Prosecution Insights
Last updated: September 20, 2026
Application No. 18/892,835

CLEANING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE

Non-Final OA §102§103
Filed
Sep 23, 2024
Priority
Mar 28, 2022 — JP 2022-052034 +2 more
Examiner
OGDEN JR, NECHOLUS
Art Unit
Tech Center
Assignee
Fujifilm Holdings Corporation
OA Round
1 (Non-Final)
70%
Grant Probability
Favorable
1-2
OA Rounds
8m
Est. Remaining
93%
With Interview

Examiner Intelligence

Grants 70% — above average
70%
Career Allowance Rate
732 granted / 1049 resolved
+9.8% vs TC avg
Strong +24% interview lift
Without
With
+23.5%
Interview Lift
resolved cases with interview
Typical timeline
2y 8m
Avg Prosecution
42 currently pending
Career history
1080
Total Applications
across all art units

Statute-Specific Performance

§101
1.5%
-38.5% vs TC avg
§103
48.1%
+8.1% vs TC avg
§102
19.4%
-20.6% vs TC avg
§112
14.6%
-25.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1049 resolved cases

Office Action

§102 §103
CTNF 18/892,835 CTNF 71046 DETAILED ACTION Notice of Pre-AIA or AIA Status 07-03-aia AIA 15-10-aia The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA. Claim Rejections - 35 USC § 102 07-07-aia AIA 07-07 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – 07-08-aia AIA (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. 07-12-aia AIA (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim Rejections - 35 USC § 103 07-20-aia AIA The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. 07-23-aia AIA The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. 07-20-02-aia AIA This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. 07-27-aia AIA Claim(s) 1-20 is/are rejected under 35 U.S.C. 102( a1 ) as anticipated by or, in the alternative, under 35 U.S.C. 103 as obvious over WO 2021/131452 A1 . WO ‘452 disclose a cleaning solution for a semiconductor substrate subjected to CMP (paragraph [0007]), the cleaning solution being used in a cleaning step for cleaning a semiconductor substrate subjected to chemical-mechanical polishing (CMP) (paragraph [0178]), wherein: the objects to be cleaned with the cleaning solution include semiconductor substrates having a metal-containing substance (paragraph [0179]); the metal contained in the metal-containing substance includes, for example, Molybdenum (Mo) (paragraph [0180]); examples of the wafer constituting the semiconductor substrate include silicon (Si) wafers and silicon carbide (SiC) wafers (paragraph [0184]); and the semiconductor substrate may have an insulating film on the aforementioned wafer and examples of the insulating film include silicon oxide films, silicon nitride films, and carbon-doped silicon oxide (SiOC) films (paragraph [0185]). Moreover, in examples 39 and 40, sarcosine was used as component A (paragraph [0208]), 2-amino- 2-methyl-1-propanol (AMP) (corresponding to the amino alcohol) was used as component C (paragraph [0210]), and 2-aminopyrimidine (corresponding to the anti-corrosion agent), gluconic acid (corresponding to the chelating agent) and citric acid (corresponding to the chelating agent) were used as component D (paragraph [0211]). As this reference teach all of the instantly required and therefore, it is considered anticipatory. Alternatively, WO ‘492 does not disclose or suggest a cleaning composition used in treating a molybdenum-containing substrate, the cleaning composition containing an organic acid, and an organic amine compound having at least one group selected from the group consisting of a primary amine group, a secondary amine group, and a tertiary amine group, the cleaning composition being characterized by containing two or more types of the organic amine compound, and having a "pH between 2-9", wherein "the mass ratio of the content of the organic acid relative to the content of the amino acid is 2.0-210.0", "two or more types of the organic acid are included in the cleaning composition", "the organic acid contains a compound represented by formula (Y1) and one or more organic acids Y selected from a group consisting of polymer compounds having an acid radical", "the mass ratio of the content of the organic acid relative to the total content of the organic amine compounds is 0.10-6.20", and "the surface tension is 65-75 mN/m" would have been inherent to the compositions at hand. Therefore, the above disclosure is insufficient to anticipate the above listed claims, it would have nonetheless been obvious to the skilled artisan to produce the claimed composition, as the reference teaches each of the claimed ingredients within the claimed proportions for the same utility. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to NECHOLUS OGDEN JR whose telephone number is (571)272-1322. The examiner can normally be reached 8-4:30 EST M-F. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Angela Brown-Pettigrew can be reached at 571-272-1498. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /NECHOLUS OGDEN JR/Primary Examiner, Art Unit 1761 Application/Control Number: 18/892,835 Page 2 Art Unit: 1761 Application/Control Number: 18/892,835 Page 3 Art Unit: 1761 Application/Control Number: 18/892,835 Page 4 Art Unit: 1761
Read full office action

Prosecution Timeline

Sep 23, 2024
Application Filed
May 29, 2026
Non-Final Rejection mailed — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12729349
Home Care Compositions
4y 0m to grant Granted Sep 08, 2026
Patent 12729351
CLEANSING BAR AND COMPOSITION THEREOF
2y 4m to grant Granted Sep 08, 2026
Patent 12716043
WATER-SOLUBLE UNIT DOSE ARTICLE COMPRISING A FIBROUS NON-WOVEN SHEET AND A HUEING DYE PARTICLE
3y 6m to grant Granted Aug 25, 2026
Patent 12716042
LIQUID ENZYME COMPOSITION WITH SULFITE SCAVENGER
3y 1m to grant Granted Aug 25, 2026
Patent 12708595
CLEANSING COMPOSITIONS WITH NON-MODIFIED CLAY AND POLYGLYCEROL SURFACTANT
3y 1m to grant Granted Aug 18, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
70%
Grant Probability
93%
With Interview (+23.5%)
2y 8m (~8m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1049 resolved cases by this examiner. Grant probability derived from career allowance rate.

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