Prosecution Insights
Last updated: August 17, 2026
Application No. 18/896,717

MULTIPLE DEGREE OF FREEDOM HINGE SYSTEMS AND EYEWEAR DEVICES COMPRISING SUCH HINGE SYSTEMS

Non-Final OA §DP
Filed
Sep 25, 2024
Priority
Feb 18, 2020 — provisional 62/978,076 +2 more
Examiner
CHOI, WILLIAM C
Art Unit
Tech Center
Assignee
Magic Leap Inc.
OA Round
1 (Non-Final)
93%
Grant Probability
Favorable
1-2
OA Rounds
2m
Est. Remaining
97%
With Interview

Examiner Intelligence

Grants 93% — above average
93%
Career Allowance Rate
1046 granted / 1129 resolved
+32.6% vs TC avg
Minimal +4% lift
Without
With
+4.1%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 1m
Avg Prosecution
30 currently pending
Career history
1145
Total Applications
across all art units

Statute-Specific Performance

§101
1.1%
-38.9% vs TC avg
§103
27.5%
-12.5% vs TC avg
§102
54.0%
+14.0% vs TC avg
§112
11.1%
-28.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1129 resolved cases

Office Action

§DP
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Information Disclosure Statement The information disclosure statements (IDS’s) submitted on 9/27/2024, 4/16/2025, 7/2/2025, 8/7/2025, 9/2/2025, 10/10/2025, 12/9/2025, 3/5/2026 were filed in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statements are being considered by the examiner. Double Patenting The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969). A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA . A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b). The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13. The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA /25, or PTO/AIA /26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer. Claims 1-7, 8-12, 13, and 14 are rejected on the ground of nonstatutory double patenting as being unpatentable over respective claims 1-7, 10-14, 17, and 18 of U.S. Patent No. 12,130,500. Although the claims at issue are not identical, they are not patentably distinct from each other because the limitations of said claims of the current invention are disclosed in the respective claim(s)/combination of claims of the Patent and are therefore anticipated by said Patent. Current Application U.S. Patent No. 12,130,500 1. A hinge system, comprising: a hinge base, wherein the hinge base includes a biasing member configured to rotationally bias an intermediate hinge member about a pitch axis toward a neutral configuration when the intermediate hinge member is displaced from the neutral configuration, and wherein the hinge base comprises a generally planar structure with an internal cavity that accommodates the biasing member. 1. A hinge system, comprising: a hinge base fixedly couplable to a first member; an intermediate hinge member rotatably coupled to the hinge base to rotate about a pitch axis; and a distal hinge member rotatably coupled to the intermediate hinge member to rotate about a yaw axis and fixedly couplable to a second member, wherein the hinge system enables the second member to pitch and yaw relative to the first member, wherein the hinge base includes a biasing member configured to rotationally bias the intermediate hinge member about the pitch axis toward a neutral configuration when the intermediate hinge member is displaced from the neutral configuration, and wherein the hinge base comprises a generally planar structure with an internal cavity that accommodates the biasing member. 2. The hinge system of claim 1, wherein the hinge base includes a bushing aligned with the pitch axis, and the intermediate hinge member is pivotably mounted about the bushing to pitch up and down about the pitch axis, and wherein clearance is provided between the bushing and the intermediate hinge member to enable some translational displacement of the intermediate hinge member relative to the hinge base. 2. The hinge system of claim 1, wherein the hinge base includes a bushing aligned with the pitch axis, and the intermediate hinge member is pivotably mounted about the bushing to pitch up and down about the pitch axis, and wherein clearance is provided between the bushing and the intermediate hinge member to enable some translational displacement of the intermediate hinge member relative to the hinge base. 3. The hinge system of claim 1, wherein the hinge base and the intermediate hinge member of the hinge system include one or more stop arrangements to limit rotational travel of the intermediate hinge member relative to the hinge base about the pitch axis, and wherein the one or more stop arrangements comprise a first rotational stop provided on the hinge base that is configured to impede a path of the intermediate hinge member when the intermediate hinge member pitches up to an upward limit and a second rotational stop provided on the hinge base that is configured to impede the path of the intermediate hinge member when the intermediate hinge member pitches down to a downward limit. 3. The hinge system of claim 1, wherein the hinge base and the intermediate hinge member of the hinge system include one or more stop arrangements to limit rotational travel of the intermediate hinge member relative to the hinge base about the pitch axis, and wherein the one or more stop arrangements comprise a first rotational stop provided on the hinge base that is configured to impede a path of the intermediate hinge member when the intermediate hinge member pitches up to an upward limit and a second rotational stop provided on the hinge base that is configured to impede the path of the intermediate hinge member when the intermediate hinge member pitches down to a downward limit. 4. The hinge system of claim 3, wherein the first and second rotational stops are provided by portions of an arcuate slot provided in the hinge base that impede a path of the intermediate hinge member when the intermediate hinge member pitches up and down to the upward limit and the downward limit, respectively. 4. The hinge system of claim 3, wherein the first and second rotational stops are provided by portions of an arcuate slot provided in the hinge base that impede a path of the intermediate hinge member when the intermediate hinge member pitches up and down to the upward limit and the downward limit, respectively. 5. The hinge system of claim 3, wherein the one or more stop arrangements comprise a first rotational stop provided on the intermediate hinge member that is configured to abut the hinge base when the intermediate hinge member pitches up to an upward limit and a second rotational stop provided on the intermediate hinge member that is configured to abut the hinge base when the intermediate hinge member pitches down to a downward limit. 5. The hinge system of claim 3, wherein the one or more stop arrangements comprise a first rotational stop provided on the intermediate hinge member that is configured to abut the hinge base when the intermediate hinge member pitches up to an upward limit and a second rotational stop provided on the intermediate hinge member that is configured to abut the hinge base when the intermediate hinge member pitches down to a downward limit. 6. The hinge system of claim 5, wherein the first and second rotational stops are provided by peripheral edges of the intermediate hinge member, and wherein the first and second rotational stops serve as backup stops in the event of failure of primary rotational stops provided by the base hinge. 6. The hinge system of claim 5, wherein the first and second rotational stops are provided by peripheral edges of the intermediate hinge member, and wherein the first and second rotational stops serve as backup stops in the event of failure of primary rotational stops provided by the base hinge. 7. The hinge system of claim 1, wherein the hinge base includes arcuate guides and the intermediate hinge member includes or interacts with corresponding guide pins that ride in the arcuate guides of the hinge base as the intermediate hinge member rotates relative to the hinge base about the pitch axis, and wherein clearance is provided between a profile of the arcuate guides and the corresponding guide pins to enable some translational displacement of the intermediate hinge member relative to the hinge base. 7. The hinge system of claim 1, wherein the hinge base includes arcuate guides and the intermediate hinge member includes or interacts with corresponding guide pins that ride in the arcuate guides of the hinge base as the intermediate hinge member rotates relative to the hinge base about the pitch axis, and wherein clearance is provided between a profile of the arcuate guides and the corresponding guide pins to enable some translational displacement of the intermediate hinge member relative to the hinge base. 8. The hinge system of claim 1, wherein a biasing member is positioned between the distal hinge member and the intermediate hinge member to bias the distal hinge member toward a neutral configuration. 10. The hinge system of claim 1, wherein a biasing member is positioned between the distal hinge member and the intermediate hinge member to bias the distal hinge member toward a neutral configuration. 9. The hinge system of claim 1, wherein the intermediate hinge member and the distal hinge member of the hinge system include one or more stop arrangements to limit rotational travel of the distal hinge member relative to the intermediate hinge member about a yaw axis. 11. The hinge system of claim 1, wherein the intermediate hinge member and the distal hinge member of the hinge system include one or more stop arrangements to limit rotational travel of the distal hinge member relative to the intermediate hinge member about the yaw axis. 10. The hinge system of claim 9, wherein the one or more stop arrangements comprise a first rotational stop provided on the intermediate hinge member that is configured to impede a path of the distal hinge member when the distal hinge member yaws to an outward limit and a second rotational stop provided on the intermediate hinge member that is configured to impede the path of the distal hinge member when the distal hinge member yaws to an inward limit, and wherein the first and second rotational stops are provided by opposing portions of a plate structure of the intermediate hinge member that impede the path of the distal hinge member when the distal hinge member yaws to the outward limit and the inward limit, respectively. 12. The hinge system of claim 11, wherein the one or more stop arrangements comprise a first rotational stop provided on the intermediate hinge member that is configured to impede a path of the distal hinge member when the distal hinge member yaws to an outward limit and a second rotational stop provided on the intermediate hinge member that is configured to impede the path of the distal hinge member when the distal hinge member yaws to an inward limit, and wherein the first and second rotational stops are provided by opposing portions of a plate structure of the intermediate hinge member that impede the path of the distal hinge member when the distal hinge member yaws to the outward limit and the inward limit, respectively. 11. The hinge system of claim 9, wherein the one or more stop arrangements comprise a first rotational stop provided on the distal hinge member that is configured to abut the intermediate hinge member when the distal hinge member yaws to an outward limit and a second rotational stop provided on the distal hinge member that is configured to abut the intermediate hinge member when the distal hinge member yaws to an inward limit. 13. The hinge system of claim 11, wherein the one or more stop arrangements comprise a first rotational stop provided on the distal hinge member that is configured to abut the intermediate hinge member when the distal hinge member yaws to an outward limit and a second rotational stop provided on the distal hinge member that is configured to abut the intermediate hinge member when the distal hinge member yaws to an inward limit. 12. The hinge system of claim 11, wherein the first and second rotational stops are provided by distinct portions of the distal hinge member that are configured to abut opposing sides of the intermediate hinge member. 14. The hinge system of claim 13, wherein the first and second rotational stops are provided by distinct portions of the distal hinge member that are configured to abut opposing sides of the intermediate hinge member. 13. A hinge system, comprising: a hinge base fixedly, wherein the hinge base includes a biasing member configured to rotationally bias an intermediate hinge member about a pitch axis toward a neutral configuration when the intermediate hinge member is displaced from the neutral configuration, and wherein the hinge base comprises a generally planar base element with the biasing member integrally formed therein. 17. A hinge system, comprising: a hinge base fixedly couplable to a first member; an intermediate hinge member rotatably coupled to the hinge base to rotate about a pitch axis; and a distal hinge member rotatably coupled to the intermediate hinge member to rotate about a yaw axis and fixedly couplable to a second member, wherein the hinge system enables the second member to pitch and yaw relative to the first member, wherein the hinge base includes a biasing member configured to rotationally bias the intermediate hinge member about the pitch axis toward a neutral configuration when the intermediate hinge member is displaced from the neutral configuration, and wherein the hinge base comprises a generally planar base element with the biasing member integrally formed therein. 14. The hinge system of claim 13, wherein the hinge base further comprises opposing covers fixedly secured to the generally planar base element to substantially conceal the biasing member within an internal cavity of the hinge base, and wherein at least one of the opposing covers includes an arcuate guide to assist in guiding the intermediate hinge member as the intermediate hinge member rotates relative to the hinge base about the pitch axis. 18. The hinge system of claim 17, wherein the hinge base further comprises opposing covers fixedly secured to the generally planar base element to substantially conceal the biasing member within an internal cavity of the hinge base, and wherein at least one of the opposing covers includes an arcuate guide to assist in guiding the intermediate hinge member as the intermediate hinge member rotates relative to the hinge base about the pitch axis. Allowable Subject Matter Claims 15-20 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: The prior art fails to teach a combination of all the claimed features as presented in claim 15: a hinge system as claimed, specifically wherein the hinge base includes a bushing aligned with the pitch axis, and the intermediate hinge member is pivotably mounted about the bushing to pitch up and down about the pitch axis, and wherein clearance is provided between the bushing and the intermediate hinge member to enable some translational displacement of the intermediate hinge member relative to the hinge base. The prior art fails to teach a combination of all the claimed features as presented in claims 16-19: a hinge system as claimed, specifically wherein the hinge base and the intermediate hinge member of the hinge system include one or more stop arrangements to limit rotational travel of the intermediate hinge member relative to the hinge base about the pitch axis, and wherein the one or more stop arrangements comprise a first rotational stop provided on the hinge base that is configured to impede a path of the intermediate hinge member when the intermediate hinge member pitches up to an upward limit and a second rotational stop provided on the hinge base that is configured to impede the path of the intermediate hinge member when the intermediate hinge member pitches down to a downward limit. The prior art fails to teach a combination of all the claimed features as presented in claim 20: a hinge system as claimed, specifically wherein the hinge base includes arcuate guides and the intermediate hinge member includes or interacts with corresponding guide pins that ride in the arcuate guides of the hinge base as the intermediate hinge member rotates relative to the hinge base about the pitch axis, and wherein clearance is provided between a profile of the arcuate guides and the corresponding guide pins to enable some translational displacement of the intermediate hinge member relative to the hinge base. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to WILLIAM C CHOI whose telephone number is (571)272-2324. The examiner can normally be reached Monday- Friday, 9:00 am - 6:00 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Pinping Sun can be reached at (571) 270-1284. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /WILLIAM CHOI/Primary Examiner, Art Unit 2872 July 11, 2026
Read full office action

Prosecution Timeline

Sep 25, 2024
Application Filed
Jul 15, 2026
Non-Final Rejection mailed — §DP (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
93%
Grant Probability
97%
With Interview (+4.1%)
2y 1m (~2m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1129 resolved cases by this examiner. Grant probability derived from career allowance rate.

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