been obvious to one of ordinary skill in the art to have modified Kimura in view of Yamamoto with the teachings of Hoenle of the third lens group includes at least two positive lenses, the fourth lens group includes at least two negative meniscus lenses having optical surfaces, and at least one optical surface of the optical surfaces of the two negative meniscus lenses is an aspherical surface, as suggested by Hoenle thereby similarly using known configurations of a system of lenses in distance measuring systems. Claim(s) 6 is/are rejected under 35 U.S.C. 103 as being unpatentable over US Patent Pub. 2020/0182974 A1 to Kimura in view of US Patent Pub. 2020/0018827 A1 to Yamamoto, and further in view of US Patent Pub. 2023/0185057 A1 to Hoenle et al (“Hoenle”), and further in view of US Patent Pub. 2022/0334454 A1 to Veit et al (“Veit”). As to claim 6, Kimura in view of Yamamoto discloses wherein a final optical surface of the optical system has an angle of view of 90 degrees or more and 220 degrees or less at a full angle. Hoenle discloses wherein a final optical surface of the optical system has an angle of view of 90 degrees at a full angle (¶ 0018). Before the effective filing date, it would have been obvious to one of ordinary skill in the art to have modified Kimura in view of Yamamoto with the teachings of Hoenle wherein a final optical surface of the optical system has an angle of view of 90 degrees or more and 220 degrees or less at a full angle, as suggested by Hoenle thereby similarly using known configurations for configuring lens systems in distance measuring systems. Kimura in view of Yamamoto and Hoenle fails to disclose the optical system has an angle of view of 220 degrees or less at a full angle. Veit discloses the optical system has an angle of view of 220 degrees or less at a full angle (¶ 0127, “the optical system of which is characterized by a (full-angle) FOV of about 180°”). Before the effective filing date, it would have been obvious to one of ordinary skill in the art to have modified Kimura in view of Yamamoto with the teachings of Hoenle wherein a final optical surface of the optical system has an angle of view of 220 degrees or less at a full angle, as suggested by Hoenle thereby similarly using known configurations for configuring lens systems in distance measuring systems. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to NICHOLAS J LEE whose telephone number is (571)270-7354. The examiner can normally be reached Mon-Fri 10-6PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Matthew Eason can be reached at 571-270-7230. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /NICHOLAS J LEE/Primary Examiner, Art Unit 2624
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Prosecution Timeline

Sep 20, 2024
Application Filed
Aug 11, 2026
Non-Final Rejection mailed — §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
82%
Grant Probability
93%
With Interview (+10.8%)
2y 3m (~3m remaining)
Median Time to Grant
Low
PTA Risk
Based on 968 resolved cases by this examiner. Grant probability derived from career allowance rate.

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